Patents Assigned to Siltectra
  • Patent number: 10304738
    Abstract: The present invention relates to a method for the production of layers of solid material, in particular for use as wafers. The method may include the following steps: providing a workpiece for the separation of the layers of solid material with the workpiece optionally having at least one exposed surface, producing and/or providing a carrier unit for receiving at least one layer of solid material having the carrier unit optionally having a receiving layer for holding the layer of solid material, attaching the receiving layer to the exposed surface of the workpiece forming a composite structure, producing a break initiation point by means of pre-defined local stress induction in the peripheral region, including at the edge, of the workpiece, and separating the layer of solid material from the workpiece starting from the break initiation point.
    Type: Grant
    Filed: September 18, 2018
    Date of Patent: May 28, 2019
    Assignee: Siltectra
    Inventors: Lukas Lichtensteiger, Wolfram Drescher