Patents Assigned to Silicycle Inc.
  • Patent number: 7052665
    Abstract: Highly ordered mesoporous silica molecular materials are prepared using sodium silicate as a silica source, sulfuric acid and nonionic poly(alkylene oxide) surfactants or nonionic amphiphilic bloc copolymers as structure-directing agents. The mesoporous silica materials obtained have hexagonal and cubic structures, uniform pore size and high surface areas.
    Type: Grant
    Filed: November 1, 2002
    Date of Patent: May 30, 2006
    Assignee: Silicycle Inc.
    Inventors: Luc Fortier, Pierre Fournier, Serge Kaliaguine, Do Trong On
  • Patent number: 6248683
    Abstract: The present invention is concerned a process for the regeneration of the spent silica gel used in chromatography and for any other kind of silica. The process comprises 5 main steps, namely: washing with an extractant of organic compounds and removing volatile organic materials remaining thereafter; oxidation to oxidize organic compounds remaining and, preferably, bleach the material; washing with an acid to remove soluble inorganic matter; heating to dry the material and combust any remaining organic compounds present; and recovering the regenerated material. Various optional steps can be added to the process.
    Type: Grant
    Filed: April 7, 1999
    Date of Patent: June 19, 2001
    Assignee: Silicycle Inc.
    Inventors: Luc Fortier, Simon Côté, Hugo St-Laurent, Simon Bernier, André Couture