Patents Assigned to Siemens Components,Inc.
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Patent number: 6069081Abstract: A method of planarizing a dielectric coating applied over an underlying structure on an integrated circuit wafer employs a two-step chemical mechanical polishing (CMP) process. The underlying structure is characterized as having elevated areas and recessed areas. The wafer can be prepared by applying a first polish stop on the elevated areas, then depositing a layer of dielectric over at least the recessed areas, and finally depositing a second polish stop over the resulting dielectric coating. In some applications a first polish stop is not required. The first step in the two-step CMP is polishing the second polish stop using a slurry that polishes the second polish stop until the second polish stop is substantially removed over the elevated areas. The second step is polishing the dielectric coating that remains using a second slurry that polishes the dielectric at a faster rate than it polishes either the second or first polish stop.Type: GrantFiled: April 28, 1995Date of Patent: May 30, 2000Assignees: International Buiness Machines Corporation, Siemens Components, Inc., Kabushiki Kaisha ToshibaInventors: Kathryn Helen Kelleher, Matthias Peschke, Hiroyuki Yano
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Patent number: 5903016Abstract: A monolithic optocoupler having a light emitting diode for emitting light, a first photodiode for producing a current based on light sensed by it, a second photodiode for producing a current based on light sensed by it and an insulator for electrically isolating the light emitting diode from the first photodiode. The insulator is substantially transparent to light emitted by the light emitting diode. The first and second photodiodes are positioned with respect to the light emitting diode such or that directional non-uniformities of light emitted by the light emitting diode are compensated.Type: GrantFiled: June 30, 1995Date of Patent: May 11, 1999Assignee: Siemens Components, Inc.Inventor: David Whitney
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Patent number: 5874363Abstract: Metal silicide is removed at a faster rate than polysilicon in dry etching of metal silicide/polysilicon composites with an etching gas made from HCl and Cl.sub.2 at a volumetric flowrate ratio of HCl:Cl.sub.2 within the range of 3:1 to 5:1.Type: GrantFiled: May 13, 1996Date of Patent: February 23, 1999Assignees: Kabushiki Kaisha Toshiba, International Business Machines Corporation, Siemens Components, Inc.Inventors: Peter D. Hoh, Tokuhisa Ohiwa, Virinder Grewal, Bruno Spuler, Waldemar Kocon, Guadalupe Wiltshire
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Patent number: 5834829Abstract: An energy relieving, redundant crack stop and the method of producing the same is disclosed. The redundant pattern allows the crack propagating energy that is not absorbed by the first ring of metallization to be absorbed by a second area of metallization and also provides a greater surface area over which the crack producing energy may be spread. The redundant crack stop is produced during the metallization process along with the rest of the wiring of the chip surface and, therefore, no additional production steps are necessary to form the structure.Type: GrantFiled: September 5, 1996Date of Patent: November 10, 1998Assignees: International Business Machines Corporation, Siemens Components, Inc.Inventors: Bettina A. Dinkel, Pei-Ing Lee, Ernest N. Levine
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Patent number: 5793075Abstract: The preferred embodiment provides an integrated circuit capacitor that achieves a high capacitance by using an inversion layer in the substrate as the plate counter electrode for the capacitor. The inversion layer is created by forming a trench capacitor in a lightly doped substrate. With a sufficient workfunction difference between the storage node material and the isolation band the surface of the lightly doped substrate inverts, with the inversion charge being supplied by the isolation band. This inversion layer serves as the plate counter electrode for the capacitor.Type: GrantFiled: July 30, 1996Date of Patent: August 11, 1998Assignees: International Business Machines Corporation, Siemens Components, Inc.Inventors: Johann Alsmeier, Jack Allan Mandelman, James Anthony O'Neill, Christopher Parks, Paul Christian Parries
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Patent number: 5774541Abstract: Isolation and interconnection of a telephone network of tip and ring lines and the analog ports of a modem are achieved with a transhybrid that incorporates optically-coupled isolation stages. Optical isolators directly connect to the tip and ring lines to provide optimal isolation and unidirectional transfer of signals.Type: GrantFiled: March 8, 1996Date of Patent: June 30, 1998Assignee: Siemens Components, Inc.Inventor: Robert Krause
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Patent number: 5753928Abstract: Optical feedback control in an optical emitter-detector combination can be improved by fabricating the two devices on a single substrate. The feedback radiation can then travel within a monolithic structure. This arrangement will yield greater uniformity in devices as well as provide for easier mechanical assembly.Type: GrantFiled: February 26, 1996Date of Patent: May 19, 1998Assignee: Siemens Components, Inc.Inventor: Robert Krause
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Patent number: 5750414Abstract: An integrated circuit (IC) (20) is formed on a semiconductor substrate (21). The IC has a PN junction (28) and a graded junction termination (27). A reverse field plate (31) is mounted adjacent the junction termination. One end of the field plate is mounted on and electrically connected to the substrate; the remainder of the field plate extends over a passivating oxide layer (30) which covers the substrate surface (29) adjacent the junction termination. The field plate provides a common potential surface which maintains a fixed potential on the substrate surface at the junction termination.Type: GrantFiled: October 26, 1994Date of Patent: May 12, 1998Assignee: Siemens Components, Inc.Inventor: David Whitney
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Patent number: 5742417Abstract: A data access arrangement (DAA) having a transhybrid circuit for separating a transmit signal from a received signal by providing a transmit cancellation signal to the inverting input of a servo-feedback differential amplifier on the receive channel of the DAA. The cancellation signal is provided by a photodiode optically coupleable with a light emitting diode within a optical isolator on the transmission channel of the DAA. The gain of the cancellation signal can be independently controlled.Type: GrantFiled: September 3, 1996Date of Patent: April 21, 1998Assignee: Siemens Components, Inc.Inventor: David Whitney
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Patent number: 5723363Abstract: A method of making a data access arrangement (DAA) device. The method includes providing a substrate with a DAA circuit, containing optically active electrical components, mounted on it and individually encapsulating each optically active component with an optical medium. An opaque material is transfer molded about the substrate to completely encase the substrate and all of the circuit components. Before the transfer molding, a lead frame is attached to the substrate that extends through and beyond the opaque material to enable electrical contact with the substrate and the circuit components.Type: GrantFiled: September 29, 1995Date of Patent: March 3, 1998Assignee: Siemens Components, Inc.Inventor: Lynn Wiese
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Patent number: 5701007Abstract: A method for establishing a light pathway for an optics apparatus that is substantially free of misalignment. The various components of the apparatus, such as a light source, a light modulator and a light detector, are positionally configured and fixed relative to one another and to a single reference datum in a manner to establish and maintain a continuous light pathway.Type: GrantFiled: October 15, 1996Date of Patent: December 23, 1997Assignee: Siemens Components, Inc.Inventor: Robert J. Figueria, Jr.
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Patent number: 5698849Abstract: An optical encoder for a rotating shaft having a radiation source, a radiation detector and a radiation modulator interposed therebetween. The radiation source, the radiation modulator and the radiation detector are positionally configured and mechanically connected to one another and to the shaft in a manner to be in axial and radial alignment with one another relative to the rotating shaft.Type: GrantFiled: November 25, 1996Date of Patent: December 16, 1997Assignee: Siemens Components, Inc.Inventor: Robert J. Figueria, Jr.
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Patent number: 5641992Abstract: A multilayer interconnect structure for a semiconductor integrated circuit comprising a base layer of titanium, a second layer of titanium nitride, a third layer of an aluminum alloy and a top layer of titanium nitride. All of the layers contained within the multilayer interconnect structure are deposited by in-situ deposition in an ultra-high vacuum deposition system. The different layers deposited in the deposition system are conducted consecutively without a disruption to the vacuum. Although each layer in the multilayer interconnect structure are deposited within the integrated ultra-high vacuum deposition system, with multiple deposition chambers, the deposition of the different layers is conducted at different temperatures. The time to the electromigration failure of the multilayer interconnect structure, caused by the electromigration of the aluminum alloy, is greatly increased by depositing the aluminum alloy layer at a temperature in excess of 300.degree. C. and preferably between 350.degree. C.Type: GrantFiled: August 10, 1995Date of Patent: June 24, 1997Assignees: Siemens Components, Inc., International Business Machines CorporationInventors: Pei-Ing Paul Lee, Bernd Vollmer, Darryl Restaino, Bill Klaasen
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Patent number: 5637151Abstract: A complex building agent, such as EDTA is added in a predetermined concentration to the "SC 1" step of a "PIRANHA-RCA" cleaning sequence for reducing the metal contamination left on the surface of a silicon wafer after completion of this cleaning step.Type: GrantFiled: June 27, 1994Date of Patent: June 10, 1997Assignee: Siemens Components, Inc.Inventor: Peter Schulz
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Patent number: 5583072Abstract: A method of making a monolithic structure for an optocoupler that provides improved linearity. The method includes forming an output signal photodiode and a feedback control signal photodiode on a single chip with an LED. The photodiodes are configured and positioned relative to the LED to compensate for any non-uniformities in the light received from the LED.Type: GrantFiled: June 30, 1995Date of Patent: December 10, 1996Assignee: Siemens Components, Inc.Inventor: David Whitney
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Patent number: 5579144Abstract: A data access arrangement (DAA) having a transhybrid circuit for separating a transmit signal from a received signal by providing a transmit cancellation signal to the inverting input of a servo-feedback differential amplifier on the receive channel of the DAA. The cancellation signal is provided by a photodiode optically coupleable with a light emitting diode within a optical isolator on the transmission channel of the DAA. The gain of the cancellation signal can be independently controlled.Type: GrantFiled: June 30, 1995Date of Patent: November 26, 1996Assignee: Siemens Components, Inc.Inventor: David Whitney
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Patent number: 5555293Abstract: Isolation and interconnection of a telephone network of tip and ring lines and the analog ports of a modem are achieved with a transhybrid that incorporates optically-coupled isolation stages. Optical isolators connect to the tip and ring lines to provide optimal isolation and unidirectional transfer of signals.Type: GrantFiled: March 23, 1995Date of Patent: September 10, 1996Assignee: Siemens Components, Inc.Inventor: Robert Krause
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Patent number: 5514875Abstract: Bidirectional isolated interfaces using optical couplers offer a compact and cost-effective alternative to traditional line transformers. The devices can be configured to provide half-duplex or full-duplex communication.Type: GrantFiled: August 11, 1995Date of Patent: May 7, 1996Assignee: Siemens Components, Inc.Inventor: Robert Krause
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Patent number: 5506425Abstract: An optically-triggered silicon controlled rectifier (SCR) device (21) mounted on a lead frame (34). The SCR device contains a cathode layer (24), an optical gate or control layer (23), and an anode layer (31) formed on a semiconductor substrate (22). The device is soldered onto a pedestal (33) formed on the lead frame. To connect the device to the lead frame, solder is deposited upon the anode layer and the solder fixes the anode layer to the pedestal on the lead frame. The pedestal may be formed by etching or stamping a depression (35) in the lead frame. The device is centered on the pedestal such that the edges of the device are located adjacent the depression, and are spaced from the lead frame.Type: GrantFiled: December 13, 1994Date of Patent: April 9, 1996Assignee: Siemens Components, Inc.Inventors: David Whitney, Lynn Wiese
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Patent number: 5506152Abstract: An optically triggered silicon controlled rectifier (SCR) circuit (20) has a number of semiconductor layers diffused into an N- substrate (21). The layers form an SCR (50) having a P+ anode region (25), a P+ gate region (24), and an N+ cathode region (27). An adjustable base-shunt resistance, in the form of a P- channel depletion mode MOSFET (Q3), connects between the SCR gate region and the cathode region. The MOSFET includes a MOSFET gate region (35), a P+ drain region (24), a P-- channel (26), and a P+ source region (23). The substrate also accommodates a PN photodiode (22, D1) which connects to the MOSFET gate region for switching the MOSFET on and off in response to incident optical radiation (L) thereon. The SCR gate region also comprises photosensitive material. When sufficient optical radiation illuminates the photodiode and the SCR gate region, the MOSFET is turned off and the SCR is triggered, permitting anode-to-cathode current to flow.Type: GrantFiled: September 1, 1994Date of Patent: April 9, 1996Assignee: Siemens Components, Inc.Inventor: David Whitney