Patents Assigned to Silicon Valley Chemlabs
  • Composition and method for removing resist and etching residues using hydroxylazmmonium carboxylates
    Patent number: 6432209
    Abstract: A mixture of hydroxylamine partially neutralized with a weak carboxylic acid and an organic solvent such as an alkyl sulfoxide, a pyrrolidinone or a sulfone removes hardened photoresist and polymeric photoresist residues from a substrate with reduced metal corrosion.
    Type: Grant
    Filed: March 3, 1998
    Date of Patent: August 13, 2002
    Assignee: Silicon Valley Chemlabs
    Inventor: Javad J. Sahbari
  • Composition and method for removing probing ink and negative photoresist from silicon wafers enclosures
    Patent number: 6261735
    Abstract: A composition and method for removing probing ink and negative photoresist from a substrate with reduced metal corrosion, low toxicity and rapid removal rates. The composition includes a mixture of anisole, an alkylarylsulfonic acid, and aliphatic hydrocarbons containing 9 to 13 carbon atoms.
    Type: Grant
    Filed: November 24, 1998
    Date of Patent: July 17, 2001
    Assignee: Silicon Valley Chemlabs, Inc.
    Inventor: Javad J. Sahbari
  • Method of manufacturing high purity oximes from aqueous hydroxylamine and ketones
    Patent number: 6235935
    Abstract: High purity oximes are prepared from aqueous hydroxylamine and ketones reacted at ambient temperature without addition of impurities such as salts or acids.
    Type: Grant
    Filed: November 24, 1998
    Date of Patent: May 22, 2001
    Assignee: Silicon Valley Chemlabs, Inc.
    Inventors: Javad J. Sahbari, Jin Wang Russell
  • Method of manufacturing high purity amidoximes from hydroxylamine and nitriles
    Patent number: 6166254
    Abstract: Amidoximes are prepared from aqueous hydroxylamine and nitrites to yield amidoximes. Reaction of acetonitrile with aqueous hydroxylamine at ambient temperature yields acetamidoxime crystals.
    Type: Grant
    Filed: November 24, 1998
    Date of Patent: December 26, 2000
    Assignee: Silicon Valley Chemlabs, Inc.
    Inventors: Javad J. Sahbari, Jin Wang Russell
  • Dibasic ester stripping composition
    Patent number: 5909744
    Abstract: A mixture of a dibasic ester (DBE), an alcohol, and water to remove photoresist from a silicon wafer substrate. Photoresist is effectively removed at ambient temperature with this non-phenolic, non-halogenated stripper solution. Dissolved photoresist is easily separated from the water mixture for disposal.
    Type: Grant
    Filed: April 20, 1998
    Date of Patent: June 8, 1999
    Assignee: Silicon Valley Chemlabs, Inc.
    Inventor: Javad J. Sahbari
  • Dibasic ester stripping composition
    Patent number: 5741368
    Abstract: A mixture of a dibasic ester (DBE), an alcohol, and water to remove photoresist from a silicon wafer substrate. Photoresist is effectively removed at ambient temperature with this non-phenolic, non-halogenated stripper solution. Dissolved photoresist is easily separated from the water mixture for disposal.
    Type: Grant
    Filed: January 30, 1996
    Date of Patent: April 21, 1998
    Assignee: Silicon Valley Chemlabs
    Inventor: Javad J. Sahbari