Abstract: A photohardenable material is disclosed. The material is comprised of a copolymer (I') having ethylenically unsaturated bonds and having an acid value of about 5 to 180 and a molecular weight of about 1,500 to 100,000. The copolymer (I') is obtained by reacting carboxyl groups with a copolymer represented by the structural formula (I), as defined within the application. The material is further comprised of a copolymer (II) having a molecular weight of about 50,000 to 500,000. The copolymer (II) is comprised of three monomers whose structural formula is also defined within the application. The material is further comprised of a cross-linking agent having two or more ethylenically unsaturated bonds and a photoactivator. The copolymers (I') and (II) are present in a ratio of about 0.5 to 20.

Abstract: A resist material for micro-fabrication comprising a polymer in which the polymer backbone has thereon a moiety of the formula (I) ##STR1## wherein R represents a hydrogen atom, an alkyl group, an alkenyl group or an aryl group or an aralkyl group, the resist material being curable by electromagnetic radiation such as electron beams, X-rays or deep ultraviolet light with a wave length of less than about 3000A and being particularly suitable as a micro-fabrication resist material.

Abstract: A resist material curable by irradiation with high energy radiation such as electron beams, X-rays, ion beams, neutron beams, .gamma.-rays or deep ultraviolet light but substantially non-curable by irradiation with light having a wavelength of about 300 nm or more, the resist material comprising, as a main component, a solvent-soluble polymer containing an ethylenically unsaturated double bond, the polymer being obtained by reacting (a) a polymer having a plurality of oxirane rings therein and (b) a monomer containing (i) at least one ethylenically unsaturated double bond and (ii) one functional group capable of opening the oxirane rings, and then opening the unreacted oxirane rings.

Abstract: A photocurable composition comprising a first copolymer having a recurring unit of general formula (I): ##STR1## wherein Ar represents a substituted or unsubstituted phenyl group, R.sub.1 represents a lower alkyl group, and m.sub.1 and m.sub.2 are positive numbers with m.sub.1 being greater than or equal to m.sub.2 ;and a second copolymer having a recurring unit of general formula (II): ##STR2## wherein R.sub.2 represents a lower alkyl group, X represents a hydrogen atom or a methyl group, and R.sub.3 represents an isobutyl group, a t-butyl group or a --CH.sub.2 Ar group where Ar represents a substituted or unsubstituted phenyl group and when R.sub.3 is --CH.sub.2 Ar, R.sub.2 can also be t-butyl and isobutyl, and n.sub.1, n.sub.2 and n.sub.3 are positive numbers but n.sub.1 can be zero and (n.sub.1 +n.sub.2)/n.sub.3 equals to about 0.5 to 20; and containing suitable amounts of a cross-linking agent and a photoactivator.

Abstract: A resist material for micro-fabrication comprising a polymer in which the polymer backbone has thereon a moiety of the formula (I) ##STR1## wherein R represents a hydrogen atom, an alkyl group, an alkenyl group or an aryl group or an aralkyl group, the resist material being curable by electromagnetic radiation such as electron beams, X-rays or deep ultraviolet light with a wave length of less than about 3000A and being particularly suitable as a micro-fabrication resist material.

Abstract: An oil-water separation filter, which comprises (1) a porous material comprising a sintered polyethylene powder bonded to (2) a fibrous layer having a thickness of about 0.5 to about 5 mm and a porosity of about 70 to about 90% comprising fibers having a water content of about 0.4 to about 5%, a critical surface tension of about 25 to about 45 dyne/cm and a fiber diameter of about 5 to about 30 .mu. or a mixture of the fibers and fibers having a water content of about 8 to about 15% and a fiber diameter of 5 to about 30 .mu..

Abstract: A resin composition is disclosed comprising, as essential ingredients, (I) a urethanized epoxy resin or a urethanized epoxy resin acrylate or methacrylate, (II) a ketone resin and (III) a cross-linkable or polymerizable compound containing at least two ethylenically unsaturated groups.

Abstract: A lithographic photographic material has a photosensitive layer comprising gelatin having an isoelectric point of at least 7 and a condensation product formed between a diazonium salt of a para-aminodipheynylamine derivative and an aldehyde. The photosensitive layer can be photoinsolubilized and will form a photo-relief.A method for using the lithographic photographic material comprises partially photoinsolubilizing the photosensitive layer and then immersing it in a bath of an acid or direct dye to form level dying, washing the dye material with water to remove unexposed areas, thereby forming an image composed of the dye photoinsolubilized resin layer corresponding to the exposed areas.

Abstract: A composition containing an .alpha.-chloro-o-acylbenzaldoxime derivative is effective for inhibiting the formation of slime. The composition has a strong activity for killing microorganisms which form slime, e.g., in the paper and pulp industries without such faults as reducing the whiteness of the paper or pulp, reducing the effect of sizing treatments, degrading the products, etc. A method for controlling slime using this composition is also disclosed.

Abstract: A composition containing an .alpha.-chloro-o-acylbenzaldoxime derivative is effective for inhibiting the formation of slime. The composition has a strong activity for killing microorganisms which form slime, e.g., in the paper and pulp industries without such faults as reducing the whiteness of the paper or pulp, reducing the effect of sizing treatments, degrading the products, etc. A method for controlling slime using this composition is also disclosed.