Abstract: A system may include a first apparatus configured to: project a first particle pattern onto a first target region; and a second apparatus configured to: detect the first particle pattern from a second target region that is overlapped with at least a part of the first target region, project a second particle pattern that is different from the first particle pattern onto the second target region, capture an image of the second target region, and process the captured image to reconstruct a three-dimensional (3D) image of the second target region.