Patents Assigned to Suss MicroTec Lithography GmbH
  • Patent number: 7950347
    Abstract: The invention provides a rotatable and optionally heatable device for holding a flat substrate. The device includes a supporting means for placing and holding the substrate on a supporting surface, optionally a heater, a means for rotating the supporting means and a means for applying a fluid, e.g. a solvent, onto the side of the substrate facing the supporting surface. The fluid is applied when the supporting device for supporting and holding the substrate is caused to rotate.
    Type: Grant
    Filed: November 3, 2005
    Date of Patent: May 31, 2011
    Assignee: Suss Microtec Lithography, GmbH
    Inventors: Katrin Weilermann, Karl-Josef Kramer
  • Patent number: 7948034
    Abstract: An apparatus for bonding semiconductor structures includes equipment for positioning a first surface of a first semiconductor structure directly opposite and in contact with a first surface of a second semiconductor structure and equipment for forming a bond interface area between the first surfaces of the first and second semiconductor structures by pressing the first and second semiconductor structures together with a force column configured to apply uniform pressure to the entire bond interface area between the first surfaces.
    Type: Grant
    Filed: June 21, 2007
    Date of Patent: May 24, 2011
    Assignee: Suss Microtec Lithography, GmbH
    Inventors: Gregory George, Etienne Hancock, Robert Campbell
  • Patent number: 7057707
    Abstract: The present invention provides for a method for adjusting an alignment microscope. In the method of the present invention an alignment mask is used in which the one side comprises at least one alignment mark and the other side is reflective. For the adjustment, the microscope is first focused to the alignment mark and then refocused to the mirror image of the alignment mark generated by the reflective side. The microscope is then adjusted by comparing the positions of the alignment mark and the generated mirror image of the alignment mark until the alignment mark overlaps its mirror image. Moreover, a device for adjusting an alignment microscope in accordance with the method of the present invention.
    Type: Grant
    Filed: January 29, 2004
    Date of Patent: June 6, 2006
    Assignee: Suss MicroTec Lithography GmbH
    Inventor: Sven Hansen
  • Patent number: 6966560
    Abstract: A device or chuck for fixing thin and/or flexible substrates allows a uniform and all-over sucking-up of the substrates without any disadvantageous warping or bending. The chuck has notches and holes communicating with a plurality of microgrooves arranged on the bearing surface. If a vacuum device sucks off air through the bores and the notches, a vacuum extends in the microgrooves so that a substrate located on the bearing surface is sucked up.
    Type: Grant
    Filed: July 31, 2003
    Date of Patent: November 22, 2005
    Assignee: Suss MicroTec Lithography GmbH
    Inventors: Walter Demel, Ralph Zoberbier