Abstract: The invention relates to a method and a device which serves for moving and dosing amounts of liquid on a microscopic scale with a volume of especially 10?12 to 10?6 liters by means of an inhomogeneous electric field using a support having an ultraphobic surface.
Abstract: The Invention relates to a substrate with a reduced light-scattering, ultraphobic surface, to a method for the production of said substrate and to the use thereof. The substrate with a reduced light-scattering, ultraphobic surface has a total scatter loss ?7%, preferably ?3% and especially ?1% and a contact angle in relation to water of ?140°, preferably ?150°.
Abstract: The invention relates to a method for producing an ultraphobic surface on aluminium as the supporting material and to the resulting surface and its use. According to said method, the surface of an aluminium support is anodized, especially by anodic oxidation, and/or electrochemically pickled in an acid solution with an alternating voltage, treated in hot water or water vapor at a temperature of 50 to 100° C., optionally coated with an adhesion promoter layer and then provided with a hydrophobic or especially oleophobic coating.
Type:
Grant
Filed:
August 27, 2001
Date of Patent:
November 25, 2003
Assignee:
Sunyx Surface Nanotechnologies GmbH
Inventors:
Karsten Reihs, Daniel-Gordon Duff, Georg Wiessmeier, Burkhard Koehler, Matthias Voetz, Juan Gonzalez-Blanco, Eckard Wenz