Patents Assigned to SIGMA-TECHNOLOGY INC.
  • Publication number: 20200338000
    Abstract: Provided is a method for manufacturing an administrable aqueous solution to a living body, the administrable aqueous solution having a function of supplying sufficient oxygen to peripheral cells, causing less damage and injury of cells under a hypoxic or anaerobic stimulation, and continuously exhibiting a sufficiently high and stable effect to protect cells. The administrable aqueous solution to a living body according to the present invention contains oxygen nanobubbles having a mean particle size of 30 nm or less and a density of 1016 bubbles per ml, preferably a mean particle size of 1 to 10 nm and a density 1017 bubbles or more per ml, respectively, as determined by a measurement with a cryo-transmission electron microscope by an ice-embedding method.
    Type: Application
    Filed: July 7, 2020
    Publication date: October 29, 2020
    Applicants: SIGMA-TECHNOLOGY INC.
    Inventors: Dai YAMANOUCHI, Yoshiaki TACHIBANA, Kosuke TACHIBANA
  • Publication number: 20200238654
    Abstract: Provided are a cleaning method and cleaning device for cleaning with micro/nano-bubbles, with which a simple method of spraying a treatment solution containing micro/nano-bubbles onto a substrate to be processed makes it possible to efficiently and reliably peel off residual resist or remove contaminants from the substrate, while reducing an environmental load. This cleaning method is characterized in that, with respect to a substrate to be treated to which a resist film has adhered onto the substrate or a substrate to be treated to which the surface thereof has been contaminated with a metal or metal compounds, the resist film is peeled off or the metals or metal compounds are removed by spraying onto the substrate to be treated a treatment solution containing gaseous micro/nano-bubbles and having a temperature maintained at 30° C. to 90° C.
    Type: Application
    Filed: July 12, 2019
    Publication date: July 30, 2020
    Applicant: SIGMA-TECHNOLOGY INC.
    Inventor: Yoshiaki TACHIBANA
  • Patent number: 10632506
    Abstract: Provided are a cleaning method and cleaning device for cleaning with micro/nano-bubbles, with which a simple method of spraying a treatment solution containing micro/nano-bubbles onto a substrate to be processed makes it possible to efficiently and reliably peel off residual resist or remove contaminants from the substrate, while reducing an environmental load. This cleaning method is characterized in that, with respect to a substrate to be treated to which a resist film has adhered onto the substrate or a substrate to be treated to which the surface thereof has been contaminated with a metal or metal compounds, the resist film is peeled off or the metals or metal compounds are removed by spraying onto the substrate to be treated a treatment solution containing gaseous micro/nano-bubbles and having a temperature maintained at 30° C. to 90° C.
    Type: Grant
    Filed: December 1, 2015
    Date of Patent: April 28, 2020
    Assignee: SIGMA-TECHNOLOGY INC.
    Inventor: Yoshiaki Tachibana
  • Publication number: 20190329520
    Abstract: Provided are a cleaning method and cleaning device for cleaning with micro/nano-bubbles, with which a simple method of spraying a treatment solution containing micro/nano-bubbles onto a substrate to be processed makes it possible to efficiently and reliably peel off residual resist or remove contaminants from the substrate, while reducing an environmental load. This cleaning method is characterized in that, with respect to a substrate to be treated to which a resist film has adhered onto the substrate or a substrate to be treated to which the surface thereof has been contaminated with a metal or metal compounds, the resist film is peeled off or the metals or metal compounds are removed by spraying onto the substrate to be treated a treatment solution containing gaseous micro/nano-bubbles and having a temperature maintained at 30° C. to 90° C.
    Type: Application
    Filed: July 12, 2019
    Publication date: October 31, 2019
    Applicant: SIGMA-TECHNOLOGY INC.
    Inventor: Yoshiaki TACHIBANA
  • Publication number: 20190298653
    Abstract: Provided are an administrable aqueous solution to a living body and a method for manufacturing the same, the administrable aqueous solution having a function of supplying sufficient oxygen to peripheral cells, causing less damage and injury of cells under a hypoxic or anaerobic stimulation, and continuously exhibiting a sufficiently high and stable effect to protect cells. The administrable aqueous solution to a living body according to the present invention contains oxygen nanobubbles having a mean particle size of 30 nm or less and a density of 1016 bubbles per ml, preferably a mean particle size of 1 to 10 nm and a density 1017 bubbles or more per ml, respectively, as determined by a measurement with a cryo-transmission electron microscope by an ice-embedding method.
    Type: Application
    Filed: May 11, 2017
    Publication date: October 3, 2019
    Applicants: SIGMA-TECHNOLOGY INC.
    Inventors: Dai YAMANOUCHI, Yoshiaki TACHIBANA, Kosuke TACHIBANA
  • Patent number: 10293309
    Abstract: A new method for generating micro-nano bubbles that uses water hammering, a bubble generating nozzle, and an apparatus for generating micro-nano bubbles are provided to construct a system. The system is for generating micro-nano bubbles in a large amount using only pure water, which does not include any nucleating agents, and for performing not only a clean washing and sterilization but also the generation of uncontaminated micro-nano bubbles. The method defined in the present invention uses water hammering power produced by a mutual collision of jets of dissolved-gas-including solution squirted from two or more spouts.
    Type: Grant
    Filed: June 13, 2013
    Date of Patent: May 21, 2019
    Assignee: SIGMA-TECHNOLOGY INC.
    Inventors: Yoshiaki Tachibana, Kousuke Tachibana, Kaoru Harada, Souzou Sasajima, Kunihiro Tamahashi, Kyoko Honma, Yuuki Matsumoto
  • Publication number: 20180161737
    Abstract: Provided are a cleaning method and cleaning device for cleaning with micro/nano-bubbles, with which a simple method of spraying a treatment solution containing micro/nano-bubbles onto a substrate to be processed makes it possible to efficiently and reliably peel off residual resist or remove contaminants from the substrate, while reducing an environmental load. This cleaning method is characterized in that, with respect to a substrate to be treated to which a resist film has adhered onto the substrate or a substrate to be treated to which the surface thereof has been contaminated with a metal or metal compounds, the resist film is peeled off or the metals or metal compounds are removed by spraying onto the substrate to be treated a treatment solution containing gaseous micro/nano-bubbles and having a temperature maintained at 30° C. to 90° C.
    Type: Application
    Filed: December 1, 2015
    Publication date: June 14, 2018
    Applicant: SIGMA-TECHNOLOGY INC.
    Inventor: Yoshiaki TACHIBANA