Abstract: Provided are a polyimide-based film, a window cover film, and a display device including the same. More specifically, a polyimide-based film having different surface energies from each other on both surfaces, a window cover film having excellent optical properties such as a visibility, and a display panel including the same are provided.
Type:
Grant
Filed:
September 28, 2020
Date of Patent:
October 17, 2023
Assignees:
SK Innovation Co., Ltd., SK ie technology Co., Ltd.
Inventors:
Seung Min Jeon, Min Sang Park, Je Seung Park, Yeong Min Jo
Abstract: The present invention relates to a polyimide-based film, a window cover film, and a display panel including the same. More specifically, the present invention relates to a polyimide-based film having a difference (?I) between the maximum and minimum values of intensity in a thickness direction of 0.6 or less, when an aromatic ring peak of 1610 to 1630 cm?1 was measured by Raman spectroscopy in which an excitation wavelength is 532 nm, a laser spot is 1 to 2 ?m, and a thickness direction measurement interval is 1 ?m.
Type:
Grant
Filed:
May 3, 2021
Date of Patent:
October 3, 2023
Assignees:
SK Innovation Co., Ltd., SK ie technology Co., Ltd.
Abstract: Provided is a method of producing a patterned flexible electrode including: a nanowire formation step of applying a first dispersion containing a metal nanowire to a first sheet which is unwound from a wound state to form a nanowire network; a fiber formation step of electrospinning a second dispersion containing metal nanoparticles on the nanowire network to form a fiber-nanowire network in which a metallic fiber of the metal nanoparticles being agglomerated is incorporated into the nanowire network; a sintering step of photonically sintering the fiber-nanowire network to form a conductive network; and a patterning step of patterning the fiber-nanowire network before the sintering step or patterning the conductive network after the sintering step.
Type:
Grant
Filed:
January 13, 2021
Date of Patent:
October 3, 2023
Assignees:
SK Innovation Co., Ltd., Industry-Academic Cooperation Foundation, Yonsei University
Inventors:
Jun Hyung Kim, Sang Yoon Ji, Jang-Ung Park
Abstract: Disclosed herein are a dehydrogenation catalyst having single-atom cobalt loaded onto a silica support that has undergone pretreatment including a thermal treatment and a high-temperature aqueous treatment (reaction), a preparation method therefor, and a method for producing olefins by dehydrogenating corresponding paraffins, particularly light paraffins in the presence of the dehydrogenation catalyst.
Type:
Grant
Filed:
June 25, 2021
Date of Patent:
September 26, 2023
Assignee:
SK Innovation Co., Ltd.
Inventors:
Young Eun Cheon, Hee Soo Kim, Dong Min Yun, Ho Won Lee, Ju Hwan Im
Abstract: Provided is a method of producing polypropylene. More specifically, provided is a method of efficiently producing high-strength isotactic polypropylene having high crystallinity even with a shorter polymerization time. More specifically, provided is a method of producing polypropylene, including polymerizing propylene in the presence of a catalyst composition including a Ziegler-Natta catalyst, an external electron donor, dialkylaluminum hydride, and trialkylaluminum. The polypropylene has a xylene cold soluble content of 3 wt % or less.
Type:
Grant
Filed:
October 13, 2021
Date of Patent:
August 15, 2023
Assignees:
SK Innovation Co., Ltd., SK Geo Centric Co., Ltd.
Inventors:
Hyo Seung Park, Hyeong Min Kim, Sung Jae Na, Ji Hae Park, So Young Shim
Abstract: The present invention relates to a polymer having a novel structure used in a process for manufacturing a semiconductor and a display; an underlayer film composition for a process for manufacturing a semiconductor and a display, including the same; and a method for manufacturing a semiconductor element by using the same. The novel polymer of the present invention has both optimized etch selection ratio and planarization properties and excellent heat resistance, and thus the underlayer film composition including the same can be used as a hard mask in a semiconductor multilayer lithography process.
Type:
Grant
Filed:
July 2, 2018
Date of Patent:
August 15, 2023
Assignees:
SK Innovation Co., Ltd., SK Geo Centric Co., Ltd.
Abstract: Disclosed herein are a dehydrogenation catalyst having single-atom cobalt loaded onto a silica support that has undergone pretreatment including a thermal treatment and a high-temperature aqueous treatment (reaction), a preparation method therefor, and a method for producing olefins by dehydrogenating corresponding paraffins, particularly light paraffins in the presence of the dehydrogenation catalyst.
Type:
Grant
Filed:
June 25, 2021
Date of Patent:
July 18, 2023
Assignee:
SK Innovation Co., Ltd.
Inventors:
Young Eun Cheon, Hee Soo Kim, Dong Min Yun, Ho Won Lee, Ju Hwan Im
Abstract: Provided is a composition for forming a hard coating layer, which includes an epoxy siloxane resin, a crosslinking agent including a compound having an alicyclic epoxy group, a thermal initiator including a compound represented by a specific chemical formula, a photoinitiator, a fluorine-substituted (meth)acrylate compound, and silica nanoparticles surface-modified with a fluorine compound, and forms a hard coating layer having excellent hardness and antifouling property and suppressing curling.
Type:
Grant
Filed:
August 12, 2019
Date of Patent:
July 4, 2023
Assignees:
SK Innovation Co., Ltd., SK ie technology Co., Ltd.
Inventors:
Jong Nam Ahn, Byoung Sun Ko, Jin Su Park, Tae Sug Jang, Ho Chul Yoon
Abstract: Provided is a hard coating film in which a hard coating layer having a water contact angle of 90° or less, a conductive layer, and a low refractive index layer are laminated on a substrate, the film having excellent hardness, anti-curling property, antireflection performance, antifouling performance, and antistatic performance.
Type:
Grant
Filed:
August 22, 2019
Date of Patent:
July 4, 2023
Assignees:
SK Innovation Co., Ltd., SK ie technology Co., Ltd.
Inventors:
Jong Nam Ahn, Tae Sug Jang, Byoung Sun Ko, Jin Su Park, Ho Chul Yoon
Abstract: Provided is a hard coating film in which a hard coating layer having a water contact angle of 90° or less, a high refractive index layer, and a low refractive index layer are laminated on a substrate, the film having suppressed curling, and excellent hardness and antireflection performance.
Type:
Grant
Filed:
August 22, 2019
Date of Patent:
July 4, 2023
Assignees:
SK Innovation Co., Ltd., SK ie technology Co., Ltd.
Inventors:
Jong Nam Ahn, Tae Sug Jang, Byoung Sun Ko, Jin Su Park, Ho Chul Yoon
Abstract: In a method of producing an ethylene-carboxylic acid copolymer, a monomer solution containing a carboxylic acid monomer is supplied from a discharging unit. The carboxylic acid monomer is copolymerized with an ethylene-based monomer. A coefficient of friction between the discharging unit and the monomer solution is maintained as 0.3 or less.
Type:
Grant
Filed:
February 19, 2021
Date of Patent:
June 27, 2023
Assignees:
SK Innovation Co., Ltd., SK Geo Centric Co., Ltd.
Inventors:
Ho Seong Lee, Sun Joo Kim, Jae Hyun Park, Min Gu Kim, Jang Hoon Ock
Abstract: Disclosed is a method of producing lactic acid using a recombinant acid-resistant yeast with inhibited lactate metabolism and alcohol production. More specifically, disclosed are a recombinant acid-resistant yeast in which lactate consumption reaction is reduced and which is imparted with lactic-acid-producing ability to thereby exhibit improved lactic-acid-producing ability and reduced ethanol production, and a method of producing lactic acid using the same.
Type:
Grant
Filed:
October 7, 2020
Date of Patent:
June 20, 2023
Assignee:
SK Innovation Co., Ltd.
Inventors:
Jae Yeon Park, Tae Young Lee, Ki Sung Lee
Abstract: An ethylene-(meth)acrylic acid copolymer has a portion having a melting temperature of 94° C. or higher. A content of the portion having the melting temperature of 94° C. or higher measured by a Successive Self-nucleation and Annealing (SSA) analysis is 1.5% or less. A water-dispersive composition includes the ethylene (meth)acrylic acid copolymer, a neutralizing agent and an aqueous medium.
Type:
Grant
Filed:
June 9, 2021
Date of Patent:
June 6, 2023
Assignees:
SK Innovation Co., Ltd., SK Geo Centric Co., Ltd.
Inventors:
Doh Yeon Park, Ju Eun Jung, Soo Young Hwang, Sang Ha Son, Byoung Kyu Kwak, Hai Jin Shin
Abstract: Provided are a polyimide-based film, a window cover film, and a display panel including the same. More particularly, a polyimide-based film having excellent visibility, a window cover film using the same, and a display panel including the same are provided.
Type:
Grant
Filed:
July 28, 2021
Date of Patent:
May 30, 2023
Assignees:
SK Innovation Co., Ltd., SK ie technology Co., Ltd.
Inventors:
Sun Kug Kim, Min Sang Park, Seung Min Jeon, Jin Su Park, Hyun Joo Song
Abstract: Disclosed are a catalyst and a preparation method therefor, the catalyst being able to maintain a high production yield of C8 aromatic hydrocarbons in the process of converting a feedstock containing alkyl aromatics to C8 aromatic hydrocarbons such as mixed xylene through disproportionation/transalkylation/dealkylation while reducing a content of ethylbenzene in the products.
Type:
Grant
Filed:
October 29, 2020
Date of Patent:
May 30, 2023
Assignee:
SK Innovation Co., Ltd.
Inventors:
Sang Il Lee, Ji Hoon Lee, Young Eun Cheon, Yeon Ho Kim
Abstract: Provided are a polyimide-based film, a window cover film, and a display panel including the same. More particularly, a polyimide-based film having different surface properties of both surfaces is provided.
Type:
Grant
Filed:
June 16, 2021
Date of Patent:
May 23, 2023
Assignees:
SK Innovation Co., Ltd., SK ie technology Co., Ltd.
Inventors:
Jin Su Park, Min Sang Park, Hyun Joo Song, Suk Chin Lee
Abstract: The present invention relates to a window cover film and a flexible display panel including the same. More particularly, the present invention relates to a window cover film including a base layer, a hard coating layer, and an anti-fingerprint layer, and a flexible display panel including the same.
Type:
Grant
Filed:
September 28, 2020
Date of Patent:
May 23, 2023
Assignees:
SK Innovation Co., Ltd., SK ie technology Co., Ltd.
Abstract: The present invention relates to a novel promoter for regulating ADH gene expression in an organic acid-resistant yeast, and a method of producing an organic acid by expressing an organic acid production-related gene using the same. When an organic acid production-related target gene is expressed in the organic acid-resistant yeast using the novel promoter according to the present invention, there is an advantage in that the yeast can produce the organic acid with high efficiency while having resistance to the organic acid without inhibiting the growth ability of the yeast.
Type:
Grant
Filed:
February 28, 2019
Date of Patent:
May 23, 2023
Assignee:
SK Innovation Co., Ltd.
Inventors:
Jae Yeon Park, Tae Young Lee, Ki Sung Lee, Outi Koivistoinen, Kari Koivuranta
Abstract: Disclosed are a bifunctional catalyst and a preparation method therefor, the bifunctional catalyst being suitable to produce high-value aromatic hydrocarbons by subjecting alkylaromatic hydrocarbons to a disproportionation/transalkylation/dealkylation reaction while suppressing aromatic loss or subjecting C8 aromatic hydrocarbons to an isomerization reaction while suppressing xylene loss.
Type:
Grant
Filed:
March 31, 2022
Date of Patent:
May 16, 2023
Assignee:
SK Innovation Co., Ltd.
Inventors:
Sang Il Lee, Ji Hoon Lee, Young Eun Cheon
Abstract: The present invention relates to a method of reducing carbon dioxide and air pollutants, and more particularly to a method of simultaneously reducing emissions of carbon dioxide and air pollutants, in which an off-gas containing carbon dioxide, SOx, and NOx is passed through a sulfur-oxidizing microorganism reactor, thereby converting carbon dioxide present in the off-gas into biomass, SOx into sulfate ions, and NOx into amino-N.
Type:
Grant
Filed:
January 20, 2022
Date of Patent:
May 9, 2023
Assignee:
SK Innovation Co., Ltd.
Inventors:
Yeon Hwa La, Jae Yang Song, Tae Young Lee, Jae Heum Jung, Tae Wan Kim