Patents Assigned to SURREY NANOSYSTEMS LTD
  • PROVIDING GAS FOR USE IN FORMING A CARBON NANOMATERIAL
    Publication number: 20110311724
    Abstract: In a Chemical Vapour Deposition (CVD) process for forming carbon nanomaterials, a supply of acetylene gas is filtered by a filter to remove a volatile hydrocarbon gas before the acetylene gas is provided to a mass flow controller. The mass flow controller can mix the filtered acetylene gas with a supply of the volatile hydrocarbon gas so that a gas mixture has a selected proportion of the volatile hydrocarbon gas. The filter performs the filtering by passing the acetylene gas over active carbon.
    Type: Application
    Filed: January 28, 2010
    Publication date: December 22, 2011
    Applicant: SURREY NANOSYSTEMS LTD
    Inventors: Ben Poul Jensen, Guan Yow Chen