Patents Assigned to Sungil Co., Ltd. (SIM)
  • Patent number: 7781627
    Abstract: A system for forming gas hydrates includes a reactor adapted to receive a hydrate-forming fluid and a reaction fluid and react the hydrate-forming and reaction fluids within a reverse micellar solution to form gas hydrate particles; and a gas hydrate removal system coupled to the reactor, the gas hydrate removal system adapted to receive the gas hydrate particles within the reverse micellar solution and transport the gas hydrate particles away from the reactor. The gas hydrate removal system is adapted to transport gas hydrate particles away from the reactor concurrently with the formation of gas hydrate particles within the reactor.
    Type: Grant
    Filed: February 27, 2007
    Date of Patent: August 24, 2010
    Assignee: Sungil Co., Ltd. (SIM)
    Inventors: Yang-Ho Woo, Ta-Kwan Woo