Abstract: An optical radiation measurement apparatus is provided. The apparatus has at least one radiation detector for measuring electromagnetic radiation emitted from at least two radiation sources. Separate radiation channels are provided in a channel member in order to provide a radiation path between the radiation sources and the radiation detector, which is common to all of the radiation sources.
Abstract: A method is provide for measuring electromagnetic radiation radiated from a surface of an object that is irradiated by electromagnetic radiation given off by at least one radiation source. The radiation given off by the radiation source is determined by at least one first detector, and the radiation given off by the irradiated object is determined by at least one second detector that measures the radiation. The radiation from the at least one radiation source is actively modulated with at least one characteristic pyrometer. The radiation determined by the second detector is corrected with the radiation determined by the first detector to compensate for the radiation of the radiation source reflected from the object.
Type:
Grant
Filed:
February 16, 2001
Date of Patent:
April 9, 2002
Assignee:
Steag Ast
Inventors:
Markus Hauf, Thomas Knarr, Heinrich Walk, Horst Balthasar, Uwe Müller
Abstract: A method is provide for measuring electromagnetic radiation radiated from a surface of an object that is irradiated by electromagnetic radiation given off by at least one radiation source. The radiation given off by the radiation source is determined by at least one first detector, and the radiation given off by the irradiated object is determined by at least one second detector that measures the radiation. The radiation from the at least one radiation source is actively modulated with at least one characteristic parameter. The radiation determined by the second detector is corrected with the radiation determined by the first detector to compensate for the radiation of the radiation source reflected from the object.
Type:
Grant
Filed:
December 8, 1998
Date of Patent:
February 20, 2001
Assignee:
Steag AST Elektronik GmbH
Inventors:
Markus Hauf, Thomas Knarr, Heinrich Walk, Horst Balthasar, Uwe Müller
Abstract: A rapid thermal processing (RTP) chamber, wherein one wall of the chamber supporting a substrate rotates with respect to the rest of the chamber so that the substrate being treated in the RTP chamber is relatively rotated with respect to the lamps heating the substrate.
Type:
Grant
Filed:
October 24, 1997
Date of Patent:
October 12, 1999
Assignee:
Steag AST
Inventors:
Werner Blersch, Peter Gruenwald, Michael Maurer, Helmut Merkle, Thomas Theiler, Heinrich Walk
Abstract: A closable enclosure for rapid thermal processing of semiconductor wafers is presented, wherein the closable enclosure has an enclosed volume less than 10 times the volume of the wafer, and wherein the closable enclosure may be closed about the wafer while the closable enclosure is surrounded by the process gas.
Type:
Grant
Filed:
January 8, 1997
Date of Patent:
February 16, 1999
Assignee:
Steag AST
Inventors:
Guenter Kaltenbrunner, Zsolt Nenyei, Helmut Sommer
Abstract: A rapid thermal processing (RTP) chamber is disclosed, wherein a transparent plate and a body are sealed with a gas tight seal, and wherein the gas tight seal is activated by inflating an inflatable element.
Type:
Grant
Filed:
July 17, 1997
Date of Patent:
February 9, 1999
Assignee:
Steag-Ast
Inventors:
Helmut Aschner, Helmut Merkle, Ulrich Walk, Dieter Zernickel
Abstract: A method for Rapid Thermal Processing (RTP) is presented, wherein the broadband reflectivity of an object is measured, and the results of the measurement used by the RTP system to adjust the RTP system parameters used in processing the object.
Type:
Grant
Filed:
August 27, 1997
Date of Patent:
November 24, 1998
Assignee:
Steag-Ast GmbH
Inventors:
Zsolt Nenyei, Heinrich Walk, Michael Maurer, Thomas Knarr