Abstract: A method for treating substrates includes chemically treating at least one substrate in a container with at least one treatment fluid and washing said at least one substrate with a washing fluid in the same container. Subsequently, the at least one substrate is dried.
Type:
Grant
Filed:
January 13, 1995
Date of Patent:
October 29, 1996
Assignee:
Steag MicroTech GmbH Donaueschingen
Inventors:
Robin Schild, Milan Kozak, Johann Durst