Patents Assigned to Shinshu University, National University Corporation
  • Publication number: 20220331483
    Abstract: A material for inducing nerve regeneration in a transplantation site, or a material for recovering the function of nerve tissues in a transplantation site, the material comprising a cell structure having a thickness of at least 300 ?m that is constructed by stacking the spheroids of bone marrow-derived cells, adipose tissue-derived cells, dental pulp-derived cells, amnion-derived cells, placenta-derived cells, umbilical cord-derived cells, or umbilical cord blood-derived cells, on a needle-shaped body arranged on a substrate.
    Type: Application
    Filed: May 14, 2020
    Publication date: October 20, 2022
    Applicants: CYFUSE BIOMEDICAL K.K., Shinshu University National University Corporation
    Inventors: Tetsuya IMAMURA, Mitsuru SHIMAMURA
  • Publication number: 20220169779
    Abstract: A material for medical use, which contains nanofibers that are formed from a resin containing a silicone-modified polyurethane resin, and which is characterized in that: the silicone-modified polyurethane resin is a reaction product of (A) a long-chain polyol that has a number average molecular weight of 500 or more, (B) a short-chain polyol that has a number average molecular weight of less than 500, (C) an active hydrogen group-containing organopolysiloxane and (D) a polyisocyanate; and the average fiber diameter thereof is less than 2,000 nm. This material for medical use exhibits excellent performance in a biological test.
    Type: Application
    Filed: February 18, 2020
    Publication date: June 2, 2022
    Applicants: SHIN-ETSU CHEMICAL CO., LTD., DAINICHISEIKA COLOR&CHEMICALS MFG. CO., LTD., SHINSHU UNIVERSITY, NATIONAL UNIVERSITY CORPORATION
    Inventors: Daisuke NODA, Shinji IRIFUNE, Masaki TANAKA, Hiromasa SATO, Motoaki UMEZU, Shota IINO, Toshihisa TANAKA, Chuan Yin
  • Patent number: 11174335
    Abstract: Disclosed herein is a fiber formed from a resin including a silicone-modified polyurethane resin comprising the reaction products of a polyol (A), a chain extender (B), an active-hydrogen-group-containing organopolysiloxane (C), and a polyisocyanate (D), wherein the active-hydrogen-group-containing organopolysiloxane (C) contains an active-hydrogen-group-containing organopolysiloxane (C-1) having a carbinol group at only one terminal.
    Type: Grant
    Filed: March 31, 2017
    Date of Patent: November 16, 2021
    Assignees: SHIN-ETSU CHEMICAL CO., LTD., DAINCHISEIK COLOR & CHEMICALS MFG. CO., LTD., SHINSHU UNIVERSITY, NATIONAL UNIVERSITY CORPORATION
    Inventors: Hatsuhiko Hattori, Masaki Tanaka, Hiromasa Sato, Shota Iino, Motoaki Umezu, Toshihisa Tanaka, Mikihisa Kondo
  • Publication number: 20190071534
    Abstract: A fiber formed from a resin including a silicone-modified polyurethane resin comprising the reaction products of a polyol (A), a chain extender (B), an active-hydrogen-group-containing organopolysiloxane (C), and a polyisocyanate (D), wherein the active-hydrogen-group-containing organopolysiloxane (C) contains an active-hydrogen-group-containing organopolysiloxane (C-1) having a carbinol group at only one terminal.
    Type: Application
    Filed: March 31, 2017
    Publication date: March 7, 2019
    Applicants: SHIN-ETSU CHEMICAL CO., LTD., DAINICHISEIKA COLOR & CHEMICALS MFG. CO., LTD., SHINSHU UNIVERSITY, NATIONAL UNIVERSITY CORPORATION
    Inventors: Hatsuhiko HATTORI, Masaki TANAKA, Hiromasa SATO, Shota IINO, Motoaki UMEZU, Toshihisa TANAKA, Mikihisa KONDO
  • Publication number: 20180086874
    Abstract: Provided is a fiber formed from a resin containing a silicone-modified polyurethane resin. With the present invention, a characteristic fiber having excellent flexibility, slipping ability, blocking resistance, heat retaining property, water vapor permeability, water repellency, and spinnability can be provided.
    Type: Application
    Filed: March 29, 2016
    Publication date: March 29, 2018
    Applicants: SHIN-ETSU CHEMICAL CO., LTD., DAINICHISEIKA COLOR&CHEMICALS MFG. CO., LTD., SHINSHU UNIVERSITY, NATIONAL UNIVERSITY CORPORATION
    Inventors: Hatsuhiko HATTORI, Yoshinori YONEDA, Masaki TANAKA, Yoshitaka KOSHIRO, Hiromasa SATO, Shota IINO, Motoaki UMEZU, Toshihisa TANAKA, Hiroko IDE, Rino OKAMOTO
  • Patent number: 8642189
    Abstract: The invention provides an organic compound which shows an excellent electron-injecting/transporting performance, has a hole-blocking ability and shows a high stability as a film, that is, having excellent characteristics as a material for organic electroluminescent device having high efficiency and high durability; and provides an organic EL device comprising the compound and having high efficiency and high durability.
    Type: Grant
    Filed: February 25, 2009
    Date of Patent: February 4, 2014
    Assignees: Hodogaya Chemical Co., Ltd., Shinshu University, National University Corporation
    Inventors: Norimasa Yokoyama, Shuichi Hayashi, Makoto Nagaoka, Yoshio Taniguchi, Musubu Ichikawa
  • Patent number: 8039835
    Abstract: A semiconductor device includes a substrate, a transparent oxide layer disposed on one surface side of the substrate, a gate disposed apart from the transparent oxide layer, and a gate insulating layer disposed between the transparent oxide layer and the gate. The transparent oxide layer includes a source, a drain, and a channel formed integrally between the source and the drain, and is made of a transparent oxide material as the main material. The gate provides an electric field to the channel. The gate insulating layer insulates the source and the drain from the gate. The average thickness of the channel is smaller than the average thickness of the source and the drain so that the source and the drain function as conductors and the channel functions as a semiconductor.
    Type: Grant
    Filed: December 14, 2007
    Date of Patent: October 18, 2011
    Assignees: Shinshu University, National University Corporation, Seiko Epson Corporation
    Inventors: Musubu Ichikiwa, Kiyoshi Nakamura, Taketomi Kamikawa
  • Patent number: 7960720
    Abstract: A transistor including a first gate electrode, a second gate electrode, a first gate insulating layer disposed between the first gate electrode and the second gate electrode, a first interlayer disposed between the first gate insulating layer and the second gate electrode and containing a first organic material, an organic semiconductor layer disposed between the first interlayer and the second gate electrode, a second gate insulating layer disposed between the organic semiconductor layer and the second gate electrode, and a source electrode and a drain electrode disposed between the first interlayer and the second gate insulating layer and injecting carriers into the organic semiconductor layer, wherein an ambipolar property is imparted to a part of the organic semiconductor layer that contacts with the first interlayer under an action of the first interlayer.
    Type: Grant
    Filed: January 22, 2008
    Date of Patent: June 14, 2011
    Assignees: Seiko Epson Corporation, Shinshu University, National University Corporation
    Inventors: Taketomi Kamikawa, Masamitsu Inoue
  • Publication number: 20080173866
    Abstract: A transistor including a first gate electrode, a second gate electrode, a first gate insulating layer disposed between the first gate electrode and the second gate electrode, a first interlayer disposed between the first gate insulating layer and the second gate electrode and containing a first organic material, an organic semiconductor layer disposed between the first interlayer and the second gate electrode, a second gate insulating layer disposed between the organic semiconductor layer and the second gate electrode, and a source electrode and a drain electrode disposed between the first interlayer and the second gate insulating layer and injecting carriers into the organic semiconductor layer, wherein an ambipolar property is imparted to a part of the organic semiconductor layer that contacts with the first interlayer under an action of the first interlayer.
    Type: Application
    Filed: January 22, 2008
    Publication date: July 24, 2008
    Applicants: SEIKO EPSON CORPORATION, SHINSHU UNIVERSITY, NATIONAL UNIVERSITY CORPORATION
    Inventors: Taketomi KAMIKAWA, Masamitsu INOUE