Abstract: Apparatus 1 for gripping, holding and/or transporting substrates 2, components of which are an entry station 3 and several processing station 4 to 9 arranged in series or in a circle for receiving the substrate 2, to which the substrate 2 is passed on by means of a transporting device 1 disposed on gripper arms 13 and having gripper elements 24, or a turntable 12, and subsequently is deposited in one or several deposit stations 14, wherein several gripper arms 13 can be shifted in the horizontal and/or vertical direction by means of the turntable 12. Some of the gripper elements 24 can be shifted together in the horizontal or vertical direction by means of the turntable 12 and at least one gripper arm 13' can be shifted in at least one of the movement directions independently of the remaining gripper arms 13.

Abstract: Apparatus for transporting substrates to and from at least one device (1) for holding substrates (2), the at least one device having a substrate support (5) disposed in a vacuum chamber (4, 4', 4"). The apparatus includes at least one displaceably disposed gripper (75), which can be displaced by a mechanical and/or electro-magnetically or magnetically operating positioning device (130) between a substrate gripping position and a substrate release position, and a centering device (157, 157', 161) for centering a substrate relative to the substrate support in conjunction with transport of the substrate by the apparatus to the substrate support.

Abstract: An apparatus for transporting substrates between a first device and at least one second device for gripping and holding substrates with a substrate holder disposed in a vacuum chamber.

Abstract: A device 1 for gripping and holding substrates 2 with one or several substrate holders 5 arranged in a vacuum chamber 4, 4', 4" and one or several displaceably arranged grippers 3, which can be displaced into a first position through the action of an operating pressure or against the action of a spring 6, and into a second position through the action of a diaphragm 7, which can be exposed to a pneumatic pressure P.sub.a and/or to an operating element 8 cooperating with it, wherein the substrate 2 is held when the diaphragm is in a first position and the substrate 2 is released for being further transported when the diaphragm is in a second position. The diaphragm 7 is integrated into the vacuum chamber in such a way that in an operating position it is exposed to atmospheric pressure P.sub.a on the one side 9 and on the other side 10 to vacuum pressure P.sub.v, and in a second position is exposed to vacuum pressure P.sub.v on both sides.

Abstract: A device for cathode sputtering for producing coatings on a substrate 27 by means of a sputtering cathode, which device can be introduced into a vacuum chamber and has magnets or ring magnets 9, 13 concentrically arranged in respect to the center axis 44 of the sputtering cathode, pole shoes 14 and a target 8. The target has a front surface 41 with at least a surface portion which is inclined with respect to the back surface 40 of the target. In the area of the back surface 40 of the target at least one second, outer ring magnet 42 with a larger diameter is provided in addition to the inner ring magnets 9, 13.

Abstract: Apparatus for surface coating or for lacquering of a substrate, such as a disk-shaped substrate 2, which can be placed on a substrate support 14 and can be driven or made to perform a rotating movement, wherein the medium to be applied or the lacquer fluid is applied to the substrate 2 via a feed device 6 which can be displaced in relation to the substrate 2 and/or can be driven. The substrate 2 or the substrate support 14 can be displaced by means of a guide device or in a connecting link guide 7 in such a way that in the area of the substrate 2 the feed device 6 for applying the fluid or the lacquer is conducted approximately parallel with the surface of the substrate 2 and can be stopped at any arbitrary point above the substrate 2 at an even height distance.

Abstract: A device including a sputtering cathode 2 and masks for masking or covering portions of a surface of a substrates 27, having a center mask guide element 56 on which a center mask 26, which covers the substrate 27, is disposed and works together with an outer mask 4 in such a way that only the uncovered part of the substrate 27 is coated during the coating process. The inner and/or the outer masks 4, 26 can be adjusted independently of each other along a longitudinal center axis 58 of the device.

Abstract: An apparatus for surface coating or for lacquering a substrate, such as a disk-shaped substrate 2, which can be placed on a substrate carrier 14 and can be driven or given a rotating movement by means of a drive device, wherein the material or the lacquer fluid 5 to be applied is placed on the substrate 2 from a feed device 6. The fluid medium or the lacquer 4 released by the substrate support 14 is delivered at least to a first collecting reservoir 17 which is connected with at least one filter 28, from where the fluid is indirectly or directly conducted via a pump 29 to the first collecting reservoir 27, wherein an underpressure can be set between a first flow-off line 33 of the first collecting reservoir 27 and the pump 29.