Abstract: A mask (MM) with patterns (MF) for use in a reflection lithography device with a photon beam with a wavelength of less than about 120 nm. Said mask (MM) comprises a planar substrate (ST) fixed to a reflecting structure (SMR) comprising a front face provided with selected patterns (MF) made from a material which is absorbent at the given wavelength and further comprises protection means (SP) which are transparent to the given wavelength and arranged such as to maintain a distance (H) between the perturbing particles (PP) and the patterns (MF) greater than or equal to one of the values of the depth of focus of the lithographic device and the height associated with the percentage of photon absorption by the perturbing particles (PP) which is acceptable.

Abstract: The invention concerns an equipment for monitoring an immersion lithography device provided with a main light source and a projection optics for printing images on a wafer. The propagating medium extending from the projection optics to the wafer consists of a liquid (3). The equipment comprises: a chamber (51) for receiving at least part of said liquid (3), a diffraction grating (50) immersed in the chamber; a secondary light source (271) for emitting a secondary incident beam (20) towards the grating so as to obtain a diffracted beam; angle measuring members (57) capable of measuring at least one diffraction angle corresponding to a maximum intensity of an order of diffraction of the beam diffracted by the grating (500), and computing means (505) for calculating an estimate of a physical quantity concerning the refractive index of the liquid.

Abstract: The invention concerns an ellipsometer comprising: a source (2) capable of emitting a broadband ray (4), a polarizer (10) for producing a polarised incident beam (12) adapted to illuminate a sample (16) according to at least a selected angle; an analyzer (24) providing an output beam (28) in response to said reflected beam (20) and at least a reflecting optical element (14) arranged between the source (2) and the sample (16) and/or between the sample (16) and the sensor, and capable of focusing the incident beam (12) and/or the reflected beam (20) according to a selected spot The ellipsometer further comprises at least a first refracting optical element (22) arranged between the sample (16) and the sensor and/or between the source (2) and the sample (16) to collect and focus said reflected beam and/or said incident beam, thereby enabling to provide at least a refracting element (22) and a reflecting element (14) on either side of the sample (16) and hence to place the source and the sensor on the same side re

Abstract: The invention concerns an ellipsometer comprising a source (S) supplying at least an infrared radiation, a sample-holder (PE), a sensor (D), a first optical system mounted between the source (S) and the sample-holder (PE), so as to illuminate a sample placed on the sample-holder, under oblique view with a polarised light beam and a second optical system mounted between the sample-holder (PE) and the sensor (D) for collecting the light reflected by the sample. The ellipsometer further comprises a blocking device (F2) mounted on the reflection path in the focal plane of the focusing device (M2) of the second optical system, and adapted to block parasite rays (RP) derived from the rear surface (FAR) of the sample and to allow through useful rays (RU) derived from the front surface (FAV) of the sample towards the sensor (D), thereby enabling to obtain a resolution with respect to the sample front and rear surfaces.

Abstract: An ellipsometric metrology apparatus for a sample contained in a chamber. A light source outside the chamber produces the illuminating beam. A polarizing device outside the chamber polarizes the illuminating beam. A window of selected dimensions and features is disposed in a plane substantially parallel to the sample surface and at least partly closes the chamber. A first directing device directs the polarized illuminating beam on to an area of the sample along a first optical path extending from the polarizing device to the area of the sample through the window. The first optical path forms a predetermined oblique angle of incidence relative to the sample surface. A polarization analyzing device is outside the chamber, a second directing device directs the reflected beam resulting from the illumination of the sample by the illuminating beam on to the analyzing device along a second optical path extending from the sample towards the analyzing device through the window.

Abstract: A gas laser device. The device includes a laser chamber having at least one active gas and a device for purifying gas. The purified gas is in communication with the free exchange of gas with the chamber. This device may be used with high powered gas lasers.

Abstract: An optical device for homogenizing a laser beam includes a plurality of abutting front lenses (LF.sub.nm) for dividing the laser beam to be homogenized into m.times.n laser beams, each having a substantially uniform cross section, and a substantially homogeneous energy distribution; a first intermediate plane (PI1) located in the focal plane of the front lenses (LF.sub.mn) and having a plurality of entrance pupils (PE.sub.ij) each of which is arranged at the focus of a front lens (LF.sub.mn) selected among said plurality of front lenses (LF.sub.mn); a second intermediate plane (PI2) having a plurality of exit pupils (PS.sub.ij), a collection lens (LC) capable of collecting the beams from the plurality of exit pupils (PS.sub.ij); and optical transmission means for individually transmitting the light beams from the plurality of entrance pupils (PS.sub.ij) to the plurality of exit pupils (PS.sub.kj).

Abstract: A laser source has two or more laser units and coupling means for coupling the laser beams from each unit so as to deliver a resulting beam for treating a surface. Concurrently with the laser surface treatment, the characteristics of the laser beam from each unit are adjusted to produce a resulting laser beam with a time profile of energy optimally adapted to said laser surface treatment. Homogenizing means homogenize the energy distribution of the resulting laser beam, so that the energy and spatial distribution of said resulting laser beam are concurrently adapted for the selected surface treatment.

Abstract: An optical device for homogenizing a laser beam is described. Such a device is commonly used in the surface treatment of an object. The device consists of front lenses that are bonded together to form an assembly of lenses that breaks the laser light into multiple beams. This results in the homogenization of the gaussian profile of the beam intensity as viewed perpendicular to the beam's propagation. Advantageously the matrix of lenses is formed using groves or bevels in a manner that minimizes losses resulting from light impinging on glue disposed upon the entire lateral surface of the front lenses. In the invention gaps between front lenses that cause interference with the light path are eliminated. This gap free bonding is accomplished by filling the groves or bevels with glue, inserting a rod or wire into the grove to assemble the front lenses in a support frame, bonding a grill to assembled front lenses, or by using a combination of gluing with a support frame.

Abstract: The ellipsometry device includes a first focusing device, combined with a first optical system, for focusing the light beam from the first optical system onto the sample, a second focusing device, combined with a second optical system, for focusing the beam reflected by the sample surface onto the input of the second optical system, and an optical correction device for correcting, together with the first and second focusing devices, the position of the focused reflected beam so as to reject the interference reflections generated by the surface of the sample opposite the light beam receiving surface, and to obtain a maximum signal level at the photodetector.

Abstract: A spectroscopic ellipsometer comprises a wideband light source, together with a first optical system including a rotating polarizer which applies a parallel beam to a sample contained in an enclosure. The reflected beam is picked up by an analyzer in a second optical system which transmits said reflected beam to a monochromator which is followed by a photodetector which is connected to control electronics connected, in turn, to a microcomputer. An optical fiber is provided between the source and the first optical system. Advantageously, a second optical fiber provided between the second optical system and the monochromator.