Abstract: A radiation source which can emit X-ray flux using electron beam currents from a cathode array formed on the window through which the radiation will exit the source. The source can be made in formats which are compact or flat compared with prior art radiation sources. X-ray flux produced by the source can be used for such purposes as radiation imaging, sterilization, decontamination of biohazards or photolithography.

Abstract: A cold welded hermetic micro or nano package sealed in an inert atmosphere with optional force maintenance means for ensuring permanent closure. A package cap 410 coated with precursor weld material is sealed to a package base 405 containing integral device 445 then cold welded with an external force mechanism to compress and flow cold seal preform material 435 creating a hermetic peripheral seal in an inert or vacuum atmosphere. Arrays of devices can be sealed with individual caps or arrays of caps which are interconnected.

Abstract: A radiation source which can emit X-ray flux, UV-C flux and other forms of radiation uses electron beam current from a cathode array formed on the window through which the radiation will exit the source. The source can be made in formats which are compact or flat compared with prior art radiation sources. X-ray, UV-C and other radiative flux produced by the source can be used for such purposes as radiation imaging, sterilization, decontamination of biohazards, UV curing or photolithography.

Abstract: A swage hermetic sealing of a MEMS or microdevice or nanodevice package using high force. A cutting and flowing edge 430 is formed on a package cover which is pressed into a mating , integral gasket 425 on a package base. A material extension of the package cover 450 is simultaneously folded under the package base to supply force maintenance for permanent hermaticity. The swage hermetic sealing of single or an array of covers to an extended wafer or substrate is accomplished by a cutting and flowing edge 560. Permanent force maintenance is achieved through a re-entrant cavity 565 and annular ring 535 on the wafer or substrate.

Abstract: A radiation source which can emit X-ray flux, UV-C flux and other forms of radiation uses electron beam current from a cathode array formed on the window through which the radiation will exit the source. The source can be made in formats which are compact or flat compared with prior art radiation sources. X-ray, UV-C and other radiative flux produced by the source can be used for such purposes as radiation imaging, sterilization, decontamination of biohazards, UV curing or photolithography.