Abstract: The invention relates to an image acquisition device enabling a dental radiological image to be obtained, the device comprising a matrix sensor (C) having integrated therein a plurality of image acquisition photodiodes (DA) sensitive to irradiation and at least one detection photodiode (DD) also sensitive to irradiation, the device also comprising a control module (M) for controlling the sensor (C) and suitable for periodically reading the detection photodiode (DD) and for causing the sensor (C) to change over (SBA) between at least two modes: a standby mode and an acquisition mode (ACQ).

Abstract: A mask (MM) with patterns (MF) for use in a reflection lithography device with a photon beam with a wavelength of less than about 120 nm. Said mask (MM) comprises a planar substrate (ST) fixed to a reflecting structure (SMR) comprising a front face provided with selected patterns (MF) made from a material which is absorbent at the given wavelength and further comprises protection means (SP) which are transparent to the given wavelength and arranged such as to maintain a distance (H) between the perturbing particles (PP) and the patterns (MF) greater than or equal to one of the values of the depth of focus of the lithographic device and the height associated with the percentage of photon absorption by the perturbing particles (PP) which is acceptable.

Abstract: A spectroscopic ellipsometer comprises a wideband light source, together with a first optical system including a rotating polarizer which applies a parallel beam to a sample contained in an enclosure. The reflected beam is picked up by an analyzer in a second optical system which transmits said reflected beam to a monochromator which is followed by a photodetector which is connected to control electronics connected, in turn, to a microcomputer. An optical fiber is provided between the source and the first optical system. Advantageously, a second optical fiber provided between the second optical system and the monochromator.