Patents Assigned to Silex Microsystems AG
  • Patent number: 7560802
    Abstract: A method of making an electrical connection between a first (top) and a second (bottom) surface of a conducting or semi-conducting substrate includes creating a trench in the first surface, and establishing an insulating enclosure entirely separating a portion of the substrate, defined by the trench. Also described is a product usable as a starting substrate for the manufacture of micro-electronic and/or micro-mechanic devices, including a flat substrate of a semi-conducting or conducting material, and having a first and a second surface and at least one electrically conducting member extending through the substrate. The electrically conducting member is insulated from surrounding material of the flat substrate by a finite layer of an insulating material, and includes the same material as the substrate, i.e. it is made from the wafer material.
    Type: Grant
    Filed: March 22, 2004
    Date of Patent: July 14, 2009
    Assignee: Silex Microsystems AG
    Inventors: Edvard Kälvesten, Thorbjörn Ebefors, Niklas Svedin, Pelle Rangsten, Tommy Schönberg