Patents Assigned to SHOWA DENKO K.K., NIKON CORPORATION
  • Publication number: 20040006249
    Abstract: According to the invention, a fluorination treated substance remarkably reduced in the light absorption loss of a substance to be treated, such as a fluoride thin film, a fluorination treatment apparatus capable of producing the fluorination treated substance, and a process for producing a fluorination treated substance can be provided. Disclosed is a process for producing a fluorination treated substance, comprising an enclosure step of enclosing a substance to be treated in a reactor and a fluorination reaction step of introducing a fluorine gas into the reactor to bring the substance to be treated into contact with the fluorine gas and thereby carry out fluorination reaction.
    Type: Application
    Filed: July 8, 2003
    Publication date: January 8, 2004
    Applicant: SHOWA DENKO K.K., NIKON CORPORATION
    Inventors: Yasuyuki Hoshino, Yusuke Taki