Abstract: Various embodiments described herein provide devices and associated methods for treating spinal disease by implanting one or more interspinous process spacing devices. In one embodiment, an interspinous process spacing device includes a first attachment side, a second attachment side, a spacer tray, and a securing means. The spacer tray extends from the first attachment side and is slideably insertable through a spacer tray slot formed in the second attachment side. The spacer tray is adapted to be positioned between a spinous process of a first vertebra and a spinous process of an adjacent second vertebra, and the spacer tray includes a trough formed in a top surface of the spacer tray. The securing means is configured to engage the trough of the spacer tray to secure the second attachment side relative to the first attachment side.

Abstract: An interbody device may include a main body and an arm movably connected thereto. The device may have a first end, a second end opposite the first end in a direction of a longitudinal axis of the device, a first side, a second side opposite the first side in a direction of a first transverse axis of the device, a third side, and a fourth side opposite the third side in a direction of a second transverse axis of the device. An overall distance between the first side and the second side may increase along at least a majority of a length of the device in a direction from the first end toward the second end, and an overall distance between the third side and the fourth side may increase along at least a majority of the length in a direction from the second end toward the first end.

Abstract: A dynamic interspinous process device for implantation with respect to a first vertebra and an adjacent second vertebra is provided. The dynamic interspinous process device may include a first attachment side and a second attachment side. Each of the first attachment side and second attachment side may include a central portion, a first wing extending from the central portion, a second wing extending from the central portion, and one or more slots extending from an interior side of the respective attachment side to an exterior side of the respective attachment side. The one or more slots of the respective attachment side may be configured to allow the first wing and the second wing to move relative to one another in a direction of a longitudinal axis of the dynamic interspinous process device.

Abstract: Interspinous process spacing devices and associated methods are provided. In one embodiment, an interspinous process spacing device includes a first attachment side, a second attachment side, and a spacer. The first attachment side and the second attachment side each include a central portion, a first wing portion, and a second wing portion. The central portion includes an inner surface extending along at least a majority of an anterior-posterior height of the central portion, and the first wing portion includes an inner surface extending along at least a majority of an anterior-posterior height of the first wing portion. The inner surface of the first wing portion extends in a direction transverse to the inner surface of the central portion, and the anterior-posterior height of the first wing portion is less than the anterior-posterior height of the central portion.

Abstract: An interbody device may include a main body and an arm movably connected thereto. The device may have a first end, a second end opposite the first end in a direction of a longitudinal axis of the device, a first side, a second side opposite the first side in a direction of a first transverse axis of the device, a third side, and a fourth side opposite the third side in a direction of a second transverse axis of the device. An overall distance between the first side and the second side may increase along at least a majority of a length of the device in a direction from the first end toward the second end, and an overall distance between the third side and the fourth side may increase along at least a majority of the length in a direction from the second end toward the first end.

Abstract: Interspinous process spacing devices and associated methods are provided. In one embodiment, an interspinous process spacing device includes a first attachment side, a second attachment side, and a spacer. The first attachment side and the second attachment side each include a central portion, a first wing portion, and a second wing portion. The central portion includes an inner surface extending along at least a majority of an anterior-posterior height of the central portion, and the first wing portion includes an inner surface extending along at least a majority of an anterior-posterior height of the first wing portion. The inner surface of the first wing portion extends in a direction transverse to the inner surface of the central portion, and the anterior-posterior height of the first wing portion is less than the anterior-posterior height of the central portion.

Abstract: Various embodiments described herein provide devices and associated methods for treating spinal disease by implanting one or more interspinous process spacing devices. In one embodiment, an interspinous process spacing device includes a first attachment side, a second attachment side, a spacer tray, and a securing means. The spacer tray extends from the first attachment side and is slideably insertable through a spacer tray slot formed in the second attachment side. The spacer tray is adapted to be positioned between a spinous process of a first vertebra and a spinous process of an adjacent second vertebra, and the spacer tray includes a trough formed in a top surface of the spacer tray. The securing means is configured to engage the trough of the spacer tray to secure the second attachment side relative to the first attachment side.

Abstract: Various embodiments described herein provide interspinous process spacing devices and related systems and methods. In one embodiment, surgical instrument system for implanting an interspinous process spacing device includes a first arm having a proximal end, an elongated central portion, and a distal end, wherein the distal end includes a first engagement element configured for releasably engaging a first attachment side of an interspinous process spacing device. The system also includes a second arm having a proximal end, an elongated central portion, and a distal end, wherein the distal end includes a second engagement element configured for releasably engaging a second attachment side of the interspinous process spacing device. The first arm and the second arm are removably attachable to one another via attachment elements and are configured for aligning a spacer of the first attachment side and a spacer opening of the second attachment side.

Abstract: A rasp tool for preparing an implantation site includes a first arm, a second arm, a first wing, and a second wing. The first arm and the second arm are pivotally connected to one another. The first wing extends from a distal end of the first arm and includes a sharp tip positioned at a distal end of the first wing and configured to ease insertion into the implantation site, and a cutout defined along a first side of the first wing. The second wing extends from a distal end of the second arm. The first wing and the second wing are configured to move between a closed position and an open position by pivoting the first arm and the second arm, and the second wing is received at least partially within the cutout when the first wing and the second wing are in the closed position.

Abstract: An interbody device may include a main body and an arm movably connected thereto. The device may have a first end, a second end opposite the first end in a direction of a longitudinal axis of the device, a first side, a second side opposite the first side in a direction of a first transverse axis of the device, a third side, and a fourth side opposite the third side in a direction of a second transverse axis of the device. An overall distance between the first side and the second side may increase along at least a majority of a length of the device in a direction from the first end toward the second end, and an overall distance between the third side and the fourth side may increase along at least a majority of the length in a direction from the second end toward the first end.

Abstract: Various interspinous process spacing devices and associated methods are provided for treating spinal disease. In one embodiment, an interspinous process spacing device includes a first attachment side and a second attachment side, each attachment side including one or more slots formed therein and positioned proximate one end for receiving fasteners extending inwardly from a second interspinous process spacing device. The device further includes a spacer tray extending from the first attachment side and slideably insertable through a spacer tray slot formed in the second attachment side, wherein the spacer tray is adapted to retain adjacent spinous processes in a spaced apart orientation, and wherein at least a portion of the spacer tray has a longitudinally arcuate shape adapted to facilitate angled insertion of the spacer tray through the spacer tray slot. The device further includes securing means for securing the second attachment side relative to the first attachment side.

Abstract: Various interspinous process spacing devices and associated methods are provided for treating spinal disease. In one embodiment, an interspinous process spacing device includes a first attachment side and a second attachment side, each attachment side including one or more slots formed therein and positioned proximate one end for receiving fasteners extending inwardly from a second interspinous process spacing device. The device further includes a spacer tray extending from the first attachment side and slideably insertable through a spacer tray slot formed in the second attachment side, wherein the spacer tray is adapted to retain adjacent spinous processes in a spaced apart orientation, and wherein at least a portion of the spacer tray has a longitudinally arcuate shape adapted to facilitate angled insertion of the spacer tray through the spacer tray slot. The device further includes securing means for securing the second attachment side relative to the first attachment side.

Abstract: Various embodiments described herein provide devices and associated methods for treating spinal disease by implanting one or more interspinous process spacing devices. In one embodiment, an interspinous process spacing device includes a first attachment side, a second attachment side, a spacer tray, and a securing means. The spacer tray extends from the first attachment side and is slideably insertable through a spacer tray slot formed in the second attachment side. The spacer tray is adapted to be positioned between a spinous process of a first vertebra and a spinous process of an adjacent second vertebra, and the spacer tray includes a trough formed in a top surface of the spacer tray. The securing means is configured to engage the trough of the spacer tray to secure the second attachment side relative to the first attachment side.

Abstract: Various embodiments described herein provide devices and associated methods for treating spinal disease by implanting one or more interspinous process spacing devices. In one embodiment, an interspinous process spacing device includes a first attachment side, a second attachment side, a spacer tray, and a securing means. The spacer tray extends from the first attachment side and is slideably insertable through a spacer tray slot formed in the second attachment side. The spacer tray is adapted to be positioned between a spinous process of a first vertebra and a spinous process of an adjacent second vertebra, and the spacer tray includes a trough formed in a top surface of the spacer tray. The securing means is configured to engage the trough of the spacer tray to secure the second attachment side relative to the first attachment side.

Abstract: Various embodiments described herein provide interspinous process spacing devices and related systems and methods. In one embodiment, surgical instrument system for implanting an interspinous process spacing device includes a first arm having a proximal end, an elongated central portion, and a distal end, wherein the distal end includes a first engagement element configured for releasably engaging a first attachment side of an interspinous process spacing device. The system also includes a second arm having a proximal end, an elongated central portion, and a distal end, wherein the distal end includes a second engagement element configured for releasably engaging a second attachment side of the interspinous process spacing device. The first arm and the second arm are removably attachable to one another via attachment elements and are configured for aligning a spacer of the first attachment side and a spacer opening of the second attachment side.

Abstract: Various interspinous process spacing devices and associated methods are provided for treating spinal disease. In one embodiment, an interspinous process spacing device includes a first attachment side and a second attachment side, each attachment side including one or more slots formed therein and positioned proximate one end for receiving fasteners extending inwardly from a second interspinous process spacing device. The device further includes a spacer tray extending from the first attachment side and slideably insertable through a spacer tray slot formed in the second attachment side, wherein the spacer tray is adapted to retain adjacent spinous processes in a spaced apart orientation, and wherein at least a portion of the spacer tray has a longitudinally arcuate shape adapted to facilitate angled insertion of the spacer tray through the spacer tray slot. The device further includes securing means for securing the second attachment side relative to the first attachment side.

Abstract: Various embodiments described herein provide devices and associated methods for treating spinal disease by implanting one or more interspinous process spacing devices. In one embodiment, an interspinous process spacing device includes a first attachment side, a second attachment side, a spacer tray, and a securing means. The spacer tray extends from the first attachment side and is slideably insertable through a spacer tray slot formed in the second attachment side. The spacer tray is adapted to be positioned between a spinous process of a first vertebra and a spinous process of an adjacent second vertebra, and the spacer tray includes a trough formed in a top surface of the spacer tray. The securing means is configured to engage the trough of the spacer tray to secure the second attachment side relative to the first attachment side.

Abstract: Various interspinous process spacing devices and associated methods are provided for treating spinal disease. In one embodiment, an interspinous process spacing device includes a first attachment side and a second attachment side, each attachment side including one or more slots formed therein and positioned proximate one end for receiving fasteners extending inwardly from a second interspinous process spacing device. The device further includes a spacer tray extending from the first attachment side and slideably insertable through a spacer tray slot formed in the second attachment side, wherein the spacer tray is adapted to retain adjacent spinous processes in a spaced apart orientation, and wherein at least a portion of the spacer tray has a longitudinally arcuate shape adapted to facilitate angled insertion of the spacer tray through the spacer tray slot. The device further includes securing means for securing the second attachment side relative to the first attachment side.

Abstract: Various embodiments described herein provide interspinous process spacing devices and related systems and methods. In one embodiment, surgical instrument system for implanting an interspinous process spacing device includes a first arm having a proximal end, an elongated central portion, and a distal end, wherein the distal end includes a first engagement element configured for releasably engaging a first attachment side of an interspinous process spacing device. The system also includes a second arm having a proximal end, an elongated central portion, and a distal end, wherein the distal end includes a second engagement element configured for releasably engaging a second attachment side of the interspinous process spacing device. The first arm and the second arm are removably attachable to one another via attachment elements and are configured for aligning a spacer of the first attachment side and a spacer opening of the second attachment side.

Abstract: Various embodiments described herein provide interspinous process spacing devices and related systems and methods. In one embodiment, surgical instrument system for implanting an interspinous process spacing device includes a first arm having a proximal end, an elongated central portion, and a distal end, wherein the distal end includes a first engagement element configured for releasably engaging a first attachment side of an interspinous process spacing device. The system also includes a second arm having a proximal end, an elongated central portion, and a distal end, wherein the distal end includes a second engagement element configured for releasably engaging a second attachment side of the interspinous process spacing device. The first arm and the second arm are removably attachable to one another via attachment elements and are configured for aligning a spacer of the first attachment side and a spacer opening of the second attachment side.