Patents Assigned to Siluria Technologies, Inc.
  • Patent number: 9133079
    Abstract: Disclosed herein are processes for producing and separating ethane and ethylene. In some embodiments, an oxidative coupling of methane (OCM) product gas comprising ethane and ethylene is introduced to a separation unit comprising two separators. Within the separation unit, the OCM product gas is separated to provide a C2-rich effluent, a methane-rich effluent, and a nitrogen-rich effluent. Advantageously, in some embodiments the separation is achieved with little or no external refrigeration requirement.
    Type: Grant
    Filed: January 11, 2013
    Date of Patent: September 15, 2015
    Assignee: Siluria Technologies, Inc.
    Inventors: Sam Weinberger, Justin Dwight Edwards, Julian Wolfenbarger, Srinivas R. Vuddagiri, Iraj Isaac Rahmim
  • Patent number: 9040762
    Abstract: Metal oxide catalysts comprising various dopants are provided. The catalysts are useful as heterogenous catalysts in a variety of catalytic reactions, for example, the oxidative coupling of methane to C2 hydrocarbons such as ethane and ethylene. Related methods for use and manufacture of the same are also disclosed.
    Type: Grant
    Filed: October 17, 2014
    Date of Patent: May 26, 2015
    Assignee: Siluria Technologies, Inc.
    Inventors: Joel M. Cizeron, Erik C. Scher, Fabio R. Zurcher, Wayne P. Schammel, Greg Nyce, Anja Rumplecker, Jarod McCormick, Marian Alcid, Joel Gamoras, Daniel Rosenberg, Erik-Jan Ras
  • Patent number: 8962517
    Abstract: Nanowires useful as heterogeneous catalysts are provided. The nanowire catalysts are useful in a variety of catalytic reactions, for example, the oxidative coupling of methane to C2 hydrocarbons. Related methods for use and manufacture of the same are also disclosed.
    Type: Grant
    Filed: November 29, 2012
    Date of Patent: February 24, 2015
    Assignee: Siluria Technologies, Inc.
    Inventors: Fabio R. Zurcher, Erik C. Scher, Joel M. Cizeron, Wayne P. Schammel, Alex Tkachenko, Joel Gamoras, Dmitry Karshtedt, Greg Nyce, Anja Rumplecker, Jarod McCormick, Anna Merzlyak, Marian Alcid, Daniel Rosenberg, Erik-Jan Ras
  • Patent number: 8921256
    Abstract: Metal oxide catalysts comprising various dopants are provided. The catalysts are useful as heterogenous catalysts in a variety of catalytic reactions, for example, the oxidative coupling of methane to C2 hydrocarbons such as ethane and ethylene. Related methods for use and manufacture of the same are also disclosed.
    Type: Grant
    Filed: May 24, 2012
    Date of Patent: December 30, 2014
    Assignee: Siluria Technologies, Inc.
    Inventors: Joel M. Cizeron, Erik Scher, Fabio R. Zurcher, Wayne P. Schammel, Greg Nyce, Anja Rumplecker, Jarod McCormick, Marian Alcid, Joel Gamoras, Daniel Rosenberg, Erik-Jan Ras
  • Patent number: 8865347
    Abstract: Alloys of tunable compositions and corresponding optical, electrical and mechanical properties are described. Also described are their uses in optoelectronic devices and material interfaces.
    Type: Grant
    Filed: February 27, 2007
    Date of Patent: October 21, 2014
    Assignee: Siluria Technologies, Inc.
    Inventors: Evelyn Hu, Angela Belcher, Xina Quan
  • Publication number: 20140274671
    Abstract: Metal oxide catalysts comprising various dopants are provided. The catalysts are useful as heterogenous catalysts in a variety of catalytic reactions, for example, the oxidative coupling of methane to C2 hydrocarbons such as ethane and ethylene. Related methods for use and manufacture of the same are also disclosed.
    Type: Application
    Filed: March 14, 2014
    Publication date: September 18, 2014
    Applicant: Siluria Technologies, Inc.
    Inventors: Wayne P. Schammel, Anja Rumplecker, Joel M. Cizeron, Erik C. Scher, Fabio R. Zurcher, Greg Nyce, Jarod McCormick, Marian Alcid, Joel Gamoras, Daniel Rosenberg, Erik-Jan Ras
  • Publication number: 20140018589
    Abstract: The present disclosure provides natural gas and petrochemical processing systems including oxidative coupling of methane reactor systems that integrate process inputs and outputs to cooperatively utilize different inputs and outputs of the various systems in the production of higher hydrocarbons from natural gas and other hydrocarbon feedstocks.
    Type: Application
    Filed: July 8, 2013
    Publication date: January 16, 2014
    Applicant: Siluria Technologies, Inc.
    Inventors: Rahul Iyer, Alex Tkachenko, Sam Weinberger, Erik Scher, Guido Radaelli, Hatem Harraz
  • Publication number: 20140012053
    Abstract: Natural gas and petrochemical processing systems including oxidative coupling of methane reactor systems that integrate process inputs and outputs to cooperatively utilize different inputs and outputs of the various systems in the production of higher hydrocarbons from natural gas and other hydrocarbon feedstocks.
    Type: Application
    Filed: July 8, 2013
    Publication date: January 9, 2014
    Applicant: Siluria Technologies, Inc.
    Inventors: Rahul Iyer, Alex Takachenko, Sam Weinberger, Erik Scher
  • Publication number: 20120041246
    Abstract: Nanowires useful as heterogeneous catalysts are provided. The nanowire catalysts are useful in a variety of catalytic reactions, for example, the oxidative coupling of methane to ethylene. Related methods for use and manufacture of the same are also disclosed.
    Type: Application
    Filed: May 24, 2011
    Publication date: February 16, 2012
    Applicant: Siluria Technologies, Inc.
    Inventors: Erik C. Scher, Fabio R. Zurcher, Joel M. Cizeron, Wayne P. Schammel, Alex Tkachenko, Joel Gamoras, Dmitry Karshtedt, Greg Nyce
  • Patent number: 7976726
    Abstract: A formulation comprises quantum dots and a quenching-preventive agent in a carrier material. The quenching-preventive agent is a metal chelating agents, a corrosion inhibitor, or a combination thereof. The formulation can be applied to a metal substrate, without experiencing metal ion induced fluorescence quenching.
    Type: Grant
    Filed: April 25, 2007
    Date of Patent: July 12, 2011
    Assignee: Siluria Technologies, Inc.
    Inventors: Cheng-I Wang, Haixia Dai, Manfred Heidecker
  • Patent number: 7960721
    Abstract: A light emitting device includes a substrate layer, a first injection contact positioned over the substrate layer, a first dielectric layer positioned over the first injection contact, a light emission layer positioned over the first dielectric layer, a second dielectric layer positioned over the light emission layer and a second injection contact positioned over the second dielectric layer. The light emission layer includes an organic template having binding sites for binding nanoparticles into an array. The wavelength of emitted light is dependent upon the size of the nanoparticles and the pitch of the array. The light emitting device may include a first plurality of binding sites for binding a first set of nanoparticles and a second plurality of binding sites for binding a second set of nanoparticles. The wavelength depends upon a ratio of the first plurality to the second plurality of binding sites.
    Type: Grant
    Filed: February 13, 2008
    Date of Patent: June 14, 2011
    Assignee: Siluria Technologies, Inc.
    Inventors: Angela Belcher, Evelyn Hu, Xina Quan, Hash Pakbaz
  • Patent number: 7902639
    Abstract: Improved methods and articles providing conformal coatings for a variety of devices including electronic, semiconductor, and liquid crystal display devices. Peptide formulations which bind to nanoparticles and substrates, including substrates with trenches and vias, to provide conformal coverage as a seed layer. The seed layer can be further enhanced with use of metallic films deposited on the seed layer. Seed layers can be characterized by AFM measurements and improved seed layers provide for better enhancement layers including lower resistivity in the enhancement layer. Peptides can be identified by phage display.
    Type: Grant
    Filed: November 16, 2005
    Date of Patent: March 8, 2011
    Assignee: Siluria Technologies, Inc.
    Inventors: Philip E. Garrou, Michael R. Knapp, Hash Pakbaz, Florian Pschenitzka, Xina Quan, Michael A. Spaid
  • Patent number: 7695981
    Abstract: A seed layer is formed on a substrate using a first biological agent. The seed layer may comprise densified nanoparticles which are bound to the biological agent. The seed layer is then used for a deposition of a metal layer, such as a barrier layer, an interconnect layer, a cap layer and/or a bus line for a solid state device.
    Type: Grant
    Filed: May 15, 2006
    Date of Patent: April 13, 2010
    Assignee: Siluria Technologies, Inc.
    Inventors: Haixia Dai, Khashayar Pakbaz, Michael Spaid, Theo Nikiforov
  • Patent number: 7655081
    Abstract: An aqueous substrate surface treatment composition includes cysteine and an acidic solution having a pH of about 7 or less. The composition enables a selective deposition of a metal ion sensitizer and a subsequent selective plating of a metallic cap layer. Various CoWP plating bath compositions are also provided which may be used to form the cap layer.
    Type: Grant
    Filed: May 15, 2006
    Date of Patent: February 2, 2010
    Assignee: Siluria Technologies, Inc.
    Inventors: Haixia Dai, Khashayar Pakbaz, Michael Spaid, Theo Nikiforov