Abstract: A sulfuric acid recycle apparatus capable of concentrating sulfuric acid, which is lowered in concentration upon completion of a wafer cleaning process, to a level to be recycled is provided. The sulfuric acid recycle apparatus for recycling sulfuric acid in a wafer cleaning fluid prepared by mixing sulfuric acid and hydrogen peroxide solution comprises a reaction bath having two openings formed of at least an introduction port and a discharge port for obtaining concentrated sulfuric acid by concentrating sulfuric acid in the wafer cleaning waste fluid introduced from the introduction port upon completion of a wafer cleaning process, then discharging the concentrated sulfuric acid from the discharge port, a wafer processing bath for processing wafers, and a supply unit for supplying the concentrated sulfuric acid to the wafer processing bath.

Abstract: An exhaust gas processing system is provided with a particle separating apparatus capable of separating and removing particles contained in an exhaust gas from the exhaust gas disposed between a front and a back exhaust pipes forming the exhaust gas discharge line. The particle separating apparatus includes a gas vessel defining a gas chamber for receiving the exhaust gas containing particles and discharged through a rear end portion of the front exhaust pipe, and an exhaust gas guide member disposed in the gas chamber and having guide walls defining an internal space and provided with openings through which the internal space communicates with the gas chamber. The guide walls are formed so as to guide the exhaust gas discharged into the gas chamber through the rear end portion of the front exhaust pipe so that the exhaust gas flows in vertical, whirling currents in the gas chamber.