Abstract: The invention concerns a novel mesh structure with high resistance in particular to piercing and tearing.The object of the invention is a novel mesh structure with high resistance in particular to piercing and to tearing, characterized in that it comprises a knit structure, the texture of which is formed of an entirety of forward meshes comprising a quilting stitch, two cylindrical reverses and a flat weft, repeated every eight drops, with the threads constituting the knit being formed of polyaramide fibers.The invention is useful in the fashioning of clothing, linings or walls for protective and/or safety purposes.
Type:
Grant
Filed:
February 14, 1990
Date of Patent:
December 17, 1991
Assignee:
Societe Civile d'Inventeurs SPML
Inventors:
Didier Melec, Claudine You, Genevieve Lefere, Claudine Peres