Patents Assigned to Stichting VU
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Patent number: 12285408Abstract: The disclosure herein are materials and methods for the treatment of snake bite. Aspects of the disclosure includes pharmaceutical compositions, and kits, both of which may be of use in the treatment of snake bite.Type: GrantFiled: May 13, 2022Date of Patent: April 29, 2025Assignees: Liverpool School of Tropical Medicine, Stichting VUInventors: Nicholas Casewell, Laura-Oana Albulescu, Jeroen Kool
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Patent number: 12037382Abstract: The invention relates to a novel class of antagonistic and inverse agonistic anti-US28 antibodies, more specifically to single heavy chain variable domain antibodies (VHH) and variants and modifications thereof. The invention further relates to methods for producing these antibodies and to the use of the antibodies in methods for diagnostic and therapeutic purposes, especially for treatment of an individual suffering from a CMV-positive tumor such as glioblastoma.Type: GrantFiled: February 5, 2019Date of Patent: July 16, 2024Assignee: Stichting VUInventors: Martine Joyce Smit, Raimond Heukers, Timo Werner Marcella De Groof, Tian Shu Fan, Raymond Henry De Wit
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Patent number: 11963663Abstract: A fibre endoscope system (100) comprises a catheter (10) with a probe head (10a) for entering into a body cavity (C) adjacent or near a sample region (S). A source fiber (11) has a first fiber ending (11a) and a signal fiber (12) has a second fiber ending (12a) both remote from the probe head (10a) but separate. A sampling fiber (13) has a third fiber ending (13a) disposed at the probe head (10a). A fiber coupler (15) is configured to optically couple at least the source fiber (11) to the sampling fiber (13), and the sampling fiber (13) to the signal fiber (12). A sampling fiber length (L13) of the sampling fiber (13) between a fiber coupler (15) and the third fiber ending (13a) is shorter than a source fiber length (L11) of the source fiber (11) between the fiber coupler (15) and the first fiber ending (11a).Type: GrantFiled: March 28, 2019Date of Patent: April 23, 2024Assignee: Stichting VUInventors: Fabio Feroldi, Johannes Fitzgerald De Boer
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Patent number: 11788081Abstract: The present invention relates to methods and cross-linkers for the macrocyclization of proteins. The invention is useful for increasing the stability of a protein.Type: GrantFiled: April 18, 2019Date of Patent: October 17, 2023Assignee: Stichting VUInventors: Tom Norbert Grossmann, Marta Pelay Gimeno, Sven Hennig, Saskia Antonie Neubacher
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Publication number: 20210022590Abstract: A fibre endoscope system (100) comprises a catheter (10) with a probe head (10a) for entering into a body cavity (C) adjacent or near a sample region (S). A source fiber (11) has a first fiber ending (11a) and a signal fiber (12) has a second fiber ending (12a) both remote from the probe head (10a) but separate. A sampling fiber (13) has a third fiber ending (13a) disposed at the probe head (10a). A fiber coupler (15) is configured to optically couple at least the source fiber (11) to the sampling fiber (13), and the sampling fiber (13) to the signal fiber (12). A sampling fiber length (L13) of the sampling fiber (13) between a fiber coupler (15) and the third fiber ending (13a) is shorter than a source fiber length (L11) of the source fiber (11) between the fiber coupler (15) and the first fiber ending (11a).Type: ApplicationFiled: March 28, 2019Publication date: January 28, 2021Applicant: Stichting VUInventors: Fabio FEROLDI, Johannes Fitzgerald DE BOER
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Publication number: 20210000367Abstract: A first aspect provides, in a device for processing biomedical data obtained from a body, a method of determining brain activity. The method comprises obtaining neuron oscillation signal data of a first part of a brain over a period of time. The oscillation signal data is apportioned in timeslots within the period and per time slot, based on the oscillation data for the timeslot, an amplitude value and variation value representing data values in the timeslot are obtained. A correlation value is determined between the amplitude values and the corresponding variation values over at least a substantial part of the first time period; and the correlation value is provided as an output. The correlation value may optionally be used for estimating a ratio between excitation and inhibition activity of the brain under scrutiny.Type: ApplicationFiled: March 18, 2019Publication date: January 7, 2021Applicant: Stichting VUInventors: Klaus LINKENKAER-HANSEN, Richard Edward HARDSTONE
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Publication number: 20200232931Abstract: A metrology apparatus (302) includes a higher harmonic generation (HHG) radiation source for generating (310) EUV radiation. Operation of the HHG source is monitored using a wavefront sensor (420) which comprises an aperture array (424, 702) and an image sensor (426). A grating (706) disperses the radiation passing through each aperture so that the image detector captures positions and intensities of higher diffraction orders for different spectral components and different locations across the beam. In this way, the wavefront sensor can be arranged to measure a wavefront tilt for multiple harmonics at each location in said array. In one embodiment, the apertures are divided into two subsets (A) and (B), the gratings (706) of each subset having a different direction of dispersion. The spectrally resolved wavefront information (430) is used in feedback control (432) to stabilize operation of the HGG source, and/or to improve accuracy of metrology results.Type: ApplicationFiled: January 23, 2020Publication date: July 23, 2020Applicants: ASML Netherlands B.V., Stiching Nederlandse Wetenschappelijk Onderzoek Instituten, Stichting VU, Universiteit van AmsterdamInventors: Stefan Michiel WITTE, Gijsbert Simon Matthijs JANSEN, Lars Christian FREISEM, Kjeld Sijbrand Eduard EIKEMA, Simon Gijsbert Josephus MATHIJSSEN
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Publication number: 20200041563Abstract: Disclosed is a method for obtaining a computationally determined interference electric field describing scattering of radiation by a pair of structures comprising a first structure and a second structure on a substrate. The method comprises determining a first electric field relating to first radiation scattered by the first structure; determining a second electric field relating to second radiation scattered by the second structure; and computationally determining the interference of the first electric field and second electric field, to obtain a computationally determined interference electric field.Type: ApplicationFiled: July 31, 2019Publication date: February 6, 2020Applicant: Stichting VUInventors: Patricius Aloysius Jacobus TINNEMANS, Patrick WARNAAR, Vasco Tomas Tenner, Maurits Van der schaar
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Publication number: 20190310559Abstract: Methods and apparatus are disclosed for determining a characteristic of a structure. In one arrangement, the structure is illuminated with first illumination radiation to generate first scattered radiation. A first interference pattern is formed by interference between a portion of the first scattered radiation reaching a sensor and first reference radiation. The structure is also illuminated with second illumination radiation from a different direction. A second interference pattern is formed using second reference radiation. The first and second interference patterns are used to determine the characteristic of the structure. Azimuthal angles of the first and second reference radiations onto the sensor are different.Type: ApplicationFiled: April 5, 2019Publication date: October 10, 2019Applicants: Stichting VU, Stichting Nederlandse Wetenschappelijk Onderzoek Instituten, Universiteit van Amsterdam, ASML Netherlands B.V.Inventors: Johannes Fitzgerald DE BOER, Vasco Tomas TENNER, Arie Jeffrey DEN BOEF, Christos MESSINIS
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Publication number: 20190265028Abstract: Disclosed is a method and associated apparatus for measuring a characteristic of interest relating to a structure on a substrate. The method comprises calculating a value for the characteristic of interest directly from the effect of the characteristic of interest on at least the phase of illuminating radiation when scattered by the structure, subsequent to illuminating said structure with said illuminating radiation.Type: ApplicationFiled: February 15, 2019Publication date: August 29, 2019Applicants: Stichting VU, Stichting Nederlandse Wetenschappelijk Onderzoek Instituten, Universiteit van Amsterdam, ASML Netherlands B.V.Inventors: Patricius Aloysius Jacobus TINNEMANS, Vasco Tomas Tenner, Arie Jeffrey Den Boef, Hugo Augustinus Joseph Cramer, Patrick Warnaar, Grzegorz Grzela, Martin Jacobus Johan Jak
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Publication number: 20190107781Abstract: Described is a metrology system for determining a characteristic of interest relating to at least one structure on a substrate, and associated method. The metrology system comprises a processor being configured to computationally determine phase and amplitude information from a detected characteristic of scattered radiation having been reflected or scattered by the at least one structure as a result of illumination of said at least one structure with illumination radiation in a measurement acquisition, and use the determined phase and amplitude to determine the characteristic of interest.Type: ApplicationFiled: October 3, 2018Publication date: April 11, 2019Applicants: Stichting VU, Stichting Nederlandse Wetenschappelijk Onderzoek Instituten, Universiteit van Amsterdam, ASML Netherlands B.V.Inventors: Patricius Aloysius Jacobus TINNEMANS, Arie Jeffrey Den Boef, Armand Eugene Albert Koolen, Nitesh Pandey, Vasco Tomas Tenner, Willem Marie Julia Marcel Coene, Patrick Warnaar
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Publication number: 20180348145Abstract: A metrology apparatus (302) includes a higher harmonic generation (HHG) radiation source for generating (310) EUV radiation. Operation of the HHG source is monitored using a wavefront sensor (420) which comprises an aperture array (424, 702) and an image sensor (426). A grating (706) disperses the radiation passing through each aperture so that the image detector captures positions and intensities of higher diffraction orders for different spectral components and different locations across the beam. In this way, the wavefront sensor can be arranged to measure a wavefront tilt for multiple harmonics at each location in said array. In one embodiment, the apertures are divided into two subsets (A) and (B), the gratings (706) of each subset having a different direction of dispersion. The spectrally resolved wavefront information (430) is used in feedback control (432) to stabilize operation of the HGG source, and/or to improve accuracy of metrology results.Type: ApplicationFiled: May 15, 2018Publication date: December 6, 2018Applicants: ASML Netherlands B.V., Stichting Nederlandse Wetenschappelijk Onderzoek Instituten, Stichting VU, Universiteit van AmsterdamInventors: Stefan Michiel WITTE, Gijsbert Simon Matthijs Jansen, Lars Christian Freisem, Kjeld Sijbrand Eduard Eikema, Simon Gijsbert Josephus Mathijssen
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Patent number: 10101338Abstract: The invention relates to biomarkers and a method of diagnosing or monitoring depression, anxiety disorder or other psychotic disorder.Type: GrantFiled: December 15, 2014Date of Patent: October 16, 2018Assignees: Cambridge Enterprise Limited, Stichting VUInventors: Sabine Bahn, Emanuel Schwarz, Brenda Penninx, Nicole Vogelzangs
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Patent number: 9952421Abstract: The present disclosure relates to an apparatus (100) and method for controlling a plurality of simultaneously active optical traps (OT1,OT2,OT3). In one method, trapping beams (TB1,TB2,TB3) are provided and redirected for individually controlling a respective position (X,Y) of optical traps (OT1,OT2,OT3) formed by focusing of the redirected trapping beams in a sample volume (SV). Light (L11,L20) from the sample volume (SV) corresponding to the optical traps is received. A path of a detector beam (AB) is overlapped with one of the trapping beams (TB3), wherein the detector beam has a distinct wavelength (?A) from that of the overlapping trapping beam (TB3). In one channel, the light from the sample volume is filtered according to wavelength, and only the filtered light having the wavelength (?A) of the detector beam (AB) is measured.Type: GrantFiled: February 4, 2016Date of Patent: April 24, 2018Assignee: Stichting VUInventors: Andreas Sebastian Biebricher, Andrea Candelli, Iddo Heller, Niels Laurens, Erwin Johannes Gerard Peterman, Gijs Jan Lodewijk Wuite
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Publication number: 20180024342Abstract: The present disclosure relates to an apparatus (100) and method for controlling a plurality of simultaneously active optical traps (OT1, OT2, OT3). In one method, trapping beams (TB1, TB2, TB3) are provided and redirected for individually controlling a respective position (X,Y) of optical traps (OT1, OT2, OT3) formed by focusing of the redirected trapping beams in a sample volume (SV). Light (L11,L20) from the sample volume (SV) corresponding to the optical traps is received. A path of a detector beam (AB) is overlapped with one of the trapping beams (TB3), wherein the detector beam has a distinct wavelength (?A) from that of the overlapping trapping beam (TB3). In one channel, the light from the sample volume is filtered according to wavelength, and only the filtered light having the wavelength (?A) of the detector beam (AB) is measured.Type: ApplicationFiled: February 4, 2016Publication date: January 25, 2018Applicant: Stichting VuInventors: Andreas Sebastian Biebricher, Andrea Candelli, Iddo Heller, Niels Laurens, Erwin Johannes Gerard Peterman, Gijs Jan Lodewijk Wuite
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Publication number: 20170322215Abstract: The present invention relates to the fields of medicine and molecular diagnostics. In particular, it relates to a novel method for the treatment, prevention and/or delay of cancer and to a diagnostic method involving detection of a novel auto-active and intracellular mutant of MET.Type: ApplicationFiled: November 18, 2015Publication date: November 9, 2017Applicants: Stichting Katholieke Universiteit, Stichting VU-VumcInventors: Anna Catharina Navis, Wilhelmus Petrus Johannes Leenders, Thomas Würdinger
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Publication number: 20170269482Abstract: In an inspection apparatus, a target on the surface is illuminated with illuminating radiation that comprises first and second illuminating components. The illuminating components form one or more periodic illuminating patterns on the surface. A plurality of scattered radiation patterns formed by the illuminating radiation after scattering by the target is captured at a detector for a number of values of a controllable characteristic of at least one of the illuminating components. The captured radiation is then used to reconstruct data describing the target.Type: ApplicationFiled: March 8, 2017Publication date: September 21, 2017Applicants: Stichting VU, Universiteit van Amsterdam, Stichting voor Fundamenteel Onderzoek der Materie, ASML Netherlands B.V.Inventors: Dirk Ewoud Boonzajer Flaes, Stefan Michiel Witte, Kjeld Sijbrand Eduard Eikema
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Patent number: 9766180Abstract: The present disclosure concerns a method and system for imaging a molecular strand (MS). The method comprises providing a sample volume (SV) comprising the strand (MS); providing an excitation beam (EB) having an excitation focus (EF) in the sample volume (SV); scanning the excitation focus (EF) in the sample volume (SV) along a one dimensional scanning line (SL); trapping an end of the strand (MS) in the sample volume (SV) and extending the strand (MS) along a one-dimensional trapping line (LL) parallel to the scanning line (SL); aligning the trapping line (LL) to coincide with the scanning line (SL) to have the scanning excitation focus (EF) coincide with the strand (MS); and recording the fluorescence response (FR) as a function of a plurality of distinct scanning positions (X0) of the excitation focus (EF) along the scanning line (SL).Type: GrantFiled: June 2, 2014Date of Patent: September 19, 2017Assignee: Stichting VU-VUmcInventors: Gijs Jan Lodewijk Wuite, Erwin Johannes Gerard Peterman, Iddo Heller, Gerrit Sitters, Andrea Candelli, Stefan Walter Hell
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Publication number: 20170176879Abstract: A lithographic apparatus is a machine that applies a desired pattern onto a substrate, usually onto a target portion of the substrate. A lithographic apparatus can be used, for example, in the manufacture of integrated circuits (ICs). The lithographic apparatus has an inspection apparatus with an EUV radiation source. The radiation source emits a radiation beam that includes coherent radiation of a specific wavelength. The beam propagates to illumination optical system, which focuses the radiation beam into a focused beam of illuminating radiation. The illumination optical system illuminates a three-dimensional product structure on the substrate, which scatters the illuminating radiation. On the surface of a detector, the radiation scattered by the product structure forms a diffraction pattern that is used to reconstruct data describing the three-dimensional product structure.Type: ApplicationFiled: December 16, 2016Publication date: June 22, 2017Applicants: Stichting VU, Universiteit van Amsterdam, Stichting voor Fundamenteel Onderzoek der Materie, ASML Netherlands B.V.Inventors: Stefan Michiel WITTE, Kjeld Sijbrand Eduard EIKEMA
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Publication number: 20150147361Abstract: The invention relates to the use of sphingosine based compounds, in particular phytosphingosine compounds, in the protection of hydroxyapatite containing materials such as teeth and bone. Such compounds are especially useful in the treatment and prevention of dental caries, dental erosion, dentine hypersensitivity and tartar (dental calculus) formation. Methods and devices are also provided for preventing biofilm formation using sphingosine based compounds. Compositions comprising sphingosine based compounds are also provided.Type: ApplicationFiled: April 26, 2013Publication date: May 28, 2015Applicant: Stichting VU-VUmcInventors: Floris Jacob Bikker, Engelmundus Cornelis Ignatius Veerman, Marianne Valentijn-Benz, Willem Van'T Hof