Abstract: Systems and methods related to learning-based analyzers (both supervised and unsupervised) for mitigating latch-up in integrated circuits are provided. An example method includes obtaining latch-up data concerning at least one integrated circuit configured to operate under a range of temperature conditions, where the at least one integrated circuit comprises a core portion including at least a plurality of devices each having one or more structural features formed using a lithographic process, and an input/output portion. The method further includes training the learning-based system based on training data derived from the latch-up data and a first layout rule concerning a first spacing between the core portion and the input/output portion. The method further includes using the learning-based system generating a second layout rule concerning the first spacing between the core portion and the input/output portion, where the second layout rule is different from the first layout rule.

Abstract: Structures and processes for improving radiation hardness and eliminating latch-up in integrated circuits are provided. An example process includes forming a first doped buried layer, a first well, and a second well, and using a first mask, forming a second doped buried layer only in a first region above the first doped buried layer and between at least the first well and the second well, where the first mask is configured to control spacing between the wells and the doped buried layers. The process further includes using a second mask, forming a vertical conductor located only in a second region above the first region and between at least the first well and the second well, where the vertical conductor is doped to provide a low resistance link between the second doped buried layer and at least a top surface of the substrate.

Abstract: Systems and methods related to learning-based analyzers (both supervised and unsupervised) for mitigating latch-up in integrated circuits are provided. An example method includes obtaining latch-up data concerning at least one integrated circuit configured to operate under a range of temperature conditions, where the at least one integrated circuit comprises a core portion including at least a plurality of devices each having one or more structural features formed using a lithographic process, and an input/output portion. The method further includes training the learning-based system based on training data derived from the latch-up data and a first layout rule concerning a first spacing between the core portion and the input/output portion. The method further includes using the learning-based system generating a second layout rule concerning the first spacing between the core portion and the input/output portion, where the second layout rule is different from the first layout rule.

Abstract: Structures and processes for improving radiation hardness and eliminating latch-up in integrated circuits are provided. An example process includes forming a first doped buried layer, a first well, and a second well, and using a first mask, forming a second doped buried layer only in a first region above the first doped buried layer and between at least the first well and the second well, where the first mask is configured to control spacing between the wells and the doped buried layers. The process further includes using a second mask, forming a vertical conductor located only in a second region above the first region and between at least the first well and the second well, where the vertical conductor is doped to provide a low resistance link between the second doped buried layer and at least a top surface of the substrate.

Abstract: A low electrical and thermal resistance FinFET device includes a semiconductor body, a fin body on the substrate wafer, an isolation structure forming a fin connecting region, a gate dielectric on the fin body extending above the isolation structure, a FinFET gate electrode on the gate dielectric, a heavily-doped buried layer in the semiconductor body extending under said fin, and a vertical conductive region extending from the semiconductor body surface to the heavily-doped buried layer. Additionally, a fin body-to-buried layer implanted region disposed in the fin connecting region provides a low electrical and thermal resistance shunt from the fin body to the heavily-doped buried layer.

Abstract: A low electrical and thermal resistance FinFET device includes a semiconductor body, a fin body on the substrate wafer, an isolation structure forming a fin connecting region, a gate dielectric on the fin body extending above the isolation structure, a FinFET gate electrode on the gate dielectric, a heavily-doped buried layer in the semiconductor body extending under said fin, and a vertical conductive region extending from the semiconductor body surface to the heavily-doped buried layer. Additionally, a fin body-to-buried layer implanted region disposed in the fin connecting region provides a low electrical and thermal resistance shunt from the fin body to the heavily-doped buried layer.

Abstract: An example integrated circuit includes a first memory array including a first plurality of data groups, each such data group including a respective plurality of data bits. The integrated circuit also includes a first error detection and correction (EDAC) circuit configured to detect and correct an error in a data group read from the first memory array. The integrated circuit also includes a first scrub circuit configured to access in a sequence each of the first plurality of data groups to correct any detected errors therein. Both the first EDAC circuit and the first scrub circuit include spatially redundant circuitry. The first EDAC circuit and the first scrub circuit may include buried guard ring (BGR) structures, and may include parasitic isolation device (PID) structures. The spatially redundant circuitry may include dual interlocked storage cell (DICE) circuits, and may include temporal filtering circuitry.

Abstract: An example integrated circuit includes a first memory array including a first plurality of data groups, each such data group including a respective plurality of data bits. The integrated circuit also includes a first error detection and correction (EDAC) circuit configured to detect and correct an error in a data group read from the first memory array. The integrated circuit also includes a first scrub circuit configured to access in a sequence each of the first plurality of data groups to correct any detected errors therein. Both the first EDAC circuit and the first scrub circuit include spatially redundant circuitry. The first EDAC circuit and the first scrub circuit may include buried guard ring (BGR) structures, and may include parasitic isolation device (PID) structures. The spatially redundant circuitry may include dual interlocked storage cell (DICE) circuits, and may include temporal filtering circuitry.

Abstract: An example integrated circuit includes a first memory array including a first plurality of data groups, each such data group including a respective plurality of data bits. The integrated circuit also includes a first error detection and correction (EDAC) circuit configured to detect and correct an error in a data group read from the first memory array. The integrated circuit also includes a first scrub circuit configured to access in a sequence each of the first plurality of data groups to correct any detected errors therein. Both the first EDAC circuit and the first scrub circuit include spatially redundant circuitry. The first EDAC circuit and the first scrub circuit may include buried guard ring (BGR) structures, and may include parasitic isolation device (PID) structures. The spatially redundant circuitry may include dual interlocked storage cell (DICE) circuits, and may include temporal filtering circuitry.

Abstract: Semiconductor devices can be fabricated using conventional designs and process but including specialized structures to reduce or eliminate detrimental effects caused by various forms of radiation. Such semiconductor devices can include the one or more parasitic isolation devices and/or buried guard ring structures disclosed in the present application. The introduction of design and/or process steps to accommodate these novel structures is compatible with conventional CMOS fabrication processes, and can therefore be accomplished at relatively low cost and with relative simplicity.

Abstract: Semiconductor devices can be fabricated using conventional designs and process but including specialized structures to reduce or eliminate detrimental effects caused by various forms of radiation. Such semiconductor devices can include the one or more parasitic isolation devices and/or buried guard ring structures disclosed in the present application. The introduction of design and/or process steps to accommodate these novel structures is compatible with conventional CMOS fabrication processes, and can therefore be accomplished at relatively low cost and with relative simplicity.

Abstract: Semiconductor devices can be fabricated using conventional designs and process but including specialized structures to reduce or eliminate detrimental effects caused by various forms of radiation. Such semiconductor devices can include the one or more parasitic isolation devices and/or buried guard ring structures disclosed in the present application. The introduction of design and/or process steps to accommodate these novel structures is compatible with conventional CMOS fabrication processes, and can therefore be accomplished at relatively low cost and with relative simplicity.

Abstract: Radiation hardened integrated circuit devices may be fabricated using conventional designs and process, but including specialized structures to reduce or eliminate detrimental effects caused by various forms of radiation. An exemplary BGR structure includes a high-dose buried guard ring (HBGR) layer which is contacted to ground through the backside of the wafer or circuit die, thus forming a Backside BGR (BBGR) structure. In certain embodiments, the starting wafer may be highly doped to reduce the resistance from the HBGR to the back of the wafer, which is then further contacted to ground through the package. The performance of such devices may be further improved by using an electrically conductive adhesive to attach the die and to electrically connect the silicon substrate region to the package's conductive header, substrate, or die attach pad, which in turn is typically connected to one or more package pins/balls.