Patents Assigned to Sovonics Solar Systems, Inc.
  • Method of depositing semiconductor films by free radical generation
    Patent number: 4615905
    Abstract: A method of depositing a semiconductor alloy film onto a substrate by activating groups of free radicals and incorporating desired ones of the activated groups into the film.
    Type: Grant
    Filed: April 22, 1985
    Date of Patent: October 7, 1986
    Assignee: Sovonics Solar Systems, Inc.
    Inventors: Stanford R. Ovshinsky, David D. Allred, Lee Walter, Stephen J. Hudgens