Abstract: Highly ordered mesoporous silica molecular materials are prepared using sodium silicate as a silica source, sulfuric acid and nonionic poly(alkylene oxide) surfactants or nonionic amphiphilic bloc copolymers as structure-directing agents. The mesoporous silica materials obtained have hexagonal and cubic structures, uniform pore size and high surface areas.
Type:
Grant
Filed:
November 1, 2002
Date of Patent:
May 30, 2006
Assignee:
Silicycle Inc.
Inventors:
Luc Fortier, Pierre Fournier, Serge Kaliaguine, Do Trong On
Abstract: The present invention is concerned a process for the regeneration of the spent silica gel used in chromatography and for any other kind of silica. The process comprises 5 main steps, namely:
washing with an extractant of organic compounds and removing volatile organic materials remaining thereafter;
oxidation to oxidize organic compounds remaining and, preferably, bleach the material;
washing with an acid to remove soluble inorganic matter;
heating to dry the material and combust any remaining organic compounds present; and
recovering the regenerated material.
Various optional steps can be added to the process.
Type:
Grant
Filed:
April 7, 1999
Date of Patent:
June 19, 2001
Assignee:
Silicycle Inc.
Inventors:
Luc Fortier, Simon Côté, Hugo St-Laurent, Simon Bernier, André Couture