Patents Assigned to SI Diamond Technology, Inc.
  • Publication number: 20060151719
    Abstract: An electron beam duplication lithography apparatus and method for focusing electrons emitted from a mask plate as a result of an application of an electric field between a mask plate and a duplication plate. Irradiation of electrons from the mask plate is assisted through an electric field lens or magnetic field lens, or a combination thereof from an electron field emission material formed into a pattern on a flat surface of a substrate. The result is that a congruent or similar pattern is lithographed by electron beam exposure onto an electron beam resist film from a field emission film having the congruent or similar pattern to be created.
    Type: Application
    Filed: February 14, 2006
    Publication date: July 13, 2006
    Applicant: SI Diamond Technology, Inc.
    Inventor: Seiichi Iwamatsu
  • Patent number: 7070651
    Abstract: A film (carbon and/or diamond) for a field emitter device, which may be utilized within a computer display, is produced by a process utilizing etching of a substrate and then depositing the film. The etching step creates nucleation sites on the substrate for the film deposition process. With this process patterning of the emitting film is avoided. A field emitter device can be manufactured with such a film.
    Type: Grant
    Filed: May 21, 1997
    Date of Patent: July 4, 2006
    Assignee: SI Diamond Technology, Inc.
    Inventors: Zhidan Li Tolt, Zvi Yaniv, Richard Lee Fink
  • Publication number: 20060135030
    Abstract: The present invention is directed towards metallized carbon nanotubes, methods for making metallized carbon nanotubes using an electroless plating technique, methods for dispensing metallized carbon nanotubes onto a substrate. The present invention is also directed towards cold cathode field emitting materials comprising metallized carbon nanotubes, and methods of using metallized carbon nanotubes as cold cathode field emitters.
    Type: Application
    Filed: December 22, 2004
    Publication date: June 22, 2006
    Applicant: SI Diamond Technology,Inc.
    Inventor: Dongsheng Mao
  • Patent number: 7057578
    Abstract: A screen (which may be a display or electronic display) for projection that has embedded in the screen other active display technologies, such as LEDs, LCDs, etc., or the screen itself is a hybrid of translucent surfaces with a low-resolution display. This display will have two faces such that the alphanumeric information appears from left to right on both sides of the projected image.
    Type: Grant
    Filed: June 6, 2002
    Date of Patent: June 6, 2006
    Assignee: SI Diamond Technology, Inc.
    Inventor: Zvi Yaniv
  • Patent number: 7038637
    Abstract: Electronic billboards, which may be indoor or outdoor are located in various geographical areas. Associated with each billboard is a web address. A client desiring to display information, such as an advertisement, on any selected electronic billboard can upload the information over the Internet to the server implementing the billboard website. The client can select the time and duration for the information to be displayed, and can even purchase the display time using a credit card or through the use of some other type of account.
    Type: Grant
    Filed: April 20, 2000
    Date of Patent: May 2, 2006
    Assignee: SI Diamond Technology, Inc.
    Inventors: Marc Eller, Zvi Yaniv
  • Patent number: 7011927
    Abstract: An electron beam duplication lithography apparatus and method for focusing electrons emitted from a mask plate as a result of an application of an electric field between a mask plate and a duplication plate. Irradiation of electrons from the mask plate is assisted through an electric field lens or magnetic field lens, or a combination thereof from an electron field emission material formed into a pattern on a flat surface of a substrate. The result is that a congruent or similar pattern is lithographed by electron beam exposure onto an electron beam resist film from a field emission film having the congruent or similar pattern to be created.
    Type: Grant
    Filed: January 21, 2005
    Date of Patent: March 14, 2006
    Assignee: Si Diamond Technology, Inc.
    Inventor: Seiichi Iwamatsu
  • Patent number: 6979947
    Abstract: A field emission device includes a substrate in which a well has been formed. Carbon fibers with a high aspect ratio are deposited within the well, wherein the well is sufficiently deep so that axes of a large number of the carbon fibers are substantially coaxial with a long axis of the well. A conductive anode is positioned relative to the substrate so that an electric potential applied between the conductive anode and the substrate causes an emission of electrons from the carbon fibers towards the conductive anode.
    Type: Grant
    Filed: July 9, 2002
    Date of Patent: December 27, 2005
    Assignee: SI Diamond Technology, Inc.
    Inventors: Zvi Yaniv, Richard Lee Fink
  • Patent number: 6975063
    Abstract: The present invention is directed towards metallized carbon nanotubes, methods for making metallized carbon nanotubes using an electroless plating technique, methods for dispensing metallized carbon nanotubes onto a substrate, and methods for aligning magnetically-active metallized carbon nanotubes. The present invention is also directed towards cold cathode field emitting materials comprising metallized carbon nanotubes, and methods of using metallized carbon nanotubes as cold cathode field emitters.
    Type: Grant
    Filed: April 4, 2003
    Date of Patent: December 13, 2005
    Assignee: SI Diamond Technology, Inc.
    Inventors: Dongsheng Mao, Zvi Yaniv, Richard Lee Fink
  • Patent number: 6958576
    Abstract: A plurality of field emission device cathodes each generate emission of electrons, which are then controlled and focused using various electrodes to produce an electron beam. Horizontal and vertical deflection techniques, similar to those used within a cathode ray tube, operate to scan the individual electron beams onto portions of a phosphor screen in order to generate images. The use of the plurality of field emission cathodes provides for a flatter screen depth than possible with a typical cathode ray tube.
    Type: Grant
    Filed: February 21, 2003
    Date of Patent: October 25, 2005
    Assignee: SI Diamond Technology, Inc.
    Inventors: Zvi Yaniv, Ronald Charles Robinder
  • Patent number: 6933670
    Abstract: Cold cathodes are used as field emitters within a multi-spectral light source, which is flat and compact. With the use of filters, very narrow and tunable light wavelengths can be achieved from a single lamp having a large selection of spectral behavior.
    Type: Grant
    Filed: January 23, 2003
    Date of Patent: August 23, 2005
    Assignee: Si Diamond Technology, Inc.
    Inventor: Zvi Yaniv
  • Publication number: 20050148271
    Abstract: A two-layer approach is provided for thermally growing carbon nanotubes on a substrate for field emitter applications. An adhesion layer is deposited on a cathode. A catalyst layer is then deposited on the adhesion layer, and then a carbon nanotube film is grown on the catalyst layer.
    Type: Application
    Filed: December 9, 2004
    Publication date: July 7, 2005
    Applicant: SI Diamond Technology, Inc.
    Inventors: Zvi Yaniv, Richard Fink, Dean Hutchins, Mohshi Yang, Leif Thuesen
  • Publication number: 20050121623
    Abstract: An electron beam duplication lithography apparatus and method for focusing electrons emitted from a mask plate as a result of an application of an electric field between a mask plate and a duplication plate. Irradiation of electrons from the mask plate is assisted through an electric field lens or magnetic field lens, or a combination thereof from an electron field emission material formed into a pattern on a flat surface of a substrate. The result is that a congruent or similar pattern is lithographed by electron beam exposure onto an electron beam resist film from a field emission film having the congruent or similar pattern to be created.
    Type: Application
    Filed: January 21, 2005
    Publication date: June 9, 2005
    Applicant: SI Diamond Technology, Inc.
    Inventor: Seiichi Iwamatsu
  • Patent number: 6897603
    Abstract: Nanoparticles are coated using thick-film techniques with a catalyst to promote the growth of carbon nanotubes thereon. In one example, alumina nanoparticles are coated with a copper catalyst. Such nanoparticles can be selectively deposited onto a substrate to create a field emission cathode, which can then be utilized within field emission devices.
    Type: Grant
    Filed: August 20, 2002
    Date of Patent: May 24, 2005
    Assignee: SI Diamond Technology, Inc.
    Inventors: Dongsheng Mao, Yunjun Li, Richard Lee Fink, Valerie Ginsberg, Mohshi Yang, Leif Thuesen
  • Patent number: 6885022
    Abstract: A cathode includes a carbon nanotube layer, which is optimized with a low work function material, such as an alkali. The inclusion of the alkali material improves the field emission properties of the carbon nanotube layer.
    Type: Grant
    Filed: December 5, 2001
    Date of Patent: April 26, 2005
    Assignee: SI Diamond Technology, Inc.
    Inventors: Zvi Yaniv, Richard Lee Fink, Igor Pavlovsky
  • Patent number: 6854850
    Abstract: An image projection system capable of projecting images to multiple screens or viewing surfaces. The system uses a moveable mirror to direct the projected images to the screens. The moveable mirror may work in concert with one or more fixed mirrors to reflect the projected images to screens in a variety of configurations relative to the projector.
    Type: Grant
    Filed: January 21, 2003
    Date of Patent: February 15, 2005
    Assignee: SI Diamond Technology, Inc.
    Inventor: Zvi Yaniv
  • Patent number: 6849856
    Abstract: An electron beam duplication lithography apparatus and method for focusing electrons emitted from a mask plate as a result of an application of an electric field between a mask plate and a duplication plate. Irradiation of electrons from the mask plate is assisted through an electric field lens or magnetic field lens, or a combination thereof from an electron field emission material formed into a pattern on a flat surface of a substrate. The result is that a congruent or similar pattern is lithographed by electron beam exposure onto an electron beam resist film from a field emission film having the congruent or similar pattern to be created.
    Type: Grant
    Filed: April 17, 2001
    Date of Patent: February 1, 2005
    Assignee: SI Diamond Technology, Inc.
    Inventor: Seiichi Iwamatsu
  • Patent number: 6819035
    Abstract: A carbon film having an area of insulating material surrounded by an area of conducing material, and an area of material between the area of insulating material and the area of conducting material having a graded dielectric constant which varies from high to low from the area of insulating material to the area of conducting material.
    Type: Grant
    Filed: December 11, 2003
    Date of Patent: November 16, 2004
    Assignee: SI Diamond Technology, Inc.
    Inventors: Zvi Yaniv, Richard Lee Fink, Zhidan Li Tolt
  • Patent number: 6819034
    Abstract: A field emission cold cathode utilizes a film of carbon flake field emitters deposited thereon. The carbon flakes may exhibit rolled edges, but are still sufficient to provide improved field emission characteristics. A cold cathode using such carbon flake field emitters can be utilized to produce afield emission flat panel display, which can be implemented for use with a computer system.
    Type: Grant
    Filed: August 21, 2000
    Date of Patent: November 16, 2004
    Assignee: SI Diamond Technology, Inc.
    Inventor: Igor Pavlovsky
  • Patent number: 6798131
    Abstract: A multiplexed grid structure for electron emission displays allows each of the grid portions to be independently controllable from each other so that electrons can be emitted from their respective pixel sites as each grid portion is addressed.
    Type: Grant
    Filed: November 15, 2001
    Date of Patent: September 28, 2004
    Assignee: SI Diamond Technology, Inc.
    Inventors: Richard Lee Fink, Zvi Yaniv
  • Publication number: 20040166319
    Abstract: The present invention is for a porous silicon powder comprising silicon particles wherein the outermost layers of said particles are porous. The present invention is also directed to a method of making this porous silicon powder using a stain etch method. The present invention is also directed to a method of making silicon nanoparticles from the porous silicon powders using a process of ultrasonic agitation. The present invention also includes methods of processing these silicon nanoparticles for use in a variety of applications.
    Type: Application
    Filed: February 21, 2003
    Publication date: August 26, 2004
    Applicant: SI Diamond Technology, Inc.
    Inventors: Yunjun Li, Igor Pavlovsky