Patents Assigned to Silicon Valley Group, Thermal Systems LLP
  • Chemical vapor deposition of silicon oxide films using alkylsiloxane oligomers with ozone
    Patent number: 6465044
    Abstract: This invention relates to a method of depositing silicon oxide films on the surface of semiconductor substrates, and more particularly to depositing such films by chemical vapor deposition using alkylsiloxane oligomers precursors with ozone.
    Type: Grant
    Filed: April 4, 2000
    Date of Patent: October 15, 2002
    Assignee: Silicon Valley Group, Thermal Systems LLP
    Inventors: Sanjeev Jain, Zheng Yuan