Abstract: An ultraviolet disinfection apparatus being integral to existing pipe system is provided, comprising a hollow body with at least two open ends and an arbitrary cross-section, a UV module and a control module. The hollow body is configured for receiving the UV module, and to communicate with at least one end of a pipe structure such that a medium passing therethrough will not leak. The hollow body has an inner surface and an outer surface; the inner surface includes one or more interior structures defined by one or more partition walls for sub-dividing hollow space of the hollow body into at least two relatively smaller hollow spaces. The UV module comprises one or more UV LED arrays arranged independently or severally on the inner surface and/or the interior structures to increase UV exposure to the medium. The control module is remotely connected to the UV module outside the hollow body.

Abstract: An ultraviolet device is provided, which includes a gas jetting module, a flow rate adjustment module, an ultraviolet module and a first gas channel. The gas jetting module includes an upper panel, a lower panel and a frame. The upper panel is disposed on the upper side of the frame. The lower panel is disposed on the lower side of the frame and includes one or more gas outlets. A gas chamber is formed between the upper panel, lower panel and frame. The first gas channel is connected to the gas jetting module. The flow rate adjustment module is connected to the first gas channel and adjusts the flow rate of the gas inputted into the gas chamber via the first gas channel. The ultraviolet module includes an ultraviolet light source and is connected to the gas jetting module.

Abstract: A heat sink and power interconnect for a UV LED array are provided. A first circuit is disposed on a surface of a first substrate. A UV LED array is positioned thereon. A second substrate and second circuit are spaced apart from the first substrate and a first heat sink is positioned adjacent thereto. An aperture passes through each of the first substrate, the second substrate, and the heat sink. An electrical insulator lines the aperture with an electrically and thermally conductive liner positioned adjacent to the electrical insulator. A fastener is positioned in the aperture and electrically interconnects the first circuit and the second circuit through the electrically and thermally conductive liner and electrically communicates with an external power supply. The fastener carries one or more of a power or an electrical signal, and dissipates heat through the electrically and thermally conductive liner to the heat sink.

Abstract: A heat sink and power interconnect for a UV LED array are provided. A first circuit is disposed on a surface of a first substrate. A UV LED array is positioned thereon. A second substrate and second circuit are spaced apart from the first substrate and a first heat sink is positioned adjacent thereto. An aperture passes through each of the first substrate, the second substrate, and the heat sink. An electrical insulator lines the aperture with an electrically and thermally conductive liner positioned adjacent to the electrical insulator. A fastener is positioned in the aperture and electrically interconnects the first circuit and the second circuit through the electrically and thermally conductive liner and electrically communicates with an external power supply. The fastener carries one or more of a power or an electrical signal, and dissipates heat through the electrically and thermally conductive liner to the heat sink.

Abstract: An optical lithography system is provided, comprising: a polygonal structure having a central region and a central axis; an UV light source detachably disposed in the central region or at an end of the polygonal structure; a light parallelizer positioned in the polygonal structure for creating substantially parallel light rays from the UV light source exiting the polygonal structure before reaching a lithography target adjacent to an exit of the polygonal structure, which includes at least three mirrors arranged such that the first mirror receives incident light from the UV light source and reflects thereof from the first mirror towards the second mirror, the second mirror receiving the reflected light as a second incident light and reflecting thereof from the second mirror towards the third mirror to create a spiral light path from the UV light source to the lithography target with substantially parallel light incident on the lithography target.