Patents Assigned to SIGMA-TECHNOLOGY INC.
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Publication number: 20200338000Abstract: Provided is a method for manufacturing an administrable aqueous solution to a living body, the administrable aqueous solution having a function of supplying sufficient oxygen to peripheral cells, causing less damage and injury of cells under a hypoxic or anaerobic stimulation, and continuously exhibiting a sufficiently high and stable effect to protect cells. The administrable aqueous solution to a living body according to the present invention contains oxygen nanobubbles having a mean particle size of 30 nm or less and a density of 1016 bubbles per ml, preferably a mean particle size of 1 to 10 nm and a density 1017 bubbles or more per ml, respectively, as determined by a measurement with a cryo-transmission electron microscope by an ice-embedding method.Type: ApplicationFiled: July 7, 2020Publication date: October 29, 2020Applicants: SIGMA-TECHNOLOGY INC.Inventors: Dai YAMANOUCHI, Yoshiaki TACHIBANA, Kosuke TACHIBANA
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Publication number: 20200238654Abstract: Provided are a cleaning method and cleaning device for cleaning with micro/nano-bubbles, with which a simple method of spraying a treatment solution containing micro/nano-bubbles onto a substrate to be processed makes it possible to efficiently and reliably peel off residual resist or remove contaminants from the substrate, while reducing an environmental load. This cleaning method is characterized in that, with respect to a substrate to be treated to which a resist film has adhered onto the substrate or a substrate to be treated to which the surface thereof has been contaminated with a metal or metal compounds, the resist film is peeled off or the metals or metal compounds are removed by spraying onto the substrate to be treated a treatment solution containing gaseous micro/nano-bubbles and having a temperature maintained at 30° C. to 90° C.Type: ApplicationFiled: July 12, 2019Publication date: July 30, 2020Applicant: SIGMA-TECHNOLOGY INC.Inventor: Yoshiaki TACHIBANA
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Patent number: 10632506Abstract: Provided are a cleaning method and cleaning device for cleaning with micro/nano-bubbles, with which a simple method of spraying a treatment solution containing micro/nano-bubbles onto a substrate to be processed makes it possible to efficiently and reliably peel off residual resist or remove contaminants from the substrate, while reducing an environmental load. This cleaning method is characterized in that, with respect to a substrate to be treated to which a resist film has adhered onto the substrate or a substrate to be treated to which the surface thereof has been contaminated with a metal or metal compounds, the resist film is peeled off or the metals or metal compounds are removed by spraying onto the substrate to be treated a treatment solution containing gaseous micro/nano-bubbles and having a temperature maintained at 30° C. to 90° C.Type: GrantFiled: December 1, 2015Date of Patent: April 28, 2020Assignee: SIGMA-TECHNOLOGY INC.Inventor: Yoshiaki Tachibana
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Publication number: 20190329520Abstract: Provided are a cleaning method and cleaning device for cleaning with micro/nano-bubbles, with which a simple method of spraying a treatment solution containing micro/nano-bubbles onto a substrate to be processed makes it possible to efficiently and reliably peel off residual resist or remove contaminants from the substrate, while reducing an environmental load. This cleaning method is characterized in that, with respect to a substrate to be treated to which a resist film has adhered onto the substrate or a substrate to be treated to which the surface thereof has been contaminated with a metal or metal compounds, the resist film is peeled off or the metals or metal compounds are removed by spraying onto the substrate to be treated a treatment solution containing gaseous micro/nano-bubbles and having a temperature maintained at 30° C. to 90° C.Type: ApplicationFiled: July 12, 2019Publication date: October 31, 2019Applicant: SIGMA-TECHNOLOGY INC.Inventor: Yoshiaki TACHIBANA
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Publication number: 20190298653Abstract: Provided are an administrable aqueous solution to a living body and a method for manufacturing the same, the administrable aqueous solution having a function of supplying sufficient oxygen to peripheral cells, causing less damage and injury of cells under a hypoxic or anaerobic stimulation, and continuously exhibiting a sufficiently high and stable effect to protect cells. The administrable aqueous solution to a living body according to the present invention contains oxygen nanobubbles having a mean particle size of 30 nm or less and a density of 1016 bubbles per ml, preferably a mean particle size of 1 to 10 nm and a density 1017 bubbles or more per ml, respectively, as determined by a measurement with a cryo-transmission electron microscope by an ice-embedding method.Type: ApplicationFiled: May 11, 2017Publication date: October 3, 2019Applicants: SIGMA-TECHNOLOGY INC.Inventors: Dai YAMANOUCHI, Yoshiaki TACHIBANA, Kosuke TACHIBANA
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Patent number: 10293309Abstract: A new method for generating micro-nano bubbles that uses water hammering, a bubble generating nozzle, and an apparatus for generating micro-nano bubbles are provided to construct a system. The system is for generating micro-nano bubbles in a large amount using only pure water, which does not include any nucleating agents, and for performing not only a clean washing and sterilization but also the generation of uncontaminated micro-nano bubbles. The method defined in the present invention uses water hammering power produced by a mutual collision of jets of dissolved-gas-including solution squirted from two or more spouts.Type: GrantFiled: June 13, 2013Date of Patent: May 21, 2019Assignee: SIGMA-TECHNOLOGY INC.Inventors: Yoshiaki Tachibana, Kousuke Tachibana, Kaoru Harada, Souzou Sasajima, Kunihiro Tamahashi, Kyoko Honma, Yuuki Matsumoto
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Publication number: 20180161737Abstract: Provided are a cleaning method and cleaning device for cleaning with micro/nano-bubbles, with which a simple method of spraying a treatment solution containing micro/nano-bubbles onto a substrate to be processed makes it possible to efficiently and reliably peel off residual resist or remove contaminants from the substrate, while reducing an environmental load. This cleaning method is characterized in that, with respect to a substrate to be treated to which a resist film has adhered onto the substrate or a substrate to be treated to which the surface thereof has been contaminated with a metal or metal compounds, the resist film is peeled off or the metals or metal compounds are removed by spraying onto the substrate to be treated a treatment solution containing gaseous micro/nano-bubbles and having a temperature maintained at 30° C. to 90° C.Type: ApplicationFiled: December 1, 2015Publication date: June 14, 2018Applicant: SIGMA-TECHNOLOGY INC.Inventor: Yoshiaki TACHIBANA