Abstract: A system that facilitates non-invasive in-line characterization of parameters of VLSI circuit interconnects is provided. A plurality of micro-electro-mechanical system (MEMS) cantilevers apply voltage(s) to VLSI circuit interconnect(s) without physical contact thereto. A measuring component measures deflection characteristics of the cantilevers, the deflection(s) correspond to electrical forces generated from the applied voltage(s) as passed through VLSI circuit interconnect(s). A component computes characteristics of the VLSI interconnect based at least in part upon the measured deflection characteristics.