Patents Assigned to Shinryo Corporation
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Publication number: 20230303826Abstract: Provided is a resin composition contains, with respect to 100 parts by mass of a thermoplastic resin, 10 to 70 parts by mass of a recycled carbon fiber; and 0.1 to 15 parts by mass of a functional group-containing compound; wherein the recycled carbon fiber is a baked product of a composite of an epoxy resin and a carbon fiber, and comprises 5% by mass or more of a residue derived from the epoxy resin; and an ISO multi-purpose test specimen with a thickness of 4 mm obtained by molding the resin composition has a maximum flexural strength of 130 MPa or more in accordance with ISO 178.Type: ApplicationFiled: June 1, 2023Publication date: September 28, 2023Applicants: MITSUBISHI CHEMICAL CORPORATION, SHINRYO CORPORATIONInventors: Shoichi TAKASHIMA, Fumihiro MUTO, Takayuki SUZUKI, Hiroyuki ARITA
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Patent number: 11753714Abstract: A method for cleaning a semiconductor fabrication equipment part having gas holes used in single-wafer type semiconductor fabrication equipment for processing semiconductor wafers, wherein the semiconductor fabrication equipment part having gas holes is formed of aluminum or an aluminum alloy, and has a distribution plate having a plurality of gas holes, the method including: a step (1) of scanning a gas injection surface of the distribution plate, which is a surface facing the wafer, with a laser beam; and a step (2) of bringing the gas injection surface and insides of the gas holes into contact with a cleaning liquid containing an inorganic acid.Type: GrantFiled: January 18, 2022Date of Patent: September 12, 2023Assignee: Shinryo CorporationInventors: Tomohiro Matsumura, Akihiro Matsumoto
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Publication number: 20230145210Abstract: A composition that contains a polycarbonate resin and a recycled carbon fiber, and demonstrates mechanical strength which is close to that of a case where the virgin carbon fiber is blended. The composition contains 100 parts by mass of a polycarbonate resin having a terminal hydroxy group content of 150 to 800 ppm; and 5 to 65 parts by mass of a recycled carbon fiber which is a heated product of a carbon fiber-reinforced resin. A pellet formed of the composition. A molded article formed of the composition. A method for producing the composition. The method includes feeding to an extruder 100 parts by mass of a polycarbonate resin having a terminal hydroxy group content of 150 to 800 ppm, and 5 to 65 parts by mass of a recycled carbon fiber which is a heated product of a carbon fiber-reinforced resin; and melt kneading the extruded polycarbonate resin.Type: ApplicationFiled: May 6, 2021Publication date: May 11, 2023Applicants: MITSUBISHI ENGINEERING-PLASTICS CORPORATION, SHINRYO CORPORATIONInventors: Yohei NISHINO, Seiichi TAKADA, Hiroyuki ARITA
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Patent number: 11359060Abstract: There are provided a method of producing reclaimed carbon fibers in which, even if a carbon fiber reinforced resin is not heated at 800° C. or higher, pieces of carbon fiber base material that are contained in the carbon fiber reinforced resin can be directly collected, and the variation in the resin residue content in the collected pieces of carbon fiber base material can be reduced, a device for producing reclaimed carbon fibers that can be used in the production method, and a method of producing a carbon fiber reinforced resin in which reclaimed carbon fibers can be effectively used.Type: GrantFiled: November 13, 2019Date of Patent: June 14, 2022Assignee: Shinryo CorporationInventors: Hirokazu Toyoshima, Tooru Takeda, Takahisa Hara, Koujirou Masuda, Yasuo Yamaguchi, Masatoshi Nakamura, Yousuke Maruta, Masaki Satou
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Publication number: 20220136101Abstract: A method for cleaning a semiconductor fabrication equipment part having gas holes used in single-wafer type semiconductor fabrication equipment for processing semiconductor wafers, wherein the semiconductor fabrication equipment part having gas holes is formed of aluminum or an aluminum alloy, and has a distribution plate having a plurality of gas holes, the method including: a step (1) of scanning a gas injection surface of the distribution place, which is a surface facing the wafer, with a laser beam; and a step (2) of bringing the gas injection surface and insides of the gas holes into contact with a cleaning liquid containing an inorganic acid.Type: ApplicationFiled: January 18, 2022Publication date: May 5, 2022Applicant: Shinryo CorporationInventors: Tomohiro MATSUMURA, Akihiro MATSUMOTO
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Patent number: 10905635Abstract: A gas-containing base material including a functional-gas-containing composition, where the composition is a gel-like composition having a gelation temperature in a range of 0.5° C. or higher and 65° C. or lower at which a liquid form is able to be changed to a solid form by cooling, and where the composition contains an amount of a bubble state functional gas which exceeds a saturated solubility when the composition is in a liquid form.Type: GrantFiled: October 2, 2018Date of Patent: February 2, 2021Assignee: Shinryo CorporationInventors: Tooru Takeda, Hirokazu Toyoshima, Takeshi Sawai, Kazumi Inoue
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Publication number: 20200079918Abstract: There are provided a method of producing reclaimed carbon fibers in which, even if a carbon fiber reinforced resin is not heated at 800° C., or higher, pieces of carbon fiber base material that are contained in the carbon fiber reinforced resin can be directly collected, and the variation in the resin residue content in the collected pieces of carbon fiber base material can be reduced, a device for producing reclaimed carbon fibers that can be used in the production method, and a method of producing a carbon fiber reinforced resin in which reclaimed carbon fibers can be effectively used.Type: ApplicationFiled: November 13, 2019Publication date: March 12, 2020Applicant: Shinryo CorporationInventors: Hirokazu TOYOSHIMA, Tooru TAKEDA, Takahisa HARA, Koujirou MASUDA, Yasuo YAMAGUCHI, Masatoshi NAKAMURA, Yousuke MARUTA, Masaki SATOU
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Publication number: 20190335795Abstract: There are provided a method for producing a hydrogen gas-containing material in which higher safety than in a production method of the related art is secured and which is simple and has high production efficiency, and a method for producing a hydrogen gas-containing material and a device for producing a hydrogen gas-containing material in which it is possible to prevent nitrogen gas from being mixed into the hydrogen gas-containing material produced by the production method and it is easy to control an amount of hydrogen contained in the hydrogen gas-containing material. As one aspect, there is provided a method for producing a hydrogen gas-containing material including mixing a liquid composition containing a gelling agent or a thickener and a liquid medium with hydrogen gas in a line mixer (20) and cooling the liquid composition containing hydrogen gas in a liquid-transfer pipe (22) connected to the line mixer (20) and causing the liquid composition containing hydrogen gas to gel or thicken.Type: ApplicationFiled: January 9, 2018Publication date: November 7, 2019Applicant: Shinryo CorporationInventors: Ken TOYONAGA, Yuu SHIBAHARA, Kazumi INOUE, Yukihito SUETSUGU, Daisuke NISHIO, Hirokazu TOYOSHIMA, Tooru TAKEDA
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Publication number: 20190029927Abstract: The present invention provides a gas-containing base material that can contain and retain a functional gas with a high concentration and a method of producing the same. A method of producing a gas-containing base material including a functional-gas-containing composition includes the following processes. Process (1): In this process, a functional gas is supplied to a raw material composition having a gelation temperature in a range of 0.5° C. or higher and 65° C.Type: ApplicationFiled: October 2, 2018Publication date: January 31, 2019Applicant: Shinryo CorporationInventors: Tooru TAKEDA, Hirokazu Toyoshima, Takeshi Sawai, Kazumi Inoue
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Patent number: 8262988Abstract: An antigen supply device 1 according to the present invention is mainly configured by a cylindrical member 3 extending in the vertical direction. An air suction port 5 for sucking the air in the antigen exposure chamber is provided at a lower end of the cylindrical member. An axial fan 6 that generates a flow of the air flowing upward in an axial direction of the cylindrical member is attached above the air suction port of the cylindrical member. Moreover, a supply port 4 through which high-concentration antigens are jetted from a dust feeder on the outside of the antigen exposure chamber is provided above the axial fan of the cylindrical member.Type: GrantFiled: September 28, 2005Date of Patent: September 11, 2012Assignee: Shinryo CorporationInventors: Huaipeng Tang, Akihiro Seta, Minoru Okuda, Kazuhiro Hashigucci, Kimihiro Okubo
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Patent number: 8029729Abstract: An object of the present invention is to solve the problems in conventional art antigen exposure chambers, and specifically, to provide an antigen exposure chamber system capable of simultaneously exposing a large number of test objects in a chamber to a uniform antigen (pollen, mite or house dust, etc.) in all seasons.Type: GrantFiled: September 28, 2005Date of Patent: October 4, 2011Assignee: Shinryo CorporationInventors: Huaipeng Tang, Akihiro Seta, Toshihiro Anai, Toshikatsu Ueda, Minoru Okuda, Kazuhiro Hashigucci, Kimihiro Okubo
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Patent number: 7819987Abstract: An antigen exposure chamber for quickly performing cleaning and drying with high quality is provided. The antigen exposure chamber of the present invention includes: a cleaning water supply device for supplying cleaning water for cleaning the antigen exposure chamber; cleaning nozzles for jetting the cleaning water supplied from the cleaning water supply device into the antigen exposure chamber and ducts of fan units to clean the antigen exposure chamber and the ducts; a floor surface of the antigen exposure chamber; and an exhaust device provided below the floor surface to exhaust air from the floor surface of the antigen exposure chamber and collect and drain the cleaning water during cleaning.Type: GrantFiled: September 28, 2005Date of Patent: October 26, 2010Assignee: Shinryo CorporationInventors: Toshio Fujita, Huaipeng Tang, Akihiro Seta, Minoru Okuda, Kazuhiro Hashigucci, Kimihiro Okubo
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Publication number: 20090257919Abstract: An object of the present invention is to solve the problems in conventional art antigen exposure chambers, and specifically, to provide an antigen exposure chamber system capable of simultaneously exposing a large number of test objects in a chamber to a uniform antigen (pollen, mite or house dust, etc.) in all seasons.Type: ApplicationFiled: September 28, 2005Publication date: October 15, 2009Applicant: Shinryo CorporationInventors: Huaipeng Tang, Akihiro Seta, Toshihiro Anai, Toshikatsu Ueda, Minoru Okuda, Kazuhiro Hashigucci, Kimihiro Okubo
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Patent number: 4790939Abstract: A method for improving the SVI of the mixed liquor residing in an aeration tank in an activated sludge treatment system which also includes a sedimentation tank is provided. This method comprises the following steps:(A) feeding a concentration system other than said activated sludge treatment system with at least one of the mixed liquor in the aeration tank, the mixed liquor withdrawn from a line connecting the aeration tank and the sedimentation tank, and the settled sludge leaving said sedimentation tank;(B) introducing the concentrated sludge from said concentration system into a first mixing zone where said concentrated sludge is mixed with a resin having high water absorbing capability;(C) introducing a gel-like sludge-resin mixture from said first mixing zone into a second mixing zone where a metal salt is added to said mixture; and(D) returning to said aeration tank a contracted gel-sludge mixture leaving said second mixing zone.Type: GrantFiled: June 18, 1986Date of Patent: December 13, 1988Assignee: Shinryo CorporationInventors: Akira Suzuki, Norio Watanabe, Masashi Kage
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Patent number: 4780277Abstract: A waste gas in treated by the sequence of discharge treatment and catalytic oxidation. A microbe-containing gas is disinfected by first mixing it with ozone, then subjecting the gas to discharge treatment and catalytic reaction successively.Type: GrantFiled: May 5, 1986Date of Patent: October 25, 1988Assignee: Shinryo CorporationInventors: Toshio Tanaka, Yasuaki Nagashima, Masato Sumiya, Shinji Hosono
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Patent number: 4718242Abstract: A chemical heat pump utilizing a hydrating agent as the working fluid is disclosed. The clathrate formation reaction of a hydrating agent such as flon 31 or 22 is used as one of the two equilibrium reactions of the working fluid so that heat can be pumped up across a temperature difference greater than that between the two heat sources. The heat pump comprises four container means in which reactions take place so that the regeneration process can be effected simultaneously with the heating or refrigerating process in which the temperature of the thermal medium to be utilized, e.g., water, is raised or lowered. The working fluid flows either in continuous one-directional circulation through the four container means, or in alternate directions therebetween. In addition to the two heat sources at two different temperatures, such as waste heat and open air, the heat pump further comprises gas pipes which allow the free movement of the working fluid between the connected container means.Type: GrantFiled: December 31, 1986Date of Patent: January 12, 1988Assignee: Shinryo CorporationInventors: Takao Yamauchi, Kyoya Nishimoto, Nozomu Tanemori