Abstract: The present invention discloses an apparatus and method for sterilization of articles using capillary discharge atmospheric plasma. More specifically, an apparatus for sterilizing articles using substantially atmospheric pressure plasma includes a plasma generator generating the substantially atmospheric pressure plasma, wherein the plasma generator includes, first and second dielectrics facing into each other, wherein at least one capillary is formed in at least one of the dielectrics, and first and second electrodes on the first and second dielectric bodies, receiving the potential from the power supply, a processing chamber enclosing the plasma generator, and a power supply providing a potential to the plasma generator.

Abstract: An apparatus for sterilizing an article using capillary discharge atmospheric pressure plasma is disclosed. The apparatus includes a power supplier providing a potential to the apparatus, a plasma generating head, a gas supplier providing a sufficient amount of working gas to the plasma generating head, and a body including a handle and coupled to the plasma generating head and the gas supplier. The plasma generating head includes, a metal electrode receiving the potential, a dielectric having at least one capillary therein coupled to the metal electrode, and a shield body surrounding at least a portion of the metal electrode except for the capillary.

Abstract: A plasma apparatus for treating a fluid includes a fluid conduit, a first metal electrode and a second metal electrode mounted in the fluid conduit and receiving a potential, a capillary dielectric between the first and second metal electrodes, wherein the capillary dielectric has at least one capillary, a shield body surrounding at least a portion of the first metal electrode, and a gas supplier providing a sufficient amount of working gas to the first and second metal electrodes, thereby generating a continuous plasma shower within the conduit.

Abstract: A plasma treatment apparatus for a workpiece includes a metal electrode, a capillary dielectric having first and second sides and coupled to the metal electrode through the first side, wherein the capillary dielectric has at least one capillary, a shield body surrounding the metal electrode and the first side of the capillary dielectric, wherein the shield body has first and second end portions, and a gas supplier providing gas to the metal electrode.

Abstract: A method and an apparatus for treating a workpiece using a plasma are disclosed in the present invention. In treating a workpiece using a plasma, the apparatus includes at least one pin electrode for receiving a power source, a dielectric body having first and second sides, wherein the first side is coupled to the pin electrode and the second side has at least one capillary extending to a direction of the first side of the dielectric body, and each capillary is substantially aligned with each pin electrode, and a counter electrode electrically coupled to the pin electrode for generating the plasma from each capillary.

Abstract: High throughput and low capital equipment costs can be achieved by increasing process rates was well as increasing the number of deposition clusters in a current cluster system. Increases in throughput can be achieved by multi-wafer entry mode wherein a stack of multiple wafers is introduced to a processing chamber via a transfer chamber. Thus, no gate valves are required for each deposition stage and a conveyor transports the individual wafer from deposition stage to deposition stage thereby increasing throughput. The elimination of gate valves, pumps, control electronics and other miscellaneous parts will also reduce the cost of the equipment.

Abstract: A field emission display and a method of fabricating the same are disclosed in the present invention. The field emission display includes a glass substrate, an electron emitter on the glass substrate, a first electrode on the electron emitter having a first hollow substantially on the center thereon, an insulating layer on the first electrode having a second hollow in the vicinity of the first hollow, and a second electrode on the insulating layer having a third hollow located over the first and second hollows.

Abstract: A cold cathode electron emission structure includes an amorphous carbon matrix having cesium dispersed therein, with the cesium present in substantially non-crystalline form. A cesium-carbon-oxide layer is positioned on the amorphous carbon matrix, constitutes an electron emission surface and causes the cold cathode electron emission structure to exhibit a lowered surface work function. A display structure including the aforedescribed cold cathode electron emission structure further includes a target electrode including a phosphor and exhibiting a target potential for attraction of electrons. A gate electrode is positioned between the electron emission structure and the target electrode and is biased at a gate potential which attracts electrons, but which is insufficient, in combination with the target potential, to cause emission of a beam of electrons from the electron emission structure.