Abstract: Proposed is a precursor composition for forming a metal film including a zirconium compound represented by any one of Chemical Formulas 1 to 3 and a hafnium compound represented by any one of Chemical Formulas 4 to 6.
Type:
Grant
Filed:
December 6, 2019
Date of Patent:
April 30, 2024
Assignee:
SK TRICHEM
Inventors:
Chang Sung Hong, Yong Joo Park, Tae Hoon Oh, In Chun Hwang, Sang Kyung Lee, Dong Hyun Kim