Patents Assigned to Sumitomo Electric Industry, Ltd.
  • Patent number: 9726842
    Abstract: An optical source that implements a wavelength tunable laser diode (t-LD) and a Mach-Zehnder (MZ) modulator within a single package is disclosed. The optical source, which outputs a modulated signal beam and a local beam of a continuous wave (CW), accompanies a control circuit mounted on several circuit boards. Only one of the circuit boards is rigidly mounted on the housing of the optical source. Rest of the circuit boards is moderately fixed to the housing through the rigidly fixed circuit board to suppress stresses caused in the housing and the circuit boards when the optical source is rigidly installed in the host system.
    Type: Grant
    Filed: April 12, 2016
    Date of Patent: August 8, 2017
    Assignees: Sumitomo Electric Industries, Ltd., Sumitomo Electric Device Innovations, Inc.
    Inventors: Kuniyuki Ishii, Hiromi Kurashima, Takashi Kondo
  • Patent number: 9728303
    Abstract: A shielded cable includes two signal wires, each of which having a signal conductor covered with an insulator, and a shield conductor having a metal clad resin tape spirally wrapped around the two signal wires in a lump. The insulator is configured so that a section thereof is to be deformable by an external force. A residual diameter ratio of the signal wire is 80% or greater and 95% or less when load of 1 kg is applied to the signal wire for 30 minutes.
    Type: Grant
    Filed: December 10, 2015
    Date of Patent: August 8, 2017
    Assignee: SUMITOMO ELECTRIC INDUSTRIES, LTD.
    Inventors: Yuto Kobayashi, Hayato Matsushita
  • Patent number: 9726816
    Abstract: An MCF of the present embodiment has eight or more cores. A diameter of a common cladding is not more than 126 ?m. Optical characteristics of each core are as follows: a TL at a predetermined wavelength of 1310 nm is not more than 0.4 dB/km; an MFD at the predetermined wavelength is from 8.0 ?m to 10.1 ?m; a BL in a BR of not less than 5 mm or in the BR of not less than 3 mm and, less than 5 mm is not more than 0.25 dB/turn at the predetermined wavelength; ?0 is from 1300 nm to 1324 nm; ?cc is not more than 1260 nm; an XT or XTs at the predetermined wavelength is not more than 0.001/km.
    Type: Grant
    Filed: March 25, 2016
    Date of Patent: August 8, 2017
    Assignee: SUMITOMO ELECTRIC INDUSTRIES, LTD.
    Inventors: Tetsuya Hayashi, Osamu Shimakawa
  • Patent number: 9728633
    Abstract: A silicon carbide semiconductor device includes: a silicon carbide semiconductor layer having a main surface, the main surface being provided with a trench which has a bottom portion and a sidewall inclined with respect to the main surface; a gate insulating film covering each of the bottom portion and the sidewall; a gate electrode provided at least on the gate insulating film; and an upper insulating film provided on the main surface and having a part which protrudes into the trench.
    Type: Grant
    Filed: September 8, 2014
    Date of Patent: August 8, 2017
    Assignee: Sumitomo Electric Industries, Ltd.
    Inventors: Toru Hiyoshi, Keiji Wada, Takeyoshi Masuda, Yu Saitoh
  • Patent number: 9725826
    Abstract: Single-crystal diamond is composed of carbon in which a concentration of a carbon isotope 12C is not lower than 99.9 mass % and a plurality of inevitable impurities other than carbon. The inevitable impurities include nitrogen, boron, hydrogen, and nickel, and a total content of nitrogen, boron, and hydrogen of the plurality of inevitable impurities is not higher than 0.01 mass %. In order to manufacture single-crystal diamond, initially, a hydrocarbon gas in which a concentration of the carbon isotope 12C is not lower than 99.9 mass % is subjected to denitrification.
    Type: Grant
    Filed: August 30, 2012
    Date of Patent: August 8, 2017
    Assignee: Sumitomo Electric Industries, Ltd.
    Inventors: Kazuhiro Ikeda, Hitoshi Sumiya
  • Patent number: 9728628
    Abstract: A silicon carbide epitaxial layer includes: a first impurity region; a second impurity region; and a third impurity region. A gate insulating film is in contact with the first impurity region, the second impurity region, and the third impurity region. A groove portion is formed in a surface of the first impurity region, the surface being in contact with the gate insulating film, the groove portion extending in one direction along the surface, a width of the groove portion in the one direction being twice or more as large as a width of the groove portion in a direction perpendicular to the one direction, a maximum depth of the groove portion from the surface being not more than 10 nm.
    Type: Grant
    Filed: July 22, 2015
    Date of Patent: August 8, 2017
    Assignee: Sumitomo Electric Industries, Ltd.
    Inventors: Keiji Wada, Taro Nishiguchi, Toru Hiyoshi, Taku Horii, Kosuke Uchida
  • Patent number: 9728612
    Abstract: A silicon carbide substrate capable of reducing on-resistance and improving yield of semiconductor devices is made of single-crystal silicon carbide, and sulfur atoms are present in one main surface at a ratio of not less than 60×1010 atoms/cm2 and not more than 2000×1010 atoms/cm2, and oxygen atoms are present in the one main surface at a ratio of not less than 3 at % and not more than 30 at %.
    Type: Grant
    Filed: August 17, 2016
    Date of Patent: August 8, 2017
    Assignee: Sumitomo Electric Industries, Ltd.
    Inventor: Keiji Ishibashi
  • Patent number: 9728577
    Abstract: An infrared image sensor includes a bias circuit receiving a timing signal, the bias circuit generating a bias voltage having a first value and a second value in response to the timing signal; a semiconductor light-receiving device including a photodiode, the semiconductor light-receiving device receiving the bias voltage; a read-out circuit including a read-out electrode connected to the photodiode, the read-out electrode receiving an electrical signal from the photodiode; and a signal processing circuit processing a read-out signal from the read-out circuit synchronously with the timing signal. The photodiode includes an optical absorption layer made of a III-V group compound semiconductor. The optical absorption layer has a type II multi quantum well structure including first compound semiconductor layers containing antimony as a constituent element and second compound semiconductor layers that are stacked alternately.
    Type: Grant
    Filed: September 15, 2015
    Date of Patent: August 8, 2017
    Assignee: SUMITOMO ELECTRIC INDUSTRIES, LTD.
    Inventors: Hiroshi Inada, Sundararajan Balasekaran
  • Publication number: 20170217838
    Abstract: A hard material which, when used as a material of a sintered material, makes it possible to obtain a sintered material with excellent abrasion resistance, a sintered material, a cutting tool including the sintered material, a method for manufacturing the hard material and a method for manufacturing the sintered material are provided. The hard material contains aluminum, nitrogen, and at least one element selected from the group consisting of titanium, chromium, and silicon, and has a cubic rock salt structure.
    Type: Application
    Filed: August 4, 2015
    Publication date: August 3, 2017
    Applicant: Sumitomo Electric Industries, Ltd.
    Inventors: Takashi Harada, Akito Ishii, Satoru Kukino
  • Publication number: 20170217556
    Abstract: A ballast water treatment system includes an ultraviolet irradiation device which irradiates ballast water flowing through a treatment line (a pipe) with ultraviolet rays, and a control unit. The ultraviolet irradiation device includes a light source which emits ultraviolet rays, and an illuminance sensor sensing an illuminance of ultraviolet rays received by the ballast water. The control unit controls the ultraviolet irradiation device to maintain at a prescribed dose a dose calculated using an illuminance sensed by the illuminance sensor and a flow rate of ballast water which flows through the ultraviolet irradiation device. When the sensed dose cannot be maintained at the prescribed dose by controlling the ultraviolet irradiation device, the control unit reduces a treatment flow rate of the ballast water which flows through the treatment line.
    Type: Application
    Filed: August 27, 2015
    Publication date: August 3, 2017
    Applicant: Sumitomo Electric Industries, Ltd.
    Inventors: Ryoji HARADA, Munetsugu UEYAMA, Kenichiro MIYATAKE, Shuji HAHAKURA
  • Publication number: 20170217557
    Abstract: A pleated filter includes a filter base having folds that repeatedly form mountains and valleys and having a cylindrical shape whose axial direction is a ridge line direction of the folds. The pleated filter includes, in a valley projecting to the inside of the cylindrical shape, a bonded reinforcing portion extending in the ridge line direction of the folds.
    Type: Application
    Filed: August 28, 2015
    Publication date: August 3, 2017
    Applicant: SUMITOMO ELECTRIC INDUSTRIES, LTD.
    Inventors: Satoshi YAHAGI, Shinichi KANAZAWA, Munetsugu UEYAMA, Kazuhiro TANIDA
  • Patent number: 9722027
    Abstract: A silicon carbide semiconductor device includes a silicon carbide substrate and a gate electrode. The silicon carbide substrate includes a first source region and a second source region, a first body region, a second body region, a first drift region, a second drift region, a third drift region, and a first connection region. The first connection region is provided to include a first intersection and a second intersection, the first intersection being an intersection of a straight line along a first straight-line portion and a straight line along a second straight-line portion, the second intersection being an intersection of a straight line along a third straight-line portion and a straight line along a fourth straight-line portion, and the first connection region has a second conductivity type.
    Type: Grant
    Filed: June 25, 2014
    Date of Patent: August 1, 2017
    Assignee: Sumitomo Electric Industries, Ltd.
    Inventors: Toru Hiyoshi, Keiji Wada
  • Patent number: 9722353
    Abstract: It is aimed to smoothly connect connectors by absorbing assembling variations between the connectors. A first spring piece (24) and a pair of second spring pieces (27) are deflectably provided in a holder portion (H) to resiliently sandwich a first connector (6) in a Y-axis direction. The second spring pieces (27) are formed with upper receiving surfaces (29) symmetrically inclined along an X-axis direction so that resilient forces act on both receiving portions (18) of the first connector (6) toward a center axis along the X-axis direction. Further, the first connector (6) is held in a state displaceable also in a Z-axis direction in the holder portion (H). This causes the first connector (6) to be held at a reference position and held in a three-dimensionally displaceable state.
    Type: Grant
    Filed: March 20, 2015
    Date of Patent: August 1, 2017
    Assignees: AUTONETWORKS TECHNOLOGIES, LTD., SUMITOMO WIRING SYSTEMS, LTD., SUMITOMO ELECTRIC INDUSTRIES, LTD.
    Inventors: Tomohide Maki, Kosuke Sone, Katsushi Miyazaki
  • Patent number: 9722349
    Abstract: It is an object of the present invention to ensure a high water-stopping property of a wire harness including a waterproofing connector section that is molded from a resin, by suppressing a variation in the outer size of a seal section of the connector section. The connector section is made from a first synthetic resin that is insert-molded with a part of a terminal fitting of the terminated electric cable used as an insert section. A water-stopping section is made from a second synthetic resin that is insert-molded with a section extending from a part of the terminal fitting to an insulation coating of the terminated electric cable used as an insert section. The seal section is made from the second synthetic resin that is insert-molded with a part of the connector section used as an insert section. The second synthetic resin is softer than the first synthetic resin.
    Type: Grant
    Filed: February 26, 2014
    Date of Patent: August 1, 2017
    Assignees: AUTONETWORKS TECHNOLOGIES, LTD., SUMITOMO WIRING SYSTEMS, LTD., SUMITOMO ELECTRIC INDUSTRIES, LTD.
    Inventors: Ayumu Ishihara, Tatsuya Hase, Katsufumi Matsui, Kouji Fukumoto, Daisuke Hashimoto, Kentaro Tachi
  • Patent number: 9722028
    Abstract: A silicon carbide substrate has a first main surface, and a second main surface opposite to the first main surface. A region including at least one main surface of the first and second main surfaces is made of single-crystal silicon carbide. In the one main surface, sulfur atoms are present at not less than 60×1010 atoms/cm2 and not more than 2000×1010 atoms/cm2, and carbon atoms as an impurity are present at not less than 3 at % and not more than 25 at %. Thereby, a silicon carbide substrate having a stable surface, a semiconductor device using the substrate, and methods for manufacturing them can be provided.
    Type: Grant
    Filed: August 5, 2016
    Date of Patent: August 1, 2017
    Assignee: Sumitomo Electric Industries, Ltd.
    Inventor: Keiji Ishibashi
  • Patent number: 9722508
    Abstract: Provided is a power conversion device that converts power between DC units and three-phase AC. A first-phase conversion device, a second-phase conversion device, and a third-phase conversion device each include a DC/DC conversion circuit and a single-phase power conversion circuit. For each of the first-phase conversion device, the second-phase conversion device, and the third-phase conversion device, when an absolute value of a voltage target value for the AC exceeds DC voltage of each DC unit, a control unit causes the DC/DC conversion circuit to operate to achieve the absolute value of the voltage target value and causes the single-phase power conversion circuit to only perform necessary polarity inversion, and when the absolute value of the voltage target value is smaller than the DC voltage, the control unit stops operation of the DC/DC conversion circuit and causes the single-phase power conversion circuit to operate to achieve the voltage target value.
    Type: Grant
    Filed: January 6, 2015
    Date of Patent: August 1, 2017
    Assignee: Sumitomo Electric Industries, Ltd.
    Inventors: Naoki Ayai, Koichi Takeshita
  • Publication number: 20170213615
    Abstract: A metal nanoparticle dispersion for forming a metal coating film by application and sintering contains metal nanoparticles having an average particle size of 200 nm or less and a solvent used to disperse the metal nanoparticles. The metal nanoparticle dispersion further contains a water soluble resin. The amount of the water soluble resin contained is preferably 0.1 parts by mass or more and 10 parts by mass or less per 100 parts by mass of the metal nanoparticles.
    Type: Application
    Filed: July 10, 2015
    Publication date: July 27, 2017
    Applicant: SUMITOMO ELECTRIC INDUSTRIES, LTD.
    Inventors: Issei OKADA, Motohiko SUGIURA
  • Publication number: 20170212366
    Abstract: An optical transceiver that installs an optical modulator with the Mach-Zehnder type and made of primarily semiconductor materials, and an Erbium Doped Fiber Amplifier (fiber amplifier) is disclosed. The fiber amplifier and the MZ modulator, in addition to a wavelength tunable laser diode, an intelligent coherent receiver, and a polarization maintaining splitter, are installed within a compact case following the standard of CFP2. The fiber amplifier provides a wavelength tunable filter that passes light amplified by the fiber amplifier but eliminates amplified stimulated emission in regions out of the wavelength band of the light.
    Type: Application
    Filed: January 19, 2017
    Publication date: July 27, 2017
    Applicant: SUMITOMO ELECTRIC INDUSTRIES, LTD.
    Inventors: Eiichi BANNO, Takatoshi KATO, Eiji TSUMURA
  • Patent number: 9714197
    Abstract: Nano polycrystalline diamond is composed of carbon, an element of different type which is an element other than carbon and is added to be dispersed in carbon at an atomic level, and an inevitable impurity. The polycrystalline diamond has a crystal grain size not greater than 500 nm. The polycrystalline diamond can be fabricated by subjecting graphite in which the element of different type which is an element other than carbon has been added to be dispersed in carbon at an atomic level to heat treatment within high-pressure press equipment.
    Type: Grant
    Filed: July 26, 2012
    Date of Patent: July 25, 2017
    Assignee: Sumitomo Electric Industries, Ltd.
    Inventors: Kazuhiro Ikeda, Keiko Arimoto, Katsuko Yamamoto, Hitoshi Sumiya, Takeshi Sato
  • Patent number: 9716157
    Abstract: A silicon carbide substrate includes a first impurity region, a well region in contact with the first impurity region, and a second impurity region separated from the first impurity region by the well region. A first main surface includes a first region in contact with a channel region, and a second region different from the first region. A silicon-containing material is formed on the second region. A first silicon dioxide region is formed on the first region. A second silicon dioxide region is formed by oxidizing the silicon-containing material. A gate runner is electrically connected to a gate electrode and formed in a position facing the second silicon dioxide region. Consequently, a silicon carbide semiconductor device capable of achieving improved insulation performance between the gate runner and the substrate while the surface roughness of the substrate is suppressed, and a method of manufacturing the same can be provided.
    Type: Grant
    Filed: August 4, 2016
    Date of Patent: July 25, 2017
    Assignee: Sumitomo Electric Industries, Ltd.
    Inventors: Toru Hiyoshi, Yu Saitoh