Patents Assigned to SILICON FIDELITY
  • Patent number: 9306059
    Abstract: A slotted gate power transistor is a lateral power device including a substrate, a gate dielectric formed over the substrate, a channel region in the substrate below the gate dielectric and gate electrode layer formed over the gate dielectric. The gate electrode layer overlaps the gate dielectric above the channel region, an accumulation region, and a drift region below an oxide filled shallow trench isolation (or STI) or locally oxidized silicon (LOCOS) region. The slotted gate power transistor includes one or more slots or openings on the gate electrode layer over the accumulation region. Electrical connectivity is maintained over the entire gate electrode layer without external wiring.
    Type: Grant
    Filed: March 20, 2014
    Date of Patent: April 5, 2016
    Assignees: Kinetic Technologies, Silicon Fidelity
    Inventors: Farshid Iravani, Jan Nilsson
  • Publication number: 20150270389
    Abstract: A slotted gate power transistor is a lateral power device including a substrate, a gate dielectric formed over the substrate, a channel region in the substrate below the gate dielectric and gate electrode layer formed over the gate dielectric. The gate electrode layer overlaps the gate dielectric above the channel region, an accumulation region, and a drift region below an oxide filled shallow trench isolation (or STI) or locally oxidized silicon (LOCOS) region. The slotted gate power transistor includes one or more slots or openings on the gate electrode layer over the accumulation region. Electrical connectivity is maintained over the entire gate electrode layer without external wiring.
    Type: Application
    Filed: March 20, 2014
    Publication date: September 24, 2015
    Applicants: SILICON FIDELITY, KINETIC TECHNOLOGIES
    Inventors: Farshid IRAVANI, Jan NILSSON