Abstract: For solar cell fabrication, the addition of precursors to printable media to assist etching through silicon nitride or silicon oxide layer thus affording contact with the substance underneath the nitride or oxide layer. The etching mechanism may be by molten ceramics formed in situ, fluoride-based etching, as well as a combination of the two.
Type:
Grant
Filed:
May 7, 2012
Date of Patent:
November 18, 2014
Assignee:
Sichuan Yinhe Chemical Co., Ltd.
Inventors:
Ovadia Abed, Yunjun Li, James P. Novak, Samuel Kim, Patrick Ferguson