Patents Assigned to SRG GLOBAL, LLC
  • Patent number: 11495880
    Abstract: Two-piece and three-piece radomes and their methods of manufacture involve independently optimizing a thickness profile of each piece to achieve desired radar performance metrics such that an air gap can exist or can be intentionally included between the various pieces without negatively affecting the radar performance of the radomes.
    Type: Grant
    Filed: April 17, 2020
    Date of Patent: November 8, 2022
    Assignee: SRG GLOBAL, LLC
    Inventors: James M Shurish, Nicholas Bruyneel
  • Publication number: 20220056607
    Abstract: A selectively chrome plated object having a substantially flush interface comprises a first portion formed by injection molding a plateable resin and defining a first top surface, a second portion formed by injection molding a non-plateable resin and defining a second top surface, the second portion sitting proud of the first portion such that the second top surface of the second portion is offset from the first top surface of the first portion, and a third portion formed by a chrome plating process where a chrome plating is applied to the first top surface of the first portion such that a third top surface of the third portion is substantially flush with the second top surface of the second portion.
    Type: Application
    Filed: December 20, 2019
    Publication date: February 24, 2022
    Applicants: SRG Global Liria, S.L., SRG Global, LLC
    Inventors: Robert W. Frayer, Sergio PILES GUILLEM, Juan MONLEON
  • Publication number: 20200335864
    Abstract: Two-piece and three-piece radomes and their methods of manufacture involve independently optimizing a thickness profile of each piece to achieve desired radar performance metrics such that an air gap can exist or can be intentionally included between the various pieces without negatively affecting the radar performance of the radomes.
    Type: Application
    Filed: April 17, 2020
    Publication date: October 22, 2020
    Applicant: SRG GLOBAL, LLC
    Inventors: JAMES M. SHURISH, NICHOLAS BRUYNEEL
  • Publication number: 20200222825
    Abstract: Methods for recovering manganese etchant solutions are provided wherein a process solution used to rinse or neutralize a nonconductive substrate after etching the substrate is collected and evaporated to provide a concentrated process solution that is fed back into the manganese etchant solution or acid rinse.
    Type: Application
    Filed: January 20, 2020
    Publication date: July 16, 2020
    Applicant: SRG GLOBAL, LLC
    Inventors: Mark Bauman, DANIEL LACEY, GERRY VOGELPOHL