Abstract: Processing apparatus and method for processing a workpiece surface, in particular for the internal coating of cylinder bores. Processing apparatus has a shield unit which is provided to separate from one another—at least during operation—a part region of the workpiece surface provided for the processing and an adjacently arranged part region of the workpiece surface. The shield unit has at least one blocking nozzle which is provided to generate a fluid flow for separating the at least two part regions.

Abstract: The invention relates to a thermal spraying material (5) for the coating of a surface of a workpiece by means of a thermal spraying method, wherein the spraying material (5) contains zinc. The invention further relates to a thermal spraying method and to a thermally sprayed coating sprayed with the material (5).

Abstract: A component stack is coated such that, during a first coating pass, a first angle (?) is formed between the first stack opening surface and the coating beam and, during a second coating pass, a second angle (?) is formed between the first stack opening surface and the coating beam, wherein the first angle (?) and the second angle (?) are formed in opposite directions relative to the first stack opening surface.

Abstract: The invention relates to a Laval nozzle for thermal spraying and kinetic spraying, especially for cold gas spraying, with a convergent section and a divergent section. To achieve a better degree of application effect, at least a portion of the divergent section, according to the invention, has a bell-shaped contour.

Abstract: An apparatus and process for fast epitaxial deposition of compound semiconductor layers includes a low-energy, high-density plasma generating apparatus for plasma enhanced vapor phase epitaxy. The process provides in one step, combining one or more metal vapors with gases of non-metallic elements in a deposition chamber. Then highly activating the gases in the presence of a dense, low-energy plasma. Concurrently reacting the metal vapor with the highly activated gases and depositing the reaction product on a heated substrate in communication with a support immersed in the plasma, to form a semiconductor layer on the substrate. The process is carbon-free and especially suited for epitaxial growth of nitride semiconductors at growth rates up to 10 nm/s and substrate temperatures below 1000° C. on large-area silicon substrates. The process requires neither carbon-containing gases nor gases releasing hydrogen, and in the absence of toxic carrier or reagent gases, is environment friendly.

Abstract: The invention relates to a thermal spraying material (5) for the coating of a surface of a workpiece by means of a thermal spraying method, wherein the spraying material (5) contains zinc. The invention further relates to a thermal spraying method and to a thermally sprayed coating sprayed with the material (5).

Abstract: A plasma spray method for the manufacture of an ion conducting membrane, in particular of a hydrogen ion conducting membrane or of an oxygen ion conducting membrane is suggested. In which method the membrane is deposited as a layer (11) on a substrate (10) in a process chamber, wherein a starting material (P) is sprayed onto a surface of the substrate (10) by means of a process gas (G) in the form of a process beam (2). The starting material is injected into a plasma at a low process pressure which is at most 10000 Pa and is partially or completely melted there. In accordance with the invention the substrate (10) has pores (30) which are connected amongst one another so that the substrate (10) is gas permeable and a portion of an overall pore area of an overall area of the coating surface (31, 131) amounts to at least 30%, in particular to at least 40%.

Abstract: A process for epitaxial deposition of compound semiconductor layers includes several steps. In a first step, a substrate is removably attached to a substrate holder that may be heated. In a second step, the substrate is heated to a temperature suitable for epitaxial deposition. In a third step, substances are vaporized into vapor particles, such substances including at least one of a list of substances, comprising elemental metals, metal alloys and dopants. In a fourth step, the vapor particles are discharged to the deposition chamber. In a fifth step, a pressure is maintained in the range of 10?-3 to 1 mbar in the deposition chamber by supplying a mixture of gases comprising at least one gas, wherein vapor particles and gas particles propagate diffusively. In a sixth optional step, a magnetic field may be applied to the deposition chamber. In a seventh step, the vapor particles and gas particles are activated by a plasma in direct contact with the sample holder.

Abstract: An upper body exercise device includes a central tube supported at a first height by at least two legs. A pair of wings is hingedly connected to the central tube. Each wing includes a pair of parallel arcuate rails, each rail having an outer end opposite the central tube, and each rail having a nadir at a second height lower than the first height. A hand slider is slidably supported on top of the pair of parallel arcuate rails of each of the pair of wings. Each hand slider includes a grip and a friction mitigation unit connected to the grip. Each hand slider is slidable along the pair of parallel arcuate rails between the central tube and the outer ends of the pair of parallel arcuate rails. The wings can be rotated about the central tube between an exercise configuration and a storage configuration.

Abstract: The invention relates to a plasma spray method which can serve as a starting point for a manufacture of metal nanopowder, nitride nanopowder or carbide nanopowder or metal films, nitride films or carbide films. To achieve an inexpensive manufacture of the nanopowder or of the film, in the plasma spray in accordance with the invention a starting material (P) which contains a metal or silicon oxide is introduced into a plasma jet (113) at a process pressure of at most 1000 Pa, in particular at most 400 Pa. The starting material (P) contains a metal or silicon oxide which vaporizes in the plasma jet (113) and is reduced in so doing. After the reduction, the metal or silicon which formed the metal or silicon oxide in the starting material is thus present in pure form or in almost pure form. The metal or silicon can be deposited in the form of nanopowder or of a film (124).

Abstract: To apply a thermal barrier coating (10), a plasma jet (5) is generated by a plasma torch in a work chamber (2) and is directed to the surface of a substrate (3) introduced into the work chamber, and a ceramic coating material is applied to the substrate surface by means of PS-PVD, wherein the coating material is injected into the plasma jet as a powder and is partly or completely vaporized there. On applying the thermal barrier coating, in a first workstep the feed rate of the injected powder is set so that a large part of the injected powder vaporizes, wherein the coating material condenses from the vapor phase on the substrate surface and forms mixed phases with the material of the substrate surface.

Abstract: A plasma spray method for the manufacture of an ion conducting membrane, in particular of a hydrogen ion conducting membrane or of an oxygen ion conducting membrane is suggested. In which method the membrane is deposited as a layer (11) on a substrate (10) in a process chamber, wherein a starting material (P) is sprayed onto a surface of the substrate (10) by means of a process gas (G) in the form of a process beam (2). The starting material is injected into a plasma at a low process pressure which is at most 10000 Pa and is partially or completely melted there. In accordance with the invention the substrate (10) has pores (30) which are connected amongst one another so that the substrate (10) is gas permeable and a portion of an overall pore area of an overall area of the coating surface (31, 131) amounts to at least 30%, in particular to at least 40%.

Abstract: The invention relates to a masking system for masking a cylinder bore (2) of a combustion engine (3) during a thermal coating procedure including a masking body (4) which can be placed during the thermal coating of a first cylinder (5) of the combustion engine (3) in the cylinder bore (2) of a second cylinder (7) to cover a cylinder wall (6) of the second cylinder (7). In this arrangement the masking body (4) is designed in such a way that a flow gap (10) of predeterminable breadth can be set between the masking body (4) and the cylinder wall (6) of the second cylinder (7) for the production of a flow (8) of a fluid (9).

Abstract: Spray material for thermally coating a substrate, a thermal spray layer, and a cylinder for a reciprocating piston combustion engine coated with the thermal spray layer. The spray material includes a solid lubricant of ZnO. A volume fraction of ZnO in the spray material lies in a range from 0.1% to 15% of the volume of the spray material.

Abstract: A process is disclosed for applying a heat shielding coating system on a metallic substrate. The coating system comprises at least three individual layers selected from the group of barrier layer, hot gas corrosion protection layer, protection layer, heat barrier layer, and smoothing layer. The coating system is applied to the metallic substrate by low pressure plasma spraying in a single operation cycle. This process enables the layers to be applied in an arbitrary sequence. The process is preferably used in applying a coating system to a turbine blade, particularly a stator or a rotor blade of a stationary gas turbine or of an aircraft engine, or to another component in a stationary or aircraft turbine that is subjected to hot gas.

Abstract: Using this method, a coating (1) is manufactured on a substrate (2), which forms a surface of a base body. In this method a layer (3) with ceramic coating material is applied to the substrate in a process chamber (6) using a plasma beam (30) and using an LPPS or LPPS-TF process. The substrate contains at least one metal Me. At a set reaction temperature of the substrate and in the presence of oxygen, an oxide, which results reactively with metal M diffused on the surface, is generated as a ceramic intermediate layer (4). The ceramic layer (3) is deposited on this intermediate layer.

Abstract: The invention relates to a plasma spraying device (1) for spraying a coating (2) onto a substrate (3) by a thermal spray process. Said plasma spraying device (1) includes a plasma torch (4) for heating up a plasma gas (5) in a heating zone (6), wherein the plasma torch (4) includes a nozzle body (7) for forming a plasma gas stream (8), and said plasma torch (4) has an aperture (9) running along a central longitudinal axis (10) through said nozzle body (7). The aperture (9) has an convergent section (11) with an inlet (12) for the plasma gas (5), a throat section (13) including a minimum cross-sectional area of the aperture, and a divergent section (14) with an outlet (15) for the plasma gas stream (8), wherein an introducing duct (16) is provided for introducing a liquid precursor (17) into the plasma gas stream (8). According to the invention a penetration means (18, 161, 181, 182) is provided to penetrate the liquid precursor (17) inside the plasma gas stream (8).

Abstract: A system for the data management of a thermal spraying apparatus with a spray gun (2) is made available, wherein the system includes a decentrally arranged device (1) with a memory (4), in order to detect process parameters and to store data of the thermal spraying apparatus and wherein the data contain identification and operating data of the thermal spraying apparatus and the device (1) additionally includes a bus interface (6) for the transmitting of the data.

Abstract: Spray material for thermally coating a substrate, a thermal spray layer, and a cylinder for a reciprocating piston combustion engine coated with the thermal spray layer. The spray material includes a solid lubricant of ZnO. A volume fraction of ZnO in the spray material lies in a range from 0.1% to 15% of the volume of the spray material.

Abstract: The invention relates to a powder supply system (1) for supplying a processing apparatus (2) with a granular substance (3). In this arrangement the powder supply system (1) includes a main container (4) and a powder conveying system (5) with a storage container (51) for conveying the granular substance (3) into the processing apparatus (2). In accordance with the invention, means (6, 611, 612, 62) are provided so that, in the operating state of the processing apparatus (2), a predetermined amount of the granular substance (3) can be conveyed from the main container (4) as working powder to the storage container (51) in such a way that at least a minimum amount (M1) is available as a granular substance (3) in the storage container (51).