Patents Assigned to SUNTEK PRECISION CORP.
  • Sputtering System with Normal Target and Slant Targets on the Side
    Publication number: 20110089031
    Abstract: A sputtering system aimed for sputtering workpieces that have non-planar surfaces, such as concaves, pillars, and steps of a case of a laptop. The sputtering system comprises a sputtering chamber including a carrier, a first sputtering source, and a second sputtering source. The first sputtering source is located over the carrier main to sputter planar portion of the workpiece. The second sputtering source is inclined at an angle so as to sputter the vertical portion of the workpiece.
    Type: Application
    Filed: October 13, 2010
    Publication date: April 21, 2011
    Applicant: SUNTEK PRECISION CORP.
    Inventors: Chao-Hsi Cheng, Wei-Yen Fu