Patents Assigned to Sulfur Chemical Laboratory Incorporated
  • Patent number: 9593423
    Abstract: The purpose of the present invention is to provide a wiring substrate from which a metal film cannot be detached easily. A process for forming a metal film comprises a step (X) of applying an agent containing a compound (?) onto the surface of a base and a step (Y) of forming a metal film on the surface of the compound (?) by a wet-mode plating technique, wherein the compound (?) is a compound having either an OH group or an OH-generating group, an azide group and a triazine ring per molecule, and the base comprises a polymer.
    Type: Grant
    Filed: March 18, 2014
    Date of Patent: March 14, 2017
    Assignees: Sulfur Chemical Laboratory Incorporated, Meiko Electronics Co., Ltd.
    Inventors: Kunio Mori, Yusuke Matsuno, Katsuhito Mori, Takahiro Kudo, Shigeru Michiwaki, Manabu Miyawaki
  • Patent number: 9540403
    Abstract: To provide a technique by which an —OH group can be effectively formed on a material surface for the purpose of making the material suitable for bonding (for example, for molecular bonding) that utilizes a chemical reaction (chemical binding). [Solution] A bonding method for bonding a substrate A and a substrate B, which comprises: a step for applying an agent that contains the compound (?) described below on the surface of the substrate A; a step for arranging the substrate B so as to face the compound (?) that is present on the surface of the substrate A; and a step for integrally bonding the substrate A and the substrate B by applying a force onto the substrate A and/or the substrate B. The compound (?) is a compound that has an OH group or an OH-forming group, an azide group and a triazine ring in each molecule, and the substrate A is configured using a polymer.
    Type: Grant
    Filed: November 30, 2015
    Date of Patent: January 10, 2017
    Assignees: Sulfur Chemical Laboratory Incorporated
    Inventors: Kunio Mori, Yusuke Matsuno, Katsuhito Mori, Takahiro Kudo
  • Publication number: 20160152641
    Abstract: To provide a technique by which an —OH group can be effectively formed on a material surface for the purpose of making the material suitable for bonding (for example, for molecular bonding) that utilizes a chemical reaction (chemical binding). [Solution] A bonding method for bonding a substrate A and a substrate B, which comprises: a step for applying an agent that contains the compound (?) described below on the surface of the substrate A; a step for arranging the substrate B so as to face the compound (?) that is present on the surface of the substrate A; and a step for integrally bonding the substrate A and the substrate B by applying a force onto the substrate A and/or the substrate B. The compound (?) is a compound that has an OH group or an OH-forming group, an azide group and a triazine ring in each molecule, and the substrate A is configured using a polymer.
    Type: Application
    Filed: November 30, 2015
    Publication date: June 2, 2016
    Applicants: Sulfur Chemical Laboratory Incorporated
    Inventors: Kunio MORI, Yusuke MATSUNO, Katsuhito MORI, Takahiro KUDO
  • Patent number: 9238757
    Abstract: To provide a technique by which an —OH group can be effectively formed on a material surface for the purpose of making the material suitable for bonding (for example, for molecular bonding) that utilizes a chemical reaction (chemical binding). [Solution] A bonding method for bonding a substrate A and a substrate B, which comprises: a step for applying an agent that contains the compound (?) described below on the surface of the substrate A; a step for arranging the substrate B so as to face the compound (?) that is present on the surface of the substrate A; and a step for integrally bonding the substrate A and the substrate B by applying a force onto the substrate A and/or the substrate B. The compound (?) is a compound that has an OH group or an OH-forming group, an azide group and a triazine ring in each molecule, and the substrate A is configured using a polymer.
    Type: Grant
    Filed: September 28, 2011
    Date of Patent: January 19, 2016
    Assignees: Sulfur Chemical Laboratory Incorporated
    Inventors: Kunio Mori, Yusuke Matsuno, Katsuhito Mori, Takahiro Kudo
  • Patent number: 8753748
    Abstract: The purpose of the present invention is to provide a wiring substrate from which a metal film cannot be detached easily. A process for forming a metal film comprises a step (X) of applying an agent containing a compound (?) onto the surface of a base and a step (Y) of forming a metal film on the surface of the compound (?) by a wet-mode plating technique, wherein the compound (?) is a compound having either an OH group or an OH-generating group, an azide group and a triazine ring per molecule, and the base comprises a polymer.
    Type: Grant
    Filed: September 30, 2011
    Date of Patent: June 17, 2014
    Assignees: Sulfur Chemical Laboratory Incorporated, Meiko Electronics Co., Ltd.
    Inventors: Kunio Mori, Yusuke Matsuno, Katsuhito Mori, Takahiro Kudo, Shigeru Michiwaki, Manabu Miyawaki