Abstract: The residual halogen content in alkoxysilanes and in alkoxysilane-based compositions is reduced by a process comprising, treating the alkoxysilane or the alkoxysilane-based composition with activated carbon.
Type:
Grant
Filed:
May 12, 1999
Date of Patent:
August 8, 2000
Assignee:
Sivento Chemie Rheinfelden GmbH
Inventors:
Burkhard Standke, Jaroslaw Monkiewicz, Albert-Johannes Frings, Ralf Laven, Roland Edelmann, Peter Jenkner, Helmut Mack, Michael Horn
Abstract: A process for producing surface-sealed hollow glass containers, wherein as part of the production process the hollow glass containers are coated in the region of the exit from the annealing lehr, which is arranged following a machine for producing hollow glass containers, with a water-based cold end coating composition comprising a silane, where atop this first coat there is subsequently applied a second coat of a water-based cold end coating composition that comprises the following components:I. a water-based organopolysiloxane-containing composition prepared from alkoxysilanes which carry a functional group and alkoxysilanes which are selected from trialkoxysilanes, dialkoxysilanes and tetraalkoxysilanes, andII. a silicon-free component selected from a wax, a partial fatty acid ester, a fatty acid and/or a surfactant.The hollow glass containers produced in this way feature an enhanced long-term service strength.
Type:
Grant
Filed:
March 19, 1999
Date of Patent:
August 1, 2000
Assignees:
Sivento Chemie Rheinfelden GmbH, Oberland Glas AG
Inventors:
Peter Jenkner, Rainer Lomolder, Peter Speier, Elmar Stabler, Alois Fickler, Gerd Buchmayer