Abstract: Bronze-grey films for window glazing structures are disclosed. The subject bronze-grey films are characterized by having a layer of reactive-sputtered titanium suboxide of controlled composition between the bronze-grey metal layer and the plastic sheet which makes up the substrate of the film. The process by which these films can be made is also disclosed. These films offer superior resistance to failure by delamination.

Abstract: Curved, insulated glazing structures and their preparation are disclosed. The glazing structures comprise two rigid outer surfaces (generally glass) and a suspended inner film surface parallel to the outer surfaces. The inner film is adhered to the outer surfaces only on its curved edges--its straight edges being unattached. The inner film is generally heat shrunk in the direction parallel to the straight edges and preferably carries a heat reflective coating.

Abstract: Apparatus for sputter depositing a layer of metal onto a laterally extended substrate includes a substrate support, a deposition station, a downstream sensing assembly and a computerized controller. The deposition station includes a cathode and anodes extending the width of the substrate. Gas supply is provided to each of a plurality of zones through a common distribution chamber with a plurality of inlets which in combination cover the width of the substrate on which a thin film layer is to be deposited. The gas flow is directed through each anode into the plasma region and is individually controlled for each zone. The downstream sensing assembly includes, for each zone, a four-point contact assembly usign four electrically conductive wheels. Two of the wheels are used to apply current to the thin film and two are used to sense the resistance of it. This information is fed into the computer for use in controlling the gas flow into the deposition station, by zone.

Abstract: High resistivity chromium silicide coatings that are chemically, physically, and electrically stable at high temperatures are provided. The coatings are applied to substrates, optionally over a barrier layer of dielectric. The coatings are deposited in a magnetron sputtering process involving sputtering of a CrSi.sub.2 target in the presence of a gaseous mixture that includes nitrogen. The coatings so provided typically have resistivities on the order of 100 to 20,000 ohms per square. The degree of nitrogen incorporation varies with the thickness of the chromium silicide to give selected ranges of stable products.