Patents Assigned to SUSS MICROTEC PHOTONIC SYSTEMS, INC.
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Patent number: 11209635Abstract: Techniques are disclosed for magnification compensation and/or beam steering in optical systems. An optical system may include a lens system to receive first radiation associated with an object and direct second radiation associated with an image of the object toward an image plane. The lens system may include a set of lenses, and an actuator system to selectively adjust the set of lenses to adjust a magnification associated with the image symmetrically along a first and a second direction. The lens system may also include a beam steering lens to direct the first radiation to provide the second radiation. In some examples, the lens system may also include a second set of lenses, where the actuator system may also selectively adjust the second set of lenses to adjust the magnification along the first or the second direction. Related methods are also disclosed.Type: GrantFiled: January 16, 2020Date of Patent: December 28, 2021Assignee: SUSS MICROTEC PHOTONIC SYSTEMS INC.Inventors: Yanrong Yuan, John Bjorkman, Paul Ferrari, Jeff Hansen
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Patent number: 11175487Abstract: Techniques are disclosed for optical distortion reduction in projection systems for scanning projection and/or lithography. A projection system includes an illumination system configured to generate illumination radiation for generating an image of an object to be projected onto an image plane of the projection system. The illumination system includes a field omitting illumination condenser configured to receive the illumination radiation from a radiation source and provide a patterned illumination radiation beam to generate the image of the object, wherein the patterned illumination radiation beam comprises an omitted illumination portion corresponding to a ridge line of a roof prism disposed within an optical path of the projection system.Type: GrantFiled: March 26, 2020Date of Patent: November 16, 2021Assignee: SUSS MICROTEC PHOTONIC SYSTEMS INC.Inventors: Paul Ferrari, Yanrong Yuan, Jeff Hansen, Gerrad Killion
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Patent number: 10539770Abstract: Techniques are disclosed for magnification compensation and/or beam steering in optical systems. An optical system may include a lens system to receive first radiation associated with an object and direct second radiation associated with an image of the object toward an image plane. The lens system may include a set of lenses, and an actuator system to selectively adjust the set of lenses to adjust a magnification associated with the image symmetrically along a first and a second direction. The lens system may also include a beam steering lens to direct the first radiation to provide the second radiation. In some examples, the lens system may also include a second set of lenses, where the actuator system may also selectively adjust the second set of lenses to adjust the magnification along the first or the second direction. Related methods are also disclosed.Type: GrantFiled: June 18, 2018Date of Patent: January 21, 2020Assignee: SUSS MICROTEC PHOTONIC SYSTEMS INC.Inventors: Yanrong Yuan, John Bjorkman, Paul Ferrari, Jeff Hansen
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Publication number: 20180082965Abstract: A semiconductor structure includes an electrically conductive structure formed upon an uppermost organic layer of a semiconductor substrate. A capping layer is formed upon the uppermost organic layer covering the electrically conductive structure. A maskless selective removal lasering technique ejects portions of the capping layer while retaining the portion of the capping layer covering the electrically conductive structure. Portions of the capping layer are ejected from the uppermost organic layer by a shockwave as a result of the laser beam vaporizing the uppermost organic layer of the semiconductor substrate. Portions of the capping layer contacting the electrically conductive structure are retained by the conductive structure dissipating heat from the laser that would otherwise vaporize the uppermost organic layer of the semiconductor substrate.Type: ApplicationFiled: November 15, 2017Publication date: March 22, 2018Applicant: SUSS MicroTec Photonic Systems Inc.Inventors: Brian M. Erwin, Brittany L. Hedrick, Nicholas A. Polomoff, TaeHo Kim, Matthew E. Souter
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Publication number: 20180076160Abstract: A semiconductor structure includes an electrically conductive structure formed upon an uppermost organic layer of a semiconductor substrate. A capping layer is formed upon the uppermost organic layer covering the electrically conductive structure. A maskless selective removal lasering technique ejects portions of the capping layer while retaining the portion of the capping layer covering the electrically conductive structure. Portions of the capping layer are ejected from the uppermost organic layer by a shockwave as a result of the laser beam vaporizing the uppermost organic layer of the semiconductor substrate. Portions of the capping layer contacting the electrically conductive structure are retained by the conductive structure dissipating heat from the laser that would otherwise vaporize the uppermost organic layer of the semiconductor substrate.Type: ApplicationFiled: November 15, 2017Publication date: March 15, 2018Applicant: SUSS MicroTec Photonic Systems Inc.Inventors: Brian M. Erwin, Brittany L. Hedrick, Nicholas A. Polomoff, TaeHo Kim, Matthew E. Souter
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Patent number: 9779932Abstract: A method of removing post-laser debris from a wafer includes, for an embodiment, forming a sacrificial layer over a layer to be patterned, patterning the sacrificial layer and the layer to be patterned using laser ablation, and removing the sacrificial layer and debris deposited on the sacrificial layer with water. The sacrificial layer includes a water soluble binder and a water soluble ultraviolet (UV) absorbent. Systems for removing the post-laser debris are also described.Type: GrantFiled: December 11, 2015Date of Patent: October 3, 2017Assignee: SUSS MicroTec Photonic Systems Inc.Inventor: Habib Hichri
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Patent number: 9754823Abstract: A method of selectively locating a barrier layer on a substrate includes forming a barrier layer on a surface of the substrate. The barrier layer comprises of a metal element and a non-metal element. The barrier layer may also be formed from a metal element and non-metal element. The method further includes forming an electrically conductive film layer on the barrier layer, and forming a metallic portion in the electrically conductive film layer. The method further includes selectively ablating portions of the barrier layer from the dielectric layer to selectively locate place the barrier layer on the substrate.Type: GrantFiled: May 28, 2014Date of Patent: September 5, 2017Assignees: INTERNATIONAL BUSINESS MACHINES CORPORATION, SÜSS MICROTEC PHOTONIC SYSTEMS INC.Inventors: Yuri M. Brovman, Brian M. Erwin, Nicholas A. Polomoff, Jennifer D. Schuler, Matthew E. Souter, Christopher L. Tessler
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Patent number: 9748135Abstract: A method of selectively locating a barrier layer on a substrate includes forming a barrier layer on a surface of the substrate. The barrier layer comprises of a metal element and a non-metal element. The barrier layer may also be formed from a metal element and non-metal element. The method further includes forming an electrically conductive film layer on the barrier layer, and forming a metallic portion in the electrically conductive film layer. The method further includes selectively ablating portions of the barrier layer from the dielectric layer to selectively locate place the barrier layer on the substrate.Type: GrantFiled: August 18, 2015Date of Patent: August 29, 2017Assignees: INTERNATIONAL BUSINESS MACHINES CORPORATION, SUSS MICROTEC PHOTONIC SYSTEMS INC.Inventors: Yuri M. Brovman, Brian M. Erwin, Nicholas A. Polomoff, Jennifer D. Schuler, Matthew E. Souter, Christopher L. Tessler
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Publication number: 20170117241Abstract: A semiconductor structure includes an electrically conductive structure formed upon an uppermost organic layer of a semiconductor substrate. A capping layer is formed upon the uppermost organic layer covering the electrically conductive structure. A maskless selective removal lasering technique ejects portions of the capping layer while retaining the portion of the capping layer covering the electrically conductive structure. Portions of the capping layer are ejected from the uppermost organic layer by a shockwave as a result of the laser beam vaporizing the uppermost organic layer of the semiconductor substrate. Portions of the capping layer contacting the electrically conductive structure are retained by the conductive structure dissipating heat from the laser that would otherwise vaporize the uppermost organic layer of the semiconductor substrate.Type: ApplicationFiled: October 22, 2015Publication date: April 27, 2017Applicant: SUSS MicroTec Photonic Systems Inc.Inventors: Brian M. Erwin, Brittany L. Hedrick, Nicholas A. Polomoff, TaeHo Kim, Matthew E. Souter
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Publication number: 20150348831Abstract: A method of selectively locating a barrier layer on a substrate includes forming a barrier layer on a surface of the substrate. The barrier layer comprises of a metal element and a non-metal element. The barrier layer may also be formed from a metal element and non-metal element. The method further includes forming an electrically conductive film layer on the barrier layer, and forming a metallic portion in the electrically conductive film layer. The method further includes selectively ablating portions of the barrier layer from the dielectric layer to selectively locate place the barrier layer on the substrate.Type: ApplicationFiled: May 28, 2014Publication date: December 3, 2015Applicants: International Business Machines Corporation, SUSS MicroTec Photonic Systems Inc.Inventors: Yuri M. Brovman, Brian M. Erwin, Nicholas A. Polomoff, Jennifer D. Schuler, Matthew E. Souter, Christopher L. Tessler
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Patent number: 9132511Abstract: Various techniques are disclosed for an apparatus and a method to remove a layer from a substrate having a pattern formed on the layer. In one example, the apparatus comprises a stage configured to receive and hold the substrate. The apparatus may further comprise an irradiating device comprising a projection lens and configured to irradiate the surface of the substrate with pulses of laser light having a selected fluence to remove an interstitial portion of the layer between the pattern without removing the pattern for corresponding irradiated areas of the substrate. The pulses of laser light may be focused through the projection lens, and the stage and the projection lens may be configured to move continuously relative each other to irradiate a plurality of areas of the substrate with the pulses of laser light.Type: GrantFiled: July 14, 2014Date of Patent: September 15, 2015Assignee: SUSS MICROTEC PHOTONIC SYSTEMS, INC.Inventor: Matthew E. Souter