Abstract: Chemical vapor deposition apparatus is provided for the quick and efficient deposition of Parylene AF4 onto silicon wafers in the production of semiconductor chips. The apparatus includes a heated and cooled dimer receptacle for fast and efficient vaporization of parylene dimer material.
Type:
Grant
Filed:
October 27, 1995
Date of Patent:
January 20, 1998
Assignee:
Specialty Coating Sysetms, Inc.
Inventors:
Roger A. Olson, William F. Beach, John Wary