Abstract: A method of growing a 4H-poly type SiC single crystal 40, characterized in that the 4H-poly type SiC single crystal 40 is grown on a seed crystal 30 comprised of an SiC single crystal where a {03-38} plane 30u or a plane which is inclined at off angle &agr;, within about 10°, with respect to the {03-38} plane, is exposed.
Type:
Grant
Filed:
February 27, 2002
Date of Patent:
December 9, 2003
Assignees:
Sixon, Inc., Kansai Electric Power C.C., Inc., Mitsubishi Corporation