Patents Assigned to Stichting Centrum Voor Micro-Electronica Twente
  • Method of producing an ISFET and same ISFET
    Patent number: 4735702
    Abstract: A process for modifying an oxide surface of a semi-conductor material, for example included in an ISFET, wherein a coating of a polymer is applied to the oxide surface. The polymer is chemically bonded to the oxide surface. Optionally a second coating can comprise metal ion complexing groups. The process can be used for manufacturing an ISFET.
    Type: Grant
    Filed: November 19, 1985
    Date of Patent: April 5, 1988
    Assignee: Stichting Centrum Voor Micro-Electronica Twente
    Inventors: David N. Reinhoudt, Marcel L. M. Pennings, Auke G. Talma