Abstract: A voltage controlled oscillator formed as a first layout with metallized areas by a planar technique is located on a high dielectric loss substrate. A second layout formed of metallized area for control circuits of the voltage controlled oscillator is formed on a high loss dielectric substrate is also formed by the same technique as the first layout. A ground plane for the controlling oscillator is formed on an opposite side of the dielectric substrate on which the voltage controlled oscillator is formed.
Type:
Grant
Filed:
February 10, 2000
Date of Patent:
December 4, 2001
Assignee:
Siemens Inofmraton and Communication Networks S.p.A.