Patents Assigned to Sumitomo Electric Ind., Ltd.
  • Patent number: 5276698
    Abstract: A semiconductor laser comprises an optical wave guide layer including an AlGaInP active layer and AlGaInP optical confinement layers holding the active layer therebetween. A well structure of an energy band is formed and a compressive stress is applied to the activation layer by the difference between the compositions of the activation layer and the optical confinement layers. Since the compressive stress is applied to the activation layer, the oscillation threshold is lower than that of an un-strained device. Accordingly, the rise of the oscillation threshold due to the addition of Al is compensated and continuous oscillation at room temperature is attained and visible light having a wavelength of 0.67 .mu.m or lower, which has been difficult to attain in the past, is produced.
    Type: Grant
    Filed: September 18, 1991
    Date of Patent: January 4, 1994
    Assignee: Sumitomo Electric Ind., Ltd.
    Inventors: Ichiro Yoshida, Tsukuru Katsuyama
  • Patent number: 5033815
    Abstract: An optical transmission fiber comprising (1) a core of high refractive index composed of SiO.sub.2 -based glass containing at least one of GeO.sub.2, As.sub.2 O.sub.3, Sb.sub.2 O.sub.5, SnO.sub.2, TiO.sub.2, PbO and Bi.sub.2 O.sub.3, (2) a clad of low refractive index composed of SiO.sub.2 -based glass containing at least one of F, F/B.sub.2 O.sub.3 and F/P.sub.2 O.sub.5, and (3) an outermost jacket layer composed of SiO.sub.2 and/or SiO.sub.2 -based glass containing at least one of Al.sub.2 O.sub.3, TiO.sub.2, ZrO.sub.2 and HfO.sub.2.
    Type: Grant
    Filed: April 27, 1990
    Date of Patent: July 23, 1991
    Assignees: Nippon Telephone & Telegraph, Sumitomo Electric Ind. Ltd.
    Inventors: Takao Edahiro, Shiro Kurosaki, Minoru Watanabe
  • Patent number: 4636280
    Abstract: An IC wafer with a uniform distribution of impurities is obtained by a pretreatment comprising annealing a semiconductor substrate at a high temperature for a long period of time and then cooling rapidly before IC processing.
    Type: Grant
    Filed: August 21, 1984
    Date of Patent: January 13, 1987
    Assignees: Sumitomo Electric Ind., Ltd., Nippon Telegraph & Telephone Public Corp.
    Inventors: Ryusuke Nakai, Toshihiko Takebe, Hajime Yamazaki